PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6"
Reactive Ion Etch System
BatchTop VII
Metal etchers are critical for defining intricate features on semiconductor wafers. They ensure high accuracy and efficiency in chip manufacturing processes.
Reactive Ion Etch System
BatchTop VII
Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems
Dual Plasma Etch and Reactive Ion Etch Processing Systems System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.
Technics Micro Stripper Series 200 Plasma System
Lam Research 9600SE Rainbow Metal Etch Tool
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