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	View All Offers Under Chemical Vapor Deposition Equipment » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Offers into sub-categories under Chemical Vapor Deposition Equipment List all 11 product types under Chemical Vapor Deposition Equipment

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   257348 AMAT   AMAT   DXZ/CXZ Chamber  Cluster PECVD Tools in Production Tools 3 DXZ/CXZ Chambers for Centura/P5000: 3 DXZ/CXZ Chambers for Centura/P5000 Mainframe is transport rack   1   Villach, Kärnten 228193 AMAT AKT   AMAT AKT   AKT 15 K  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AKT GEN 5 PECVD CHAMBER: Chambers are unused and were never commissioned. Susceptor, gas shower and other chamber kitting not included.     1   F* Scotia, New York 250827 Applied Materials   Applied Materials   Centura TCPP  Cluster PECVD Tools in Production Tools APPLIED MATERIALS Centura TPCC EPN : APPLIED MATERIALS Centura TPCC EPN  Serial Number 21693; Manufactured in 2011 Electro Polished Nickel Frame & Modules 2ea ENP Centura Loadlocks for 200mm Wafers Wafer Transfer Chamber with HP Robot High Temperature Quartz End Effector On the Fly Wafer Centering 2ea TanOx Chambers - Positions C & D 2ea ENP Fast Cooldown Chambers V452 Main Control Board Gas Panel with 2ea Gas Pallets Interconnect Cables AC Distribution Rack – 160A Through the Wall Installation Kit Please Inquire for Additional Details 1   Austin, Texas 225959 Applied Materials   Applied Materials     Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment 1   Scotia, New York 184607 Astex   Astex   AX5000, AX6000, AX6350 or similar  Single Chamber PECVD Tools in Production Tools Astex AX5000 Microwave Plasma Diamond Growth System: Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production. System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components. Alternatively, a kit of core components can be offered for skilled users interested in building their own system. This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions. 1.5kW to 5kW microwave power input. 3 stage options: Cooled, Heated, or Thermally Floating. Integration with computer controls is strongly recommended. Chamber designs vary by vintage, but can be confirmed at the time of quotation. Please note that the chamber shown in the attached image is a new chamber.  The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design. 1   F* Leominster, Massachusetts 189843 Astex   Astex   AX6500 "Clamshell" MPCVD  Single Chamber PECVD Tools in Production Tools Astex AX6500 Bottom-launch Diamond Growth System: This in-stock equipment is offered for domestic sale within the USA only.  Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex. Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD). System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety: Chamber cleaning, Computer control updates, Higher throughput water cooling subsystem, Replacement of selected o-ring components with metal seals, and Enhanced process control/monitoring devices. The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input. Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing. Photo Note: System photo shown include a similar quality, similar vintage system sold in the past.  Actual photos or inspection available to qualified customers only. 1   Leominster, Massachusetts 137483 Astex   Astex   ECR-Microwave Plasma  Single Chamber PECVD Tools in Production Tools ASTeX High Power, Low Pressure Microwave Plasma System : Custom built for industrial R&D, this high plasma power density system is activated by ECR-enhanced, 2.45GHz microwave input offers a unique design for PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures. Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating. Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching. This system was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with ECR magnets. 