 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
 |
1798
|
Accel
|
Accel |
MICROCEL II |
in Wet Processing Equipment
ACCEL CORP. SEMI-AUTOMATIC CENTRIFUGAL CLEANING SYSTEM:Semi-Automatic Centrifugal Cleaning System
Used for cleaning electronic assemblies Three step process.: Washing, rinsing, drying - Circuit assemblies
- Precision parts
- Medical devices
- Bumper wafers
- Flip chips , MCMs, BGAs, and hybrid circuits
No drain or waste water treatment required Automatic recovery of solvents from waste water Four stage water purification process
|
1
|
|
|
 |
Scotia, New York |
|
 |
6938
|
Akrion
|
Akrion |
UP-V2 HL.2000 |
in Wafer Cleaners
AKRION UP-V2 HL.2000:3 Tank Semiautomatic Chrome Etch Station w/Linear Robotic Transfer
|
1
|
|
|
F* |
Plano, TX |
|
 |
24073
|
Akrion
|
Akrion |
UP-V2 SA.3200 |
in Wafer Cleaners
Akrion UP-V2 SA.3200 - PARTS TOOL ONLY:Semi-Automatic Wet Process Station Parts Including Process Tanks, Robots and More
|
1
|
|
|
F* |
Plano, TX |
|
 |
254082
|
AMAT
|
AMAT |
ACMS0XT-ASG-E |
in Wet Processing Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
253451
|
AMAT
|
AMAT |
RE10F3ECD124 |
in Wet Processing Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
253447
|
AMAT
|
AMAT |
RE10F2ECD1201 |
in Wet Processing Equipment
AMAT RAIDER ECD310, 300mm, s/n: T239201:RAIDER ECD310[NiPlate]
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
253448
|
AMAT
|
AMAT |
RE12F2ECD1202 |
in Wet Processing Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
253452
|
AMAT
|
AMAT |
RE10F3ECD1202 |
in Wet Processing Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254258
|
AMAT
|
AMAT |
SPECTRUM 300 |
in Wet Processing Equipment
AMAT SPECTRUM 300, 300mm, s/n: T339636:Polyimide Rework Sink
|
1
|
|
|
|
Malta, New York |
|
 |
230352
|
Applied Materials
|
Applied Materials |
P16-072 |
in Wet Processing Equipment
Ancolyzer P16-072:3 x Dosage Additive 2 x Slipstreams with pump 2 x Dosing VMS incl. Bleed & Feed Bulk Fill Tanks additional doses of H2O2 und H2SO4 Scanner incl. software
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254045
|
Applied Materials
|
Applied Materials |
Raider Edge ECD |
in Wet Processing Equipment
Applied Materials Raider Edge ECD Liftoff Tool:Applied Materials Raider Edge ECD Liftoff Tool - 3ea Process Tanks
- 2ea Chemical Dispense Cabinets
- HCl, Dilute HF, NH4OH, H2O2, Piranha & Chrome Etch
- Please Inquire for Additional Details
|
1
|
|
|
 |
Austin, Texas |
|
 |
3882
|
Bold Technologies
|
Bold Technologies |
N/A |
in Wafer Cleaners
BOLD TECHNOLOGIES SEMI-AUTOMATED ACID WET BENCH SYSTEM:Semi-Automated Acid Wet Bench System
|
1
|
|
|
F* |
Scotia, New York |
|
 |
254198
|
CFM Technologies
|
CFM Technologies |
FullFlow 1/99 8100 |
in Wet Processing Equipment
CFM FullFlow 1/99 8100, 200mm, s/n: Cont 1 1188:HP & Sulfuric Ozone
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
254197
|
CFM Technologies
|
CFM Technologies |
FullFlow 1/99 8100 |
in Wet Processing Equipment
CFM FullFlow 1/99 8100, 200mm, s/n: Cont 2 1188:HP & Sulfuric Ozone
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
257158
|
CFM Technologies
|
CFM Technologies |
Fullflow 7/96 |
in Wet Processing Equipment
|
1
|
|
|
N* |
Burlington, Vermont |
|
 |
255102
|
Dainippon Screen
|
Dainippon Screen |
FC-3100 |
in Wet Processing Equipment
DNS FC-3100, 300mm, s/n: 630600251A:CHEMICAL RESIST STRIP
|
1
|
|
|
 |
Singapore |
|
 |
252617
|
DNS
|
DNS |
SS-3100 |
in Wet Processing Equipment
DNS SS-3100, 300mm, s/n: 530600256A:BRUSH CLEANER
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
252618
|
DNS
|
DNS |
SS-3100 |
in Wet Processing Equipment
DNS SS-3100, 300mm, s/n: 530600273A:WET SCRUBBER/BRUSH CLEANER
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
254161
|
DNS
|
DNS |
SS-W80A-AR |
in Wet Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
252614
|
DNS
|
DNS |
SU-3200 |
in Wet Processing Equipment
DNS SU-3200, 300mm, s/n: 530N00104A:12 CHAMBER AQUASPIN
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
252615
|
DNS
|
DNS |
SU-3200 |
in Wet Processing Equipment
DNS SU-3200, 300mm, s/n: 530N00131A:FEOL CLEAN
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
252616
|
DNS
|
DNS |
SU-3200 |
in Wet Processing Equipment
DNS SU-3200, 300mm, s/n: 530N00151A:FEOL CLEAN
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
254252
|
DNS
|
