• Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production.
• System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components.
• Alternatively, a kit of core components can be offered for skilled users interested in building their own system.
• This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
• 1.5kW to 5kW microwave power input.
• 3 stage options: Cooled, Heated, or Thermally Floating.
• Integration with computer controls is strongly recommended.
• Chamber designs vary by vintage, but can be confirmed at the time of quotation.
• Please note that the chamber shown in the attached image is a new chamber.  The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design.

PECVD TEOS Tool with Load Lock

NB: System needs a computer-software upgrade.  Selling this system AS IS, WHERE IS.

• This in-stock equipment is offered for domestic sale within the USA only. 
• Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
• Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD).
• System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety:
  • Chamber cleaning,
  • Computer control updates,
  • Higher throughput water cooling subsystem,
  • Replacement of selected o-ring components with metal seals, and
  • Enhanced process control/monitoring devices.
  • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
  • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
  • Photo Note: System photo shown include a similar quality, similar vintage system sold in the past.  Actual photos or inspection available to qualified customers only.

Cline Innovations is offering a Wavemat 915MHz microwave CVD diamond growth system.  This deposition system is recommended for synthetic diamond growth and/or large area plasma equipment development purposes. 

This system is capable of operation over a broad parametric space including 1.) large volume/diameter, low plasma power densities using a thermally-floating stage design or 2.) confined volume/diameter higher plasma power densities using a water-cooled stage design.  

Major System Features:

• Wavemat 915MHz internally-tunable microwave plasma apparatus.
• Nominally 10-inch diameter fused quartz bell jar enables handling of large area fixtures and substrates.
  • Roughly 4.5" processing diameter with water-cooled stage.
  • Roughly 6.0" processing diameter with thermally-floating stage.
  • Larger area processing may certainly be possible with system modifications, enhanced cooling.
  • Double-jacketed stainless steel loading chamber mounted to a sturdy welded steel frame with thick aluminum tabletop.
  • Typically operated at power levels under 12kW.
  • Modular design enables application-specific modifications, plasma source development, etc.
  • PC-based LabView controls.

Custom built for industrial R&D, this high plasma power density system is activated by ECR-enhanced, 2.45GHz microwave input offers a unique design for PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures.

Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching.

This system was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with ECR magnets.