 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
 |
13097
|
AB-M Inc.
|
AB-M Inc. |
IR Wafer Aligner |
in Lithography Equipment
AB-M INC. IR WAFER ALIGNER STATION:IR Wafer Aligner Station
|
1
|
|
|
 |
Scotia, New York |
|
 |
89964
|
AIO Microservice
|
AIO Microservice |
8826 |
in Photoresist Coater Tracks
AIO MICROSERVICE DUAL TRACK COAT SYSTEM:Dual Track Coat System
|
1
|
|
|
F* |
Scotia, New York |
|
 |
257175
|
AMAT
|
AMAT |
Verity2 SEM |
in Lithography Equipment
|
1
|
|
|
N* |
Singapore |
|
 |
254474
|
ASML
|
ASML |
AT400C |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254366
|
ASML
|
ASML |
AT850C |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254365
|
ASML
|
ASML |
AT850C |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254257
|
ASML
|
ASML |
NXT1950i |
in Wafer Steppers
|
1
|
|
|
 |
Malta, New York |
|
 |
254256
|
ASML
|
ASML |
NXT1950i |
in Wafer Steppers
|
1
|
|
|
 |
Malta, New York |
|
 |
254107
|
ASML
|
ASML |
NXT1950i |
in Wafer Steppers
|
1
|
|
|
 |
Malta, New York |
|
 |
254111
|
ASML
|
ASML |
XT1400E |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254110
|
ASML
|
ASML |
XT1900Gi |
in Wafer Steppers
ASML XT1900Gi, 300mm, s/n: 5884:Immersion scanner
|
1
|
|
|
 |
Singapore |
|
 |
254199
|
ASML
|
ASML |
Yieldstar S-200B |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254167
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254164
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254163
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
AXCELIS PCU 200, 200mm, s/n: PU6C289X:PHOTOSTABILIZER
|
1
|
|
|
 |
Singapore |
|
 |
254165
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254166
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
44185
|
Suss MicroTec
|
Suss MicroTec |
RESPECT 600 |
in Photoresist Coaters
BLE RESPECT AUTOMATIC PHOTORESIST COATER:Automatic Photoresist Coater
System is designed exclusively to coat and bake substrates using spinning and heating techniques. BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
 |
44184
|
Suss MicroTec
|
Suss MicroTec |
Respect 600 |
in Photoresist Developers
BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER: System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
 |
77000
|
Brewer Science
|
Brewer Science |
CEE 4000 |
in Photoresist Coater Tracks
BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM:Programmable Automated Coat/Bake Track System
|
2
|
|
|
F* |
Scotia, NY |
|
 |
250700
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Only for sale for an competetive price! Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250701
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
41529
|
Headway
|
Headway |
CB15 |
in Photoresist Coaters
HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER:Manual Photoresist Spin Coater
|
1
|
|
|
F* |
Scotia, New York |
|
 |
9971
|
Headway
|
Headway |
P8X20-30 |
in Photoresist Coaters
Headway Research P8X20-30:AC Spindle Motor for AC-101 Photoresist Spinner, New
|
1
|
|
|
|
Plano, TX |
|
 |
254473
|
InnerSense
|
InnerSense |
Load Port - P/N: ALP613A |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254364
|
InnerSense
|
InnerSense |
Load Port - P/N: ALP613A |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
112607
|
Karl Suss
|
Karl Suss |
MA 150M |
in Mask Aligners
KARL SUSS MANUAL MASK ALIGNER 150 MM:Manual Mask Aligner
The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
|
1
|
|
|
F* |
Scotia, New York |
|
 |
253369
|
KLA-Tencor
|
KLA-Tencor |
5200 |
in Lithography Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
254368
|
KLA-Tencor
|
KLA-Tencor |
TERON 650 |
in Lithography Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
254226
|
Lasertec
|
Lasertec |
BI100 |
in Lithography Equipment
Lasertec BI100, s/n: BA002A408JR:EUV Reticle Back Side Inspection
|
1
|
|
|
 |
Malta, New York |
|
 |
257163
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
257165
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
257164
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
254329
|
Nikon
|
Nikon |
S208D |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
248319
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573113:Nikon, NSR-2205EX14C, 200mm, S/N 7573113
|
1
|
|
|
 |
Singapore |
|
 |
248320
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573120:Nikon, NSR-2205EX14C, 200mm, S/N 7573120
|
1
|
|
|
 |
Singapore |
|
 |
249907
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732039. LKSC760:NIKON Main Body
|
1
|
|
|
 |
Singapore |
|
 |
247027
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732048:NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
247605
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: S62 0290202:Lithography Step and repeat scanning system
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
160264
|
Quintel
|
Quintel |
Q-804 |
in Mask Aligners
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM:Mask Aligner/Exposure System
|
1
|
|
|
 |
Scotia, New York |
|
 |
24564
|
Quintel
|
Quintel |
UL 7000 IR |
in Mask Aligners
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM:Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