DNS |
SU3100 |
in Wet Processing Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254067
|
DNS
|
DNS |
SU3100 |
in Wet Processing Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
254367
|
DNS
|
DNS |
SU3100 |
in Wet Processing Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
251070
|
FSI
|
FSI |
EXCALIBUR ISR |
in Wet Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
245290
|
FSI
|
FSI |
Excalibur ISR |
in Wet Processing Equipment
FSI, Excalibur ISR 901499-314, 200mm, S/N 0902-0123-1094:FSI, Excalibur ISR 901499-314, 200mm, S/N 0902-0123-1094
|
1
|
|
|
 |
Singapore |
|
 |
43636
|
Hamatech
|
Hamatech |
104180 |
in Spray/Brush Scrubbers
HAMATECH AUTOMATIC SUBSTRATE CLEANER:Automatic Substrate Cleaner
|
1
|
|
|
F* |
Scotia, New York |
|
 |
206648
|
Imtec Acculine
|
Imtec Acculine |
QZ-A1502 |
in Wet Processing Equipment
IMTEC ACCUBATH CONSTANT TEMPERATURE QUARTZ BATH:Constant Temperature Bath
|
1
|
|
1,575.42 |
F* |
Scotia, New York |
|
 |
206630
|
Imtec Acculine
|
Imtec Acculine |
QRT/S-A1502 |
in Wet Processing Equipment
IMTEC ACCUBATH QUARTZ PROCESS BATH:Recirculating Quartz Bath
|
1
|
|
1,850.50 |
 |
Scotia, New York |
|
 |
160726
|
Interlab
|
Interlab |
MRS1583 |
in Wafer Cleaners
INTERLAB MICRO RINSE SYSTEM:Micro Rinse System
|
1
|
|
|
|
Scotia, NY |
|
 |
189871
|
Leatherwood Plastics
|
Leatherwood Plastics |
LPD333.FR4.FT |
in Wafer Cleaners
Leatherwood LPD333.FR4.FT Acid Wet Station:Leatherwood LPD333.FR4.FT Acid Wet Station - For up to 6" Wafers
- Automatic Tank Transfer
|
1
|
|
|
|
Plano, Texas |
|
 |
245226
|
Leatherwood Plastics
|
Leatherwood Plastics |
LPAC100.SS.X |
in Wafer Cleaners
LEATHERWOOD PLASTICS 6' SOLVENT BENCH REAR EXHAUST: With Fire Suppression System by Mark Systems
|
1
|
|
|
 |
Scotia, New York |
|
 |
85387
|
Lufran
|
Lufran |
SB5-403-A11 |
in Wet Processing Equipment
LUFRAN PROCESS TANK/HEATER/PROCESS CONTROLLER:Process Tank/Heater/Process Controller
Compatible with sulphuric, nitric or acetic acids, various strippers even KOH and HF.
|
2
|
|
3,000.80 |
 |
Scotia, New York |
|
 |
172359
|
Modutek
|
Modutek |
QA14-DA1 |
in Wet Processing Equipment
MODUTEK MODUBATH CONSTANT TEMPERATURE QUARTZ BATH:Constant Temperature Bath with MicroTemp Series Process Controller
QA Series
|
1
|
|
1,575.42 |
 |
Scotia, New York |
|
 |
239644
|
Ramgraber
|
Ramgraber |
SST |
in Wafer Cleaners
Ramgraber SST:Used Configuration: Tank 1: EKC Tank 2: P1331 Tank 3 and 4: DMF Tank 5: IPA Known errors: Filter from tank 4 is leaking Heater 1 from tank 4 is broken Heater 3 from tank 4 is broken
|
1
|
|
|
F* |
Villach, Carinthia |
|
 |
181396
|
Reynoldstech
|
Reynoldstech |
Resist Develop Station |
in Wafer Cleaners
REYNOLDSTECH PHOTORESIST DEVELOP HOOD:Photoresist Develop Station with Headway Wafer Spin Cleaner
|
1
|
|
|
F* |
Scotia, New York |
|
 |
256749
|
Semitool
|
Semitool |
Cintillio SAT |
in Wafer Cleaners
Semitool Cintillio SAT:Toolcontroller with Windows XP Remote controller Ready for endpointdetection system Process: Copper / Titan-Wolfram / dHF (dilluted HF) div. spareparts possible (negotiable)
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
 |
186319
|
Semitool
|
Semitool |
ST-260D |
in Wafer Cleaners
SEMITOOL RHETECH SPIN RINSE DRYER:Single Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
 |
188065
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER :Dual Stack Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
 |
170192
|
Semitool
|
Semitool |
ST-840 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 100MM:Spin Rinse Dryer up to 100mm
|
3
|
|
|
F* |
Scotia, New York |
|
 |
170195
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm Built in Resistivity Monitor
|
1
|
|
|
F* |
Scotia, New York |
|
 |
170196
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm
|
1
|
|
|
 |
Scotia, New York |
|
 |
170197
|
Semitool
|
Semitool |
ST-460 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER UP TO 125MM:Spin Rinse Dryer up to 125mm
Built in Resistivity Monitor
|
1
|
|
|
F* |
Scotia, New York |
|
 |
7358
|
Semi-Tool
|
Semi-Tool |
WST 406 MG |
in Wet Processing Equipment
SEMITOOL SPRAY SOLVENT TOOL:Spray Solvent Tool Refurbished by Rhetech in 2000
Photoresist develop/strip, polymer removal, pre-metal deposition cleaning. High speed rinse and dry of wafers, with low particle counts and reduced DI water consumption.