1   Leominster, Massachusetts 98056 Carbone   Carbone   G-III  Epitaxial Cluster Tools in Epitaxial Reactors CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR: Silicon Carbide 200 mm Disc Susceptor Carbone of America Part number 017893-001 5   F* Scotia, New York 207176 Dockweiler Chemicals   Dockweiler Chemicals   8000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS: Bubbler Heat Exchanger 1   Scotia, New York 207177 Dockweiler Chemicals   Dockweiler Chemicals   20000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS: Bubbler Heat Exchanger 1   Scotia, New York 257523 AMAT   AMAT   AMAT EPI CENTURA  Epitaxial Cluster Tools in Epitaxial Reactors EPI 39 - AMAT EPI CENTURA : Software Ver: B6.50 CB1 Amps: 300A Vita Controller Flow Point Model: Nano Valve Gas Panel Type: Configurable Wafer Size: 200mm (with conversion kit 150mm is possible) M-Monitor: CRT 3 Chambers ATM EPI With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC)  Standard pneumatic waferlift Center Finding System: OTF Buffer robot: HP+ Piezocon sensor: No VSB: Yes Wide Body LL Tool called "EPI39" 1   Villach, Kärnten 257176 AMAT   AMAT   EPI Centura ACP  Epitaxial Cluster Tools in Epitaxial Reactors EPI Centura ACP 300mm "Yu Shan": Brand new and unused EPI Centura ACP 300 mm 4 Chambers;  Chamber code RH3, Lamp type BNA8 R3 Mainframe Configuration E4 Single, 4 Facet SC ENP BLK2, Loadport AMAT Standard 300mm, EPI Water Module LT Design. RP EPI Tool out of Project: "Yu Shan" The original rough IFX Equipment procurement value was ~10,3 M€ Will be now sold for an attractive price.  Equipment is...  ...brand new  ...never used   ...original packaged and crated  ...located in Asia  ...complete and fully functional  ...professional stored in Warehouse 1   Regensburg, Bavaria 115857 HFCVD System for CVD Diamond and Related Materials  HFCVD System for CVD Diamond and Related Materials  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment HFCVD System for CVD Diamond and Related Materials: Hot Filament CVD system engineered for CVD Diamond growth on a 4 inch (~100mm) rotary platen. Previously used for commercial R&D of polycrystalline CVD diamond materials. 4-inch system design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production. NOT intended or marketed for single-crystal diamond gemstone growth. Related 12-inch (~300mm) production-scale diamond HFCVD equipment is also available.  4-inch HFCVD system design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species. Cline Innovations intends to coordinate reintegration/refurbishment of this system with updated controls and interlocks.  Reintegration will likely include PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible.  1   F* Leominster, Massachusetts 100429 Materials Technology   Materials Technology   02-01808  Epitaxial Cluster Tools in Epitaxial Reactors MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR: EPI 3 1/4" Barrel Susceptor MTC EPI Reactor Parts For 3 Inch Wafers 4   F* Scotia, New York 181540 Oxford Instruments   Oxford Instruments   Plasmalab System 100  Single Chamber PECVD Tools in Production Tools OXFORD INSTRUMENTS PLASMALAB 100 PECVD: PECVD TEOS Tool with Load Lock NB: System needs a computer-software upgrade.  Selling this system AS IS, WHERE IS. 1   F* Scotia, New York 30246 Plasma-Therm   Plasma-Therm   VLR 700 VLR-PM1-ICRB-PM  Cluster PECVD Tools in Production Tools PLASMATHERM VLR 700: Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes. 1   F* Scotia, New York 176520 Wavemat   Wavemat   Diamond 915MHz MPCVD  Single Chamber PECVD Tools in Production Tools Wavemat 915 MHz MPCVD Diamond Growth System: Cline Innovations is offering a Wavemat 915MHz microwave CVD diamond growth system.  This deposition system is recommended for synthetic diamond growth and/or large area plasma equipment development purposes.  This system is capable of operation over a broad parametric space including 1.) large volume/diameter, low plasma power densities using a thermally-floating stage design or 2.) confined volume/diameter higher plasma power densities using a water-cooled stage design.   Major System Features: Wavemat 915MHz internally-tunable microwave plasma apparatus. Nominally 10-inch diameter fused quartz bell jar enables handling of large area fixtures and substrates. Roughly 4.5" processing diameter with water-cooled stage. Roughly 6.0" processing diameter with thermally-floating stage. Larger area processing may certainly be possible with system modifications, enhanced cooling. Double-jacketed stainless steel loading chamber mounted to a sturdy welded steel frame with thick aluminum tabletop. Typically operated at power levels under 12kW. Modular design enables application-specific modifications, plasma source development, etc. PC-based LabView controls. 1   F* Leominster, Massachusetts

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment: AG Associates, AMAT, Applied Materials AKT, Applied Materials, Inc., Astex, Carbone, Dockweiler Chemicals, Materials Technology, Oxford Instruments, Plasma-Therm, Wavemat