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ALL CATEGORIES   Wafer Fabrication Eq   Lithography Eq

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	View All Offers Under Exposure Tools » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Offers into sub-categories under Exposure Tools List all 8 product types under Exposure Tools

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   254474 ASML   ASML   AT400C  I-Line Wafer Stepper in Wafer Steppers 1   Singapore 254366 ASML   ASML   AT850C  I-Line Wafer Stepper in Wafer Steppers 1   Singapore 254365 ASML   ASML   AT850C  I-Line Wafer Stepper in Wafer Steppers 1   Singapore 254257 ASML   ASML   NXT1950i  Deep UV Wafer Stepper in Wafer Steppers 1   Malta, New York 254256 ASML   ASML   NXT1950i  Deep UV Wafer Stepper in Wafer Steppers 1   Malta, New York 254107 ASML   ASML   NXT1950i  Deep UV Wafer Stepper in Wafer Steppers 1   Malta, New York 254111 ASML   ASML   XT1400E  Deep UV Wafer Stepper in Wafer Steppers 1   Singapore 254110 ASML   ASML   XT1900Gi  Deep UV Wafer Stepper in Wafer Steppers ASML XT1900Gi, 300mm, s/n: 5884: Immersion scanner 1   Singapore 250700 Canon   Canon   3000i4  I-Line Wafer Stepper in Wafer Steppers Canon FPA 3000 i4 Stepper : Only for sale for an competetive price!   Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts  Last Time in production: 05/24   1   Dresden, Saxony 250701 Canon   Canon   3000i4  I-Line Wafer Stepper in Wafer Steppers Canon FPA 3000 i4 Stepper : Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts  Last Time in production: 05/24   1   Dresden, Saxony 112607 Karl Suss   Karl Suss   MA 150M  Contact/Proximity Mask Aligners in Mask Aligners KARL SUSS MANUAL MASK ALIGNER 150 MM: Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter. 1   F* Scotia, New York 257163 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers 1   N* Dresden, Saxony 257165 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers 1   N* Dresden, Saxony 257164 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers 1   N* Dresden, Saxony 254329 Nikon   Nikon   S208D  Deep UV Wafer Stepper in Wafer Steppers 1   Singapore 248319 Nikon   Nikon   NSR-2205EX14C  Deep UV Wafer Stepper in Wafer Steppers Nikon, NSR-2205EX14C, 200mm, S/N 7573113: Nikon, NSR-2205EX14C, 200mm, S/N 7573113 1   Singapore 248320 Nikon   Nikon   NSR-2205EX14C  Deep UV Wafer Stepper in Wafer Steppers Nikon, NSR-2205EX14C, 200mm, S/N 7573120: Nikon, NSR-2205EX14C, 200mm, S/N 7573120 1   Singapore 249907 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: 8732039. LKSC760: NIKON Main Body 1   Singapore 247027 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: 8732048: NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system 1   Dresden, Saxony 247605 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: S62 0290202: Lithography Step and repeat scanning system 1   Dresden, Saxony 160264 Quintel   Quintel   Q-804  Contact/Proximity Mask Aligners in Mask Aligners QUINTEL MASK ALIGNER/EXPOSURE SYSTEM: Mask Aligner/Exposure System 1   Scotia, New York 24564 Quintel   Quintel   UL 7000 IR  Contact/Proximity Mask Aligners in Mask Aligners QUINTEL-NEUTRONIX MASK ALIGNER 200 MM: Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix 1   F* Scotia, New York 131377 Tamarack Scientific   Tamarack Scientific   Contact Mask Exposure  Contact/Proximity Mask Aligners in Mask Aligners Tamarack Scientific Mask Aligner: Contact Mask Exposure System 1   F* Plano, TX

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Exposure Tools: ASML, Canon, Karl Suss, Nikon, Nikon, Quintel, Tamarack Scientific