|
2
|
|
|
F* |
Scotia, New York |
|
 |
135159
|
Semi-Tool
|
Semi-Tool |
WST 306 MG |
in Wet Processing Equipment
SEMITOOL SPRAY SOLVENT TOOL:Spray Solvent Tool
Rhetech Semitool WST 306 MG
|
1
|
|
|
 |
Scotia, New York |
|
 |
223579
|
Semitool
|
Semitool |
SRD Rotors |
in Wafer Cleaners
SEMITOOL VERTEQ SRD ROTORS:Various Rotors from Semitool and Verteq. Part numbers and quantities are below.
|
1
|
|
|
 |
Scotia, New York |
|
 |
159909
|
Semitool
|
Semitool |
ST 440S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 100 MM:Spin Rinse Dryer up to 100mm
|
1
|
|
|
F* |
Scotia, New York |
|
 |
8999
|
Semitool
|
Semitool |
ST 460S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 150 MM ST 460S:Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
 |
254138
|
SEZ
|
SEZ |
203 |
in Wet Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
252586
|
LAM Research Corp.
|
LAM Research Corp. |
SEZ SP 203 |
in Wet Processing Equipment
Spin Etch Tool (8''tool):Spin Etch Tool (8''tool)
|
1
|
|
|
 |
Kulim, Kedah |
|
 |
38830
|
SRD ROTORS
|
SRD ROTORS |
in Wafer Cleaners
|
19
|
|
|
|
Scotia, New York |
|
 |
81501
|
Terra Universal
|
Terra Universal |
|
in Wafer Cleaners
Terra Universal:8 Tank Stainless Steel Sink
|
1
|
|
|
 |
Plano, TX |
|
 |
5475
|
Verteq
|
Verteq |
1600-55M |
in Wafer Cleaners
VERTEQ DUAL STACK SPIN RINSE DRYERS:Dual Stack Spin Rinse Dryers
|
2
|
|
|
F* |
Scotia, New York |
|
 |
28697
|
Verteq
|
Verteq |
IPA 2800 |
in Wafer Cleaners
VERTEQ IPA VAPOR DRYER 200 MM:IPA Vapor Dryer
IPA 2800 is a drying system using isopropyl alcohol to provide a clean,dry surface on wafers and substrates System features a class 10 elevator,ultra-pure nitrogen loading environment, short load-to-vapor time and fast recovery between cycles The system is partical netural at 0.2 microns
This system is NOT a marangoni style
|
1
|
|
|
F* |
Scotia, New York |
|
 |
161905
|
Verteq
|
Verteq |
ST600-42L |
in Wafer Cleaners
Verteq ST600-42L:Megasonic Cleaner
|
1
|
|
|
|
Plano, TX |
|
 |
83051
|
Verteq
|
Verteq |
ST600-42TL |
in Wafer Cleaners
Verteq ST600-42TL:Megasonic Cleaner
|
1
|
|
|
 |
Plano, TX |
|
 |
20103
|
Verteq
|
Verteq |
1600-55-A |
in Wafer Cleaners
VERTEQ SUPERCLEAN SPIN RINSE DRYER:Spin Rinse Dryer
|
1
|
|
|
 |
Scotia, New York |
|
 |
250971
|
AP&S Customized Soln
|
AP&S Customized Soln |
|
in Wet Processing Equipment
WET Clean Strip (8''tool):WET Clean Strip (8''tool)
|
1
|
|
|
 |
Kulim, Kedah |
|
 |
250972
|
AP&S Customized Soln
|
AP&S Customized Soln |
|
in Wet Processing Equipment
WET Clean Strip (8''tool):WET Clean Strip (8''tool), Currently the tool still working.
|
1
|
|
|
 |
Kulim, Kedah |
|
 |
253558
|
Tel
|
Tel |
|
in Wet Processing Equipment
WET Clean with Ultrasonic Cleaner 8'':WET Clean with Ultrasonic Cleaner 8''
|
1
|
|
|
 |
Kulim, Kedah |
|