Plasma Etching Systems

Plasma etching systems are used to remove specific material layers from semiconductor wafers with high precision. These systems ensure efficient manufacturing by maintaining uniformity and accuracy across extensive production runs.

  3. PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX

    Other Etchers

    PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX

    Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board. Both top and bottom electrodes can be powered sequentially.

  4. Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade

    Other Etchers

    Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade

    PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F

    • Manually Loaded Process Chamber with 8” (dia.) Cathode
    • Gas Distribution Panel with 4ea Gas Channels
      • MKS 1479 Metal Sealed Mass Flow Controllers
      • 4ea Additional Gas Channels Available
      • RFPP RF5S RF Generator: 500W @ 13.56MHz
      • RFPP AMN-5 Auto Matching Network
      • RFPP AMNPS-2A Auto Matching Network Controller
      • Leybold TMP 361 Turbomolecular Pump
      • Leybold NT 150/360 Turbomolecular Pump Controller
      • EquipmentWorks 2.6 Application SW
      • Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD
      • All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol.
      • All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible
      • All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol
      • All SMC Pneumatic Valves Available from SMC USA
      • Standard 21” Flat Panel Monitor, Keyboard & Mouse
      • Edwards QDP40 Dry Roughing Pump
      • NESLAB HX-75 Chiller
      • Electrical Disconnect Box - 208V, 60Hz, 3 Ph
      • System Fully Refurbished & Ready for Demonstration
      • Guaranteed to Meet or Exceed OEM Specifications
      • Price……$ 80,000.00 USD
  5. PLASMA-THERM SLR 770 ICP Plasma Etcher

    Other Etchers

    PLASMA-THERM SLR 770 ICP Plasma Etcher

    PLASMA-THERM SLR 770 Inductively Coupled Plasma Etcher

    • Single Process Chamber with SLR (Shuttle Lock Transfer) Load Lock
    • Manual Load with Load Lock Handling Currently Configured for 4” Wafers
    • Ceramic Wafer Clamp with Helium Backside Cooling System
    • Gas Distribution Box with 5ea Gas Channels
    • ENI ACG-6 RF Generator: 600W @ 13.56MHz
    • ENI Automatic Matching Network
    • RFPP RF20M RF Generator: 2000W @ 2.0MHz
    • RFPP Automatic Matching Network
    • Six Zone Chamber Heater with Temperature Controller
    • LEYBOLD 900 Turbo Pump with Mag 1000 Controller
    • MKS ITR Ion Gauge Controller
    • VAT Gate Valve with PM-5 Controller
    • Mechanical Roughing Pump
    • NESLAB HX-75 Chiller
    • Electrical Disconnect Box - 208V, 60Hz, 3 phase

Popular Manufacturers

Plasma-Therm Surface Tech Sys

Common Applications

Microelectronics Manufacturing

MEMS Fabrication

Thin Film Processing

Wafer Processing

Semiconductor Etching

Buying Guide

Plasma Etching Systems Buying Guide

When considering a plasma etching system, prioritize the compatibility with your wafer size and material type. Check the system configuration for versatility to support various processes.

Ensure that the equipment includes necessary utilities and is in a condition that supports reliable operation. Review available documentation, including maintenance logs and calibration records, to verify performance consistency.

  • Confirm system compatibility with desired process gases and wafer sizes.
  • Evaluate the condition of load locks for optimal contamination control.
  • Inspect the availability of process control interfaces and software updates.
  • Validate the system's previous operation history and maintenance records.

Frequently Asked Questions

What is a plasma etching system?
A plasma etching system uses ionized gas to remove material from a substrate in semiconductor manufacturing.
How does a reactive ion etcher (RIE) work?
An RIE uses chemically reactive plasma to etch precise patterns onto substrates.
What is the benefit of a load lock system in plasma etching?
Load lock systems prevent contamination by isolating wafers from atmospheric exposure during loading and unloading.
What applications use plasma etching systems?
Applications include microelectronics manufacturing, MEMS fabrication, and thin film processing.