Fully Automated High Throughput Coating, Developing Cluster System  System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.

Süss Micro Tec ACS200 Gen 3

Automatic Photoresist Coater  System is designed exclusively to coat and bake substrates using spinning and heating techniques.

BLE was acquired by Suss Microtec

System is designed exclusively to develop and bake substrates using spinning and heating techniques

BLE was acquired by Suss Microtec