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Chemical Vapor Deposition Equipment


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PLASMATHERM VLR 700


PLASMATHERM VLR 700

Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.


Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment:
AG Associates, AMAT, Applied Materials AKT, Applied Materials, Inc., Astex, Carbone, Dockweiler Chemicals, Hitachi High-Technologies, Hitachi Kokusai Elec, Jusung Engineering Co., Ltd., LAM Research Corp., Materials Technology, Oxford Instruments, Plasma-Therm, POONGSAN, Tel, Tokyo Electronics Limited, Wavemat