|
1
|
|
|
F* |
Scotia, New York |
|
 |
4005
|
Solitec
|
Solitec |
820-CB |
in Photoresist Develop Track Systems
SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE:Automatic Two-station Photoresist Coat & Bake
Designed to coat and soft bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
 |
5026
|
Solitec
|
Solitec |
5110SJC |
in Photoresist Developers
SOLITEC SCRUBBER/HI PRESSURE SPRAY: Scrubber/Hi Pressure Spray
|
1
|
|
|
F* |
Scotia, New York |
|
 |
4007
|
Solitec
|
Solitec |
820-PTDB |
in Photoresist Develop Track Systems
SOLITEC TEMPERATURE CONTROLLED POSITIVE DEVELOPER:Temperature Controlled Positive Developer with Hot Plate Bake
Designed to develop and hard bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
 |
206300
|
Specialty Coating
|
Specialty Coating |
P3201 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS DIP COATER:Dip Coater
|
1
|
|
7,752.08 |
 |
Scotia, New York |
|
 |
206539
|
Specialty Coating
|
Specialty Coating |
G3-8 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS SPIN COATER 8":Spin Coater
|
1
|
|
4,501.21 |
 |
Scotia, New York |
|
 |
249036
|
Suss MicroTec
|
Suss MicroTec |
ACS200 Gen3 |
in Photoresist Coaters
Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm:Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm Suss spray coater
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
42108
|
Suss MicroTec
|
Suss MicroTec |
FALCON - ACS 200 |
in Photoresist Coater/Developers
SUSS MICROTEC FALCON ACS 200:Fully Automated High Throughput Coating, Developing Cluster System
System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
|
1
|
|
|
F* |
Scotia, New York |
|
 |
154092
|
Silicon Valley Group
|
Silicon Valley Group |
8136 |
in Photoresist Tools
SVG SILICON VALLEY GROUP SINGLE TRACK HOT PLATE OVEN:Single Track Hot Plate Oven
Silicon Valley Group 8136
|
1
|
|
|
 |
Scotia, New York |
|
 |
131377
|
Tamarack Scientific
|
Tamarack Scientific |
Contact Mask Exposure |
in Mask Aligners
Tamarack Scientific Mask Aligner:Contact Mask Exposure System
|
1
|
|
|
F* |
Plano, TX |
|
 |
254475
|
Tel
|
Tel |
ACT12 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
254137
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250840
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250841
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250847
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
254477
|
Tel
|
Tel |
LITHIUS PRO-I |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
254106
|
Tel
|
Tel |
Lithius ProV |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
254101
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110231:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254102
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110233:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254103
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V120318:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254240
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
255441
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257159
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360588:2-Block-Machine
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
257160
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360844:2-Block-Machine
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
255442
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
255443
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257161
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MDG360846:2-Block-Machine
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
251087
|
Tel
|
Tel |
MARK8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250488
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A1 M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250489
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250490
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250491
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#2 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Shinwa CP-I Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last time in production: 01.01.24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254104
|
Tel
|
Tel |
PROi |
in Photoresist Coaters
TEL PROi, 300mm, s/n: N100355:Cot / DEV
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257162
|
Tel
|
Tel |
ProZ |
in Photoresist Coaters
|
1
|
|
|
N* |
Malta, New York |
|
 |
254241
|
Tel
|
Tel |
ProZ |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
249204
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
LITHIUS I+ |
in Photoresist Coaters
TEL, LITHIUS I+, 300mm, S/N G481358:TEL, LITHIUS I+, 300mm, S/N G481358
|
1
|
|
|
 |
Singapore |
|
 |
233207
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
Lithius |
in Photoresist Coaters
TEL, Lithius, 300mm, S/N G260815:TEL, Lithius, 300mm, S/N G260815
|
1
|
|
|
 |
Singapore |
|
 |
245289
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
8181523 |
in Photoresist Coaters
TEL, Mark 8, 200mm, S/N 8181523:TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only.
|
1
|
|
|
 |
Singapore |
|