 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
| Make |
Model |
| |
|
$ |
|
 |
30246
|
Plasma-Therm
|
Plasma-Therm |
VLR 700 VLR-PM1-ICRB-PM |
in Production Tools
PLASMATHERM VLR 700:Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.
|
1
|
|
|
 F* |
Scotia, New York |
|
|
142821
|
Plasma-Therm
|
Plasma-Therm |
Unaxis 790 |
in Single Chamber Plasma Tools
PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM:Shuttle Load Lock System
|
1
|
|
|
|
Scotia, New York |
|
|
201152
|
Plasma-Therm
|
Plasma-Therm |
790 RIE PECVD 11" |
in Single Chamber Plasma Tools
PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX:Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board.
Both top and bottom electrodes can be powered sequentially.
|
1
|
|
|
|
Scotia, New York |
|
|
251431
|
Plasma-Therm
|
Plasma-Therm |
SLR-770 |
in Single Chamber Plasma Tools
PLASMA-THERM SLR 770 ICP Plasma Etcher:PLASMA-THERM SLR 770 Inductively Coupled Plasma Etcher - Single Process Chamber with SLR (Shuttle Lock Transfer) Load Lock
- Manual Load with Load Lock Handling Currently Configured for 4” Wafers
- Ceramic Wafer Clamp with Helium Backside Cooling System
- Gas Distribution Box with 5ea Gas Channels
- ENI ACG-6 RF Generator: 600W @ 13.56MHz
- ENI Automatic Matching Network
- RFPP RF20M RF Generator: 2000W @ 2.0MHz
- RFPP Automatic Matching Network
- Six Zone Chamber Heater with Temperature Controller
- LEYBOLD 900 Turbo Pump with Mag 1000 Controller
- MKS ITR Ion Gauge Controller
- VAT Gate Valve with PM-5 Controller
- Mechanical Roughing Pump
- NESLAB HX-75 Chiller
- Electrical Disconnect Box - 208V, 60Hz, 3 phase
|
1
|
|
|
|
Plano, Texas |
|
|
225948
|
Plasma-Therm
|
Plasma-Therm |
790 |
in Single Chamber Plasma Tools
Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade:PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F - Manually Loaded Process Chamber with 8” (dia.) Cathode
- Gas Distribution Panel with 4ea Gas Channels
- MKS 1479 Metal Sealed Mass Flow Controllers
- 4ea Additional Gas Channels Available
- RFPP RF5S RF Generator: 500W @ 13.56MHz
- RFPP AMN-5 Auto Matching Network
- RFPP AMNPS-2A Auto Matching Network Controller
- Leybold TMP 361 Turbomolecular Pump
- Leybold NT 150/360 Turbomolecular Pump Controller
- EquipmentWorks 2.6 Application SW
- Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD
- All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol.
- All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible
- All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol
- All SMC Pneumatic Valves Available from SMC USA
- Standard 21” Flat Panel Monitor, Keyboard & Mouse
- Edwards QDP40 Dry Roughing Pump
- NESLAB HX-75 Chiller
- Electrical Disconnect Box - 208V, 60Hz, 3 Ph
- System Fully Refurbished & Ready for Demonstration
- Guaranteed to Meet or Exceed OEM Specifications
- Price……$ 80,000.00 USD
|
1
|
|
80,021.44 |
|
Plano, Texas |
|
|
50854
|
Plasma-Therm
|
Plasma-Therm |
VII 734 |
in Single Chamber Plasma Tools
PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE:Combination Plasma Deposition System/RIE
|
1
|
|
|
F* |
Scotia, New York |
|
|
206582
|
Plasma-Therm
|
Plasma-Therm |
BT 6" RIE MF |
in Single Chamber Plasma Tools
PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6":Reactive Ion Etch System BatchTop VII
|
1
|
|
|
|
Scotia, New York |
|
|
3011
|
Plasma-Therm
|
Plasma-Therm |
Wafer Batch 740/740 |
in Single Chamber Plasma Tools
PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM:Dual Plasma Etch and Reactive
Ion Etch Processing Systems
System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.
|
1
|
|
|
|
Scotia, New York |
|
|
4054
|
Plasma-Therm
|
Plasma-Therm |
73/74 |
in Single Chamber Plasma Tools
PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM:Combination PECVD and Dual
Plasma Etch/Reactive Ion Etch
Processing Systems
|
1
|
|
|
|
Scotia, New York |
|
|
11919
|
Plasma-Therm
|
Plasma-Therm |
VII 734MF |
in Single Chamber Plasma Tools
PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM:Plasmatherm RIE/Plasma Etch System
|
1
|
|
|
F* |
Scotia, New York |
|
|
45428
|
Plasma-Therm
|
Plasma-Therm |
790 ICP |
in Single Chamber Plasma Tools
PLASMATHERM ICP PLASMA ETCHER:Inductively Coupled Plasma Etcher with 9.5 Inch Electrode
|
1
|
|
|
F* |
Scotia, New York |
|
|
|
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