Spin Rinse Dryers

Spin rinse dryers are specialized equipment used for cleaning and drying semiconductor wafers. They ensure the removal of residual chemicals and particles, supporting high-quality manufacturing outcomes.

  1. VERTEQ IPA VAPOR DRYER 200 MM

    IPA Vapor Dryers

    VERTEQ IPA VAPOR DRYER 200 MM

    IPA Vapor Dryer IPA 2800 is a drying system using isopropyl alcoholto provide a clean,dry surface on wafers and substratesSystem features a class 10 elevator,ultra-pure nitrogen loading environment,short load-to-vapor time and fast recovery between cyclesThe system is partical netural at 0.2 microns This system is NOT a marangoni style

  10. SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM

    Spin Rinse Dryers

    SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM

    Spin Rinse Dryer up to 125mm

    Built in Resistivity Monitor

  11. MICROAUTOMATION 2066 Mask/Substrate Cleaner - For Parts Only

    Other Wafer Cleaners

    MICROAUTOMATION 2066 Mask/Substrate Cleaner - For Parts Only

    Mask/Substrate Cleaner - For Parts Only

Common Applications

Wafer Cleaning

Semiconductor Manufacturing

Surface Preparation

Residue Removal

Particle Elimination

Buying Guide

Spin Rinse Dryers Buying Guide

When selecting a surplus spin rinse dryer, it's crucial to consider several factors that impact performance and compatibility with your operations.

Factors such as verification of current condition, compatibility with existing systems, and utility requirements must be evaluated carefully.

  • Verify the dryer’s compatibility with your wafer sizes, typically ranging from 100mm to 150mm.
  • Examine the provided condition reports and maintenance logs to understand the equipment's history and service state.
  • Consider the utility requirements, such as water and electricity connections, to ensure seamless integration into your facility.
  • Check for the availability of critical accessories like SRD rotors and verify manufacturer support for replacements.

Frequently Asked Questions

What is a spin rinse dryer used for?
Spin rinse dryers are used to clean and dry semiconductor wafers by spinning and rinsing them with deionized water.
What wafer sizes are compatible with spin rinse dryers?
Spin rinse dryers can accommodate various wafer sizes, commonly 100mm to 150mm, as specified in the listings.
What are the benefits of dual stack spin rinse dryers?
Dual stack spin rinse dryers increase throughput by processing two batches of wafers simultaneously, enhancing efficiency.
How can I verify the condition of a surplus spin rinse dryer?
Check for detailed condition reports, inspect photos, evaluate the presence of critical components, and review maintenance logs if available.
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