Coating & Lithography Systems
Coating and lithography systems are pivotal in the semiconductor manufacturing process, enabling precise deposition and patterning of materials. These systems enhance production efficiency and ensure high-quality output in microfabrication.
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Mask Aligners: Contact/Proximity
KARL SUSS MANUAL MASK ALIGNER 150 MM
Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
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Mask Aligners: Contact/Proximity
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM
Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix
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HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER
Manual Photoresist Spin Coater
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ASML-AT1250 DUV193nm
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
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BLE RESPECT AUTOMATIC PHOTORESIST COATER
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
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BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER
System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
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GRACO THERMO-O-FLOW 20 HOT MELT BULK SYSTEM 20 LITER
New Surplus -- Never Installed
Primary and Secondary Configuration for Constant Flow Applications.
Photos listed are of 1 system
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CAMALOT/SPEEDLINE DISPENSING SYSTEM
Dispensing System Camalot/Speedline model 1818
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SEALANT EQUIPMENT & ENGINEERING DISPENSE SYSTEM
Positive Displacement Dispense System
Popular Manufacturers
Common Applications
Semiconductor fabrication
Microfabrication
Thin film deposition
Patterning processes
Thermal processing
Frequently Asked Questions
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