ALL CATEGORIES

KLA Altair 8935-FFC AOI Tool

• For 200mm Patterned Wafers on Film Frames
• Brightfield/Darkfield Optics
• 2X, 5X, 10X & 20X Objectives
• 35X LWD Review Capability
• 0.2 um Max DF Sensitivity
• Die to Die Detection Algorithm
• Focus Freeze (High Topo) ADAR
• Deep Learning ADC
• 4 WPH Throughput

eS32 is a top-of-the-line mask and wafer inspection equipment that is designed to meet the most stringent quality standards for semiconductor product manufacturing. This system provides comprehensive, high-resolution inspection of both masks and wafers with unparalleled accuracy. The unit uses a proprietary optical probe to scan masks and wafers to detect defects and irregularities with a resolution reaching down to 1 micron. This high-precision scanning allows for comprehensive inspection of the entire surface of both the mask and wafer. The machine also includes powerful image processing and analysis algorithms which automatically detect defects, categorize them, and track their locations. KLA eS32 also includes a suite of automated defect correction tools which can rapidly repair standard and complex defects. In addition to its exhaustive defect detection capabilities, this tool also allows for statistical process control (SPC) analysis to ensure production processes maintain consistent quality and accuracy over time. TENCOR ES 32 also includes a user-friendly interface that makes it easy to operate and manage the asset. This user interface is highly customizable, allowing users to quickly change model settings, view detailed inspection reports, and receive real-time notifications of detected defects. In summary, KLA ES 32 is a high-performance mask and wafer inspection equipment that offers superior detection accuracy, automated defect correction, comprehensive statistical process control (SPC) analysis, and an easy-to-use user interface. This system can be used to monitor production lines, resulting in improved manufacturing quality, increased yield, and cost savings.

KLA-TENCOR Surfscan 6420 Unpatterned Wafer Surface Contamination Tool

• Please Inquire for Additional Details

KLA-Tencor 51-0175, Rev. D H2 Wafer Handler Prealigner

KLA-Tencor 52-0466 DBS Spectrometer Lid 

KLA-Tencor DSW16E 300mm Calibration Wafer

• Part Number 0210691-000 (Advanced Technology Development)
• For Use on e-Beam Patterned Wafer Defect Inspection Tools 

   

›Automatic Surface Inspection System

›Bare Wafer Surface Defect Inspection System

›Substrate/Sizes: 6" and 8" Wafer Capable

›Thickness: SEMI Standard Wafer Thickness

›Throughput: 100 wph (200 mm) at 0.12 mm

›Illumination Source: 30 mW Argon-Ion laser, 488 nm Wavelength

KLA-Tencor 2138XP Brightfield Defect Inspection Tool

• 0.25µ, 0.39µ, 0.62µ Spot Sizes
• For 150mm & 200mm Wafers
• Model 2552UI User Interface
• Denkenseiki Noise Filter
• Please Inquire for Additional Details

Patterned Wafer Contamination Analyzer

• Detects defects as small as 0.15 µm, while defects below 0.2 µm can be detected on many process levels, including nitride, oxide, polysilicon and TEOS films
• Capable of measuring defects on unpatterned wafers
• Capable of measuring wafers from 4” to 8”
• High sensitivity on after-etch and high topography applications
• Circular input polarization enhances sensitivity and defect capture on post-CMP and other post-deposited layers

KLA-TENCOR Aleris 8350 Advanced Film Metrology Tool

• Dual 300 mm Loadports
• Wafer Level Reliability
• Broadband Spectroscopic Ellipsometer
• Single Wave Ellipsometer
• Stress Measurement
• iDesorber

KLA-TENCOR Archer 200 AIM Overlay Metrology Tool

• ETAL Stage
• Yaskawa Robot with NXC100 Controller
• IDE Maxon 1000 Floatation Controller

KLA-TENCOR HRP-240 High Resolution Profiler

• Cassette to Cassette Wafer Handling for up to 200mm Wafers
• Previously Configured for SMIF Wafer Handling
• Please Inquire for Additional Details

KLA-TENCOR Puma 9130 Darkfield Inspection Tool

• Parts Tool
• Please Inquire for Additional Details

KLA-Tencor Surfscan SP1 Unpatterned Wafer Surface Defect Tool

• Dual Port 300mm

KLA-TENCOR Spectra fx Single Wave Ellipsometer Kit

KLA-TENCOR Viper 2401 After Develop Inspection Tool

• Please Inquire for Details

• Pneumatic Linear Slide
• Howa-Origa
• Max 0.8 Mpa

• Pneumatic Linear Slide
• Howa-Origa
• Max 0.8 Mpa

Pneumatic Air Cylinder

Micro Ultrasonic Cell Disrupter

Kontes KT 50

Manual Ball Bonder

Manual Wedge Bonder with Leica MZ6 Microscope

MicroWash Sawed Wafer Cleaning System


High pressure de-ionized water spray cleaning system

Aspherical Grinding System

Simultaneous Control of the X,Y and Z axis.

Flapper View Port Shutter

Shutters protect view ports in sputtering systems.

Multi-Pin Instrumentation Feedthrough