Unit Price |
Unstated |
Number of Units |
1 |
Manufacturer | Nexx Systems |
Model | Cirrus 300 |
Description | CVD Deposition with ECR source |
Wafer Size Range |  |
Minimum | 50 mm |
Maximum | 300 mm |
Controller Type | PC Controller Type |
Loadlock |  |
Loadlock Yes/No | YES |
High Vacuum Pump | Balzers TMH 1001corrosive service Turbo |
Automatch Text | ASTeX AX3060 |
Chillers |  |
Number of Chillers | 1 |
Chiller #1Manufacturer/Model | Neslab - HX 75 |
Other Information | PQ2000 Series permanent magnet low profile ECR source.
ASTeX AX2110 microwave power supply with remote magnetron head.
Output 150 - 1000 Watt, PC controlled
20 inch outer diameter reactor chamber with Viton seals.
Six (6) MKS Instruments 2179A Kalrez sealed mass flow controllers, expandable to seven.
Wafer Chuck
Handling up to 300mm in diameter
RF Biased, Via RFPP 1kW, 13.56 Mhz, with automatch
Recirculating fluid cooling
Helium backside cooling
Temperature range -25C to 130C
Mechanical clamp substrate holder
NB: Higher temperatures can be achieved without helium backside cooling |
Operating Air Pressure | 80.00 PSI (551,624.00 N/sq m) |
Year of Manufacture | 2000 |
Condition | Excellent |
Exterior Dimensions |  |
Width | 81.000 in (205.7 cm) |
Depth | 41.000 in (104.1 cm) |
Height | 85.000 in (215.9 cm) |