Mask Aligners: Contact/Proximity
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM
Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
Coating and lithography systems are pivotal in the semiconductor manufacturing process, enabling precise deposition and patterning of materials. These systems enhance production efficiency and ensure high-quality output in microfabrication.
Mask Aligners: Contact/Proximity
Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
Manual Photoresist Spin Coater
New Surplus -- Never Installed
Primary and Secondary Configuration for Constant Flow Applications.
Photos listed are of 1 system
Mask Aligners: Contact/Proximity
Manual Mask Aligner
The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
Dispensing System
Camalot/Speedline model 1818
Positive Displacement Dispense System
Automatic Photoresist Coater
System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
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