Automated Coating and Developing Cluster System
SUSS MICROTEC FALCON ACS 200
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
Coating and lithography systems are pivotal in the semiconductor manufacturing process, enabling precise deposition and patterning of materials. These systems enhance production efficiency and ensure high-quality output in microfabrication.
Automated Coating and Developing Cluster System
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
Mask Aligners: Contact/Proximity
Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
Mask Aligners: Contact/Proximity
Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix
Manual Photoresist Spin Coater
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
Dispensing System Camalot/Speedline model 1818
Positive Displacement Dispense System
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
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