REYNOLDSTECH PHOTORESIST DEVELOP HOOD
Photoresist Develop Station with Headway Wafer Spin Cleaner
Acid wet stations are specialized equipment designed for precise chemical processing in semiconductor manufacturing. They enhance efficiency and reliability in etching and cleaning processes.
Photoresist Develop Station with Headway Wafer Spin Cleaner
Semi-Automated Acid Wet Bench System
Toolcontroller with Windows XP
Remote controller
Ready for endpointdetection system
Process: Copper / Titan-Wolfram / dHF (dilluted HF)
div. spareparts possible (negotiable)
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