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	View All Offers Under Lithography Equipment » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Offers into sub-categories under Lithography Equipment List all 20 product types under Lithography Equipment

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   13097 AB-M Inc.   AB-M Inc.   IR Wafer Aligner  Lithography Equipment - Other in Lithography Equipment AB-M INC. IR WAFER ALIGNER STATION: IR Wafer Aligner Station 1   Scotia, New York 89964 AIO Microservice   AIO Microservice   8826  Robotic PR Coater Tracks in Photoresist Coater Tracks AIO MICROSERVICE DUAL TRACK COAT SYSTEM: Dual Track Coat System 1   F* Scotia, New York 257175 AMAT   AMAT   Verity2 SEM  Lithography Equipment - Other in Lithography Equipment 1   N* Singapore 254474 ASML   ASML   AT400C  I-Line Wafer Stepper in Wafer Steppers 1   Singapore 254366 ASML   ASML   AT850C  I-Line Wafer Stepper in Wafer Steppers 1   Singapore 254365 ASML   ASML   AT850C  I-Line Wafer Stepper in Wafer Steppers 1   Singapore 254257 ASML   ASML   NXT1950i  Deep UV Wafer Stepper in Wafer Steppers 1   Malta, New York 254256 ASML   ASML   NXT1950i  Deep UV Wafer Stepper in Wafer Steppers 1   Malta, New York 254107 ASML   ASML   NXT1950i  Deep UV Wafer Stepper in Wafer Steppers 1   Malta, New York 254111 ASML   ASML   XT1400E  Deep UV Wafer Stepper in Wafer Steppers 1   Singapore 254110 ASML   ASML   XT1900Gi  Deep UV Wafer Stepper in Wafer Steppers ASML XT1900Gi, 300mm, s/n: 5884: Immersion scanner 1   Singapore 254199 ASML   ASML   Yieldstar S-200B  Lithography Equipment - Other in Lithography Equipment 1   Dresden, Saxony 254167 Axcelis Technologies   Axcelis Technologies   PCU 200  Lithography Equipment - Other in Lithography Equipment 1   Singapore 254164 Axcelis Technologies   Axcelis Technologies   PCU 200  Lithography Equipment - Other in Lithography Equipment 1   Singapore 254163 Axcelis Technologies   Axcelis Technologies   PCU 200  Lithography Equipment - Other in Lithography Equipment AXCELIS PCU 200, 200mm, s/n: PU6C289X: PHOTOSTABILIZER 1   Singapore 254165 Axcelis Technologies   Axcelis Technologies   PCU 200  Lithography Equipment - Other in Lithography Equipment 1   Singapore 254166 Axcelis Technologies   Axcelis Technologies   PCU 200  Lithography Equipment - Other in Lithography Equipment 1   Singapore 44185 Suss MicroTec   Suss MicroTec   RESPECT 600  Manual Photoresist Coaters in Photoresist Coaters BLE RESPECT AUTOMATIC PHOTORESIST COATER: Automatic Photoresist Coater   System is designed exclusively to coat and bake substrates using spinning and heating techniques. BLE was acquired by Suss Microtec 1   F* Scotia, New York 44184 Suss MicroTec   Suss MicroTec   Respect 600  Manual Photoresist Developers in Photoresist Developers BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER: System is designed exclusively to develop and bake substrates using spinning and heating techniques BLE was acquired by Suss Microtec 1   F* Scotia, New York 77000 Brewer Science   Brewer Science   CEE 4000  Robotic PR Coater Tracks in Photoresist Coater Tracks BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM: Programmable Automated Coat/Bake Track System 2   F* Scotia, NY 250700 Canon   Canon   3000i4  I-Line Wafer Stepper in Wafer Steppers Canon FPA 3000 i4 Stepper : Only for sale for an competetive price!   Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts  Last Time in production: 05/24   1   Dresden, Saxony 250701 Canon   Canon   3000i4  I-Line Wafer Stepper in Wafer Steppers Canon FPA 3000 i4 Stepper : Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts  Last Time in production: 05/24   1   Dresden, Saxony 41529 Headway   Headway   CB15  Manual Photoresist Coaters in Photoresist Coaters HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER: Manual Photoresist Spin Coater 1   F* Scotia, New York 9971 Headway   Headway   P8X20-30  Manual Photoresist Coaters in Photoresist Coaters Headway Research P8X20-30: AC Spindle Motor for AC-101 Photoresist Spinner, New 1   Plano, TX 254473 InnerSense   InnerSense   Load Port - P/N: ALP613A  Lithography Equipment - Other in Lithography Equipment 1   Dresden, Saxony 254364 InnerSense   InnerSense   Load Port - P/N: ALP613A  Lithography Equipment - Other in Lithography Equipment 1   Dresden, Saxony 112607 Karl Suss   Karl Suss   MA 150M  Contact/Proximity Mask Aligners in Mask Aligners KARL SUSS MANUAL MASK ALIGNER 150 MM: Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter. 1   F* Scotia, New York 253369 KLA-Tencor   KLA-Tencor   5200  Lithography Equipment - Other in Lithography Equipment 1   Burlington, Vermont 254368 KLA-Tencor   KLA-Tencor   TERON 650  Lithography Equipment - Other in Lithography Equipment 1   Malta, New York 254226 Lasertec   Lasertec   BI100  Lithography Equipment - Other in Lithography Equipment Lasertec BI100, s/n: BA002A408JR: EUV Reticle Back Side Inspection 1   Malta, New York 257163 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers 1   N* Dresden, Saxony 257165 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers 1   N* Dresden, Saxony 257164 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers 1   N* Dresden, Saxony 254329 Nikon   Nikon   S208D  Deep UV Wafer Stepper in Wafer Steppers 1   Singapore 248319 Nikon   Nikon   NSR-2205EX14C  Deep UV Wafer Stepper in Wafer Steppers Nikon, NSR-2205EX14C, 200mm, S/N 7573113: Nikon, NSR-2205EX14C, 200mm, S/N 7573113 1   Singapore 248320 Nikon   Nikon   NSR-2205EX14C  Deep UV Wafer Stepper in Wafer Steppers Nikon, NSR-2205EX14C, 200mm, S/N 7573120: Nikon, NSR-2205EX14C, 200mm, S/N 7573120 1   Singapore 249907 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: 8732039. LKSC760: NIKON Main Body 1   Singapore 247027 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: 8732048: NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system 1   Dresden, Saxony 247605 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: S62 0290202: Lithography Step and repeat scanning system 1   Dresden, Saxony 160264 Quintel   Quintel   Q-804  Contact/Proximity Mask Aligners in Mask Aligners QUINTEL MASK ALIGNER/EXPOSURE SYSTEM: Mask Aligner/Exposure System 1   Scotia, New York 24564 Quintel   Quintel   UL 7000 IR  Contact/Proximity Mask Aligners in Mask Aligners QUINTEL-NEUTRONIX MASK ALIGNER 200 MM: Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix 1   F* Scotia, New York 4005 Solitec   Solitec   820-CB  Standard Photoresist DevTracks in Photoresist Develop Track Systems SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE: Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers. 1   F* Scotia, New York 5026 Solitec   Solitec   5110SJC  Manual Photoresist Developers in Photoresist Developers SOLITEC SCRUBBER/HI PRESSURE SPRAY: Scrubber/Hi Pressure Spray 1   F* Scotia, New York 4007 Solitec   Solitec   820-PTDB  Standard Photoresist DevTracks in Photoresist Develop Track Systems SOLITEC TEMPERATURE CONTROLLED POSITIVE DEVELOPER: Temperature Controlled Positive Developer with Hot Plate Bake Designed to develop and hard bake semiconductor wafers. 1   F* Scotia, New York 206300 Specialty Coating   Specialty Coating   P3201  Manual Photoresist Coaters in Photoresist Coaters SPECIALTY COATING SYSTEMS DIP COATER: Dip Coater 1 7,752.08 Scotia, New York 206539 Specialty Coating   Specialty Coating   G3-8  Manual Photoresist Coaters in Photoresist Coaters SPECIALTY COATING SYSTEMS SPIN COATER 8": Spin Coater 1 4,501.21 Scotia, New York 249036 Suss MicroTec   Suss MicroTec   ACS200 Gen3  Manual Photoresist Coaters in Photoresist Coaters Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm: Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm Suss spray coater 1   East Fishkill, New York 42108 Suss MicroTec   Suss MicroTec   FALCON - ACS 200  Automated Coating and Developing Cluster System in Photoresist Coater/Developers SUSS MICROTEC FALCON ACS 200: Fully Automated High Throughput Coating, Developing Cluster System   System configured for Anti-reflective coating (A.R.C) and Ebeam Resist. 1   F* Scotia, New York 154092 Silicon Valley Group   Silicon Valley Group   8136  Photoresist Curing Tools in Photoresist Tools SVG SILICON VALLEY GROUP SINGLE TRACK HOT PLATE OVEN: Single Track Hot Plate Oven Silicon Valley Group 8136 1   Scotia, New York 131377 Tamarack Scientific   Tamarack Scientific   Contact Mask Exposure  Contact/Proximity Mask Aligners in Mask Aligners Tamarack Scientific Mask Aligner: Contact Mask Exposure System 1   F* Plano, TX 254475 Tel   Tel   ACT12  Manual Photoresist Coaters in Photoresist Coaters 1   Singapore 254137 Tel   Tel   ACT8  Manual Photoresist Coaters in Photoresist Coaters 1   Singapore 250840 Tel   Tel   ACT8  Manual Photoresist Coaters in Photoresist Coaters 1   Singapore 250841 Tel   Tel   ACT8  Manual Photoresist Coaters in Photoresist Coaters 1   Singapore 250847 Tel   Tel   ACT8  Manual Photoresist Coaters in Photoresist Coaters 1   Singapore 254477 Tel   Tel   LITHIUS PRO-I  Manual Photoresist Coaters in Photoresist Coaters 1   Singapore 254106 Tel   Tel   Lithius ProV  Manual Photoresist Coaters in Photoresist Coaters 1   Malta, New York 254101 Tel   Tel   Lithius ProVi  Manual Photoresist Coaters in Photoresist Coaters TEL Lithius ProVi, 300mm, s/n: V110231: Immersion Coat and Develop 1   Malta, New York 254102 Tel   Tel   Lithius ProVi  Manual Photoresist Coaters in Photoresist Coaters TEL Lithius ProVi, 300mm, s/n: V110233: Immersion Coat and Develop 1   Malta, New York 254103 Tel   Tel   Lithius ProVi  Manual Photoresist Coaters in Photoresist Coaters TEL Lithius ProVi, 300mm, s/n: V120318: Immersion Coat and Develop 1   Malta, New York 254240 Tel   Tel   Lithius ProVi  Manual Photoresist Coaters in Photoresist Coaters 1   Malta, New York 255441 Tel   Tel   LITHIUS  Manual Photoresist Coaters in Photoresist Coaters 1   Dresden, Saxony 257159 Tel   Tel   LITHIUS  Manual Photoresist Coaters in Photoresist Coaters TEL LITHIUS, 300mm, s/n: MD-G360588: 2-Block-Machine 1   N* Dresden, Saxony 257160 Tel   Tel   LITHIUS  Manual Photoresist Coaters in Photoresist Coaters TEL LITHIUS, 300mm, s/n: MD-G360844: 2-Block-Machine 1   N* Dresden, Saxony 255442 Tel   Tel   LITHIUS  Manual Photoresist Coaters in Photoresist Coaters 1   Dresden, Saxony 255443 Tel   Tel   LITHIUS  Manual Photoresist Coaters in Photoresist Coaters 1   Dresden, Saxony 257161 Tel   Tel   LITHIUS  Manual Photoresist Coaters in Photoresist Coaters TEL LITHIUS, 300mm, s/n: MDG360846: 2-Block-Machine 1   N* Dresden, Saxony 251087 Tel   Tel   MARK8  Manual Photoresist Coaters in Photoresist Coaters 1   Singapore 250488 Tel   Tel   MK7-S  Lithography Equipment - Other in Lithography Equipment TEL MK7-S Coater_Developer: missing parts: 2 resist pumps, 1Developer Line   Add. Info: TYP A1 M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes  Last Time in production 1/1/24   1   Dresden, Saxony 250489 Tel   Tel   MK7-S  Lithography Equipment - Other in Lithography Equipment TEL MK7-S Coater_Developer: missing parts: 2 resist pumps, 1Developer Line   Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24   1   Dresden, Saxony 250490 Tel   Tel   MK7-S  Lithography Equipment - Other in Lithography Equipment TEL MK7-S Coater_Developer: missing parts: 2 resist pumps, 1Developer Line   Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes 1   Dresden, Saxony 250491 Tel   Tel   MK7-S  Lithography Equipment - Other in Lithography Equipment TEL MK7-S Coater_Developer: missing parts: 2 resist pumps, 1Developer Line   Add. Info: TYP A M/C Typ FC-9801F#2 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Shinwa CP-I Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes   Last time in production: 01.01.24 1   Dresden, Saxony 254104 Tel   Tel   PROi  Manual Photoresist Coaters in Photoresist Coaters TEL PROi, 300mm, s/n: N100355: Cot / DEV 1   Dresden, Saxony 257162 Tel   Tel   ProZ  Manual Photoresist Coaters in Photoresist Coaters 1   N* Malta, New York 254241 Tel   Tel   ProZ  Manual Photoresist Coaters in Photoresist Coaters 1   Malta, New York 249204 Tokyo Electron Limit   Tokyo Electron Limit   LITHIUS I+  Manual Photoresist Coaters in Photoresist Coaters TEL, LITHIUS I+, 300mm, S/N G481358: TEL, LITHIUS I+, 300mm, S/N G481358 1   Singapore 233207 Tokyo Electron Ltd   Tokyo Electron Ltd   Lithius  Manual Photoresist Coaters in Photoresist Coaters TEL, Lithius, 300mm, S/N G260815: TEL, Lithius, 300mm, S/N G260815 1   Singapore 245289 Tokyo Electron Limit   Tokyo Electron Limit   8181523  Manual Photoresist Coaters in Photoresist Coaters TEL, Mark 8, 200mm, S/N 8181523: TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only. 1   Singapore

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Lithography Equipment: AB-M Inc., AIO Microservice, AMAT, ASML, Axcelis Technologies GmbH, Brewer Science, Canon, Headway, InnerSense, Karl Suss, KLA-Tencor, Lasertec, Nikon, Nikon, Quintel, Silicon Valley Group, Solitec, Specialty Coating Systems, Suss MicroTec, Tamarack Scientific, Tel, Tokyo Electron Limited, Tokyo Electronics Limited