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Offered at
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EVG Lithoscale - Maskless Exposure System
Up to 300mm, Low-Volume Manufacturing, automated substrate handling Brandnew and unsed System available for an attractive price! Out of package Hyperion Technical configuration: • For maskless exposure of wafer