Critical Dimension Measurement Systems

Critical dimension measurement systems analyze line widths on wafers and photomasks. They ensure precision and reliability in semiconductor manufacturing processes.

  1. NANOMETRICS CRITICAL DIMENSION COMPUTER

    Optical CD Measurement

    NANOMETRICS CRITICAL DIMENSION COMPUTER

    Critical Dimension Computer Large memory digital computer calculates line widths and provides statistics on in process wafer and photomasks.

Common Applications

Wafer inspection

Photomask analysis

Semiconductor fabrication

Line width measurement

Process validation

Buying Guide

Critical Dimension Measurement Systems Buying Guide

When selecting a critical dimension measurement system, it's essential to consider its compatibility with your existing processes. Ensure the system can handle the wafer sizes you work with.

Additionally, check for functionalities that provide detailed statistical analyses and process validation capabilities.

  • Verify the compatibility with current fabrication lines and photomasks.
  • Consider the system's memory capacity for managing complex data.
  • Assess the software interface for ease of use and integration.
  • Look for surplus systems that come with complete manuals and historical usage logs.

Frequently Asked Questions

What is a critical dimension measurement system?
A critical dimension measurement system is used to calculate line widths on wafers and photomasks to ensure accuracy in semiconductor fabrication.
How are these systems used in semiconductor manufacturing?
They are used to inspect and validate the accuracy of wafer and photomask dimensions during various stages of production.
What is the importance of measuring line widths?
Accurately measuring line widths is crucial for maintaining the integrity and functionality of semiconductor devices.
Can these systems handle different wafer sizes?
Yes, many critical dimension measurement systems are equipped to handle various wafer sizes, ensuring compatibility across different productions.
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