• Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production.
• System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components.
• Alternatively, a kit of core components can be offered for skilled users interested in building their own system.
• This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
• 1.5kW to 5kW microwave power input.
• 3 stage options: Cooled, Heated, or Thermally Floating.
• Integration with computer controls is strongly recommended.
• Chamber designs vary by vintage, but can be confirmed at the time of quotation.
• Please note that the chamber shown in the attached image is a new chamber.  The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design.

E-Beam Evaporator with Ion Source

PECVD TEOS Tool with Load Lock

NB: System needs a computer-software upgrade.  Selling this system AS IS, WHERE IS.

Cryopump Note: Pumps to be rebuilt once sold; inquire on lead-time.

• This in-stock equipment is offered for domestic sale within the USA only. 
• Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
• Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD).
• System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety:
  • Chamber cleaning,
  • Computer control updates,
  • Higher throughput water cooling subsystem,
  • Replacement of selected o-ring components with metal seals, and
  • Enhanced process control/monitoring devices.
  • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
  • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
  • Photo Note: System photo shown include a similar quality, similar vintage system sold in the past.  Actual photos or inspection available to qualified customers only.

Inductively Coupled Plasma Etcher with 9.5 Inch Electrode

Silicon Etcher - Year 2003

Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo PumpedThe CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.

Wafer Film Frame Tape Applicator

The item is sold AS IS without returns.

For parts or not working condition. It is not tested. 

Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter Currently configured for 100mm wafers3 Target mini-quantumsRF EtchVIPS (Vacuum Isolated Processing Station)Residual Gas Analyzer

Gridless End-Hall Ion Source With Water Cooled Front Plate

Fully Automated High Throughput Coating, Developing Cluster System  System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.