Cleaning Systems

Cleaning systems are essential for maintaining contamination-free environments in semiconductor manufacturing. They ensure the reliable performance and longevity of critical components.

  4. CAI519 Canon FPA 3000 i5+

    Other Wafer Production Equipment

    CAI519 Canon FPA 3000 i5+

    Canon FPA 3000 i5+

    General Configuration:

    • FPA 3000 - i5(+)
    • Manufactured in  June / 1997
      • 8“ Wafer Chuck, Notch PA unit
      • 6“ Nikon-type Reticle Changer
      • Reticle Barcode-Reader =   yes
      • Cassette Barcode Reader = yes
      • Pellicle Particle Checker =   yes
      • Online - ESPA =   yes
      • Interface type:   right
      • Standard flys eye lens
      • Chamber type: CD80
  8. Scrap 3x mini buffers (10011500,10011501,10011502)

    Other Assembly / Hybrid

    Scrap 3x mini buffers (10011500,10011501,10011502)

    These 3 mini buffers (10011500,10011501,10011502) will be scrap because

    1: linked machines were already scrapped 

    2: function isn't complete

  9. Trikon Sigma FxP200 RevA mit MX800 Platform

    Other Wafer Production Equipment

    Trikon Sigma FxP200 RevA mit MX800 Platform

    It´s a Trikon Sigma FxP200 with 4 Std RevA DEP Chambers, 1 RevA HSE (not complete),

    1 MKII Heat Chamber. Brooks MX800 Platform with 2 Swing Out VCE6 Loadlocks. The

    Platform is upgradet from T5 Controller (MX800) to GTM with PC104 Controller.  All DEP Chambers HSE and Transport has CTI Onboard 8F Cryos and 2 9600 Cryo Compressor. No Forline Pumps

    Make: Trikon Tech Ltd.

    Model: Sigma FxP200 RevA

    1 unit @ Best Price

    Villach, Österreich

    Item 260582

  12. AQUEOUS TECHNOLOGIES ULTRASONIC STENCIL CLEANING SYSTEM

    Other Assembly / Hybrid

    AQUEOUS TECHNOLOGIES ULTRASONIC STENCIL CLEANING SYSTEM

    Ultrasonic Stencil Cleaning System

    Make: Aqueous Technologies

    Model: Stencil Washer ECO

    1 unit @ Best Price

    Scotia, NY US

    Item 185858

Common Applications

Wafer cleaning

Substrate cleaning

Photomask cleaning

Contamination removal

Semiconductor manufacturing

Component maintenance

Buying Guide

Cleaning Systems Buying Guide

When selecting cleaning systems for semiconductor applications, it is vital to understand the specific needs of your manufacturing process. Ensure the system is compatible with the materials you regularly handle.

Consider the following when choosing a system:

  • Verify the system's compatibility with different substrates.
  • Check the available cleaning options and settings for versatility.
  • Assess the system's condition and any signs of wear.
  • Ensure necessary accessories and manuals are included for proper operation.

Frequently Asked Questions

What types of cleaning systems are available?
Available types include ultrasonic cleaning systems, wafer cleaning systems, and substrate cleaning systems.
How do ultrasonic cleaning systems work?
Ultrasonic cleaning systems use high-frequency sound waves to remove contaminants from surfaces.
What materials can be cleaned with these systems?
Materials such as wafers, substrates, and photomasks can be cleaned using these systems.
Are these systems suitable for semiconductor applications?
Yes, they are specifically designed for semiconductor applications, ensuring thorough cleanliness and operational efficiency.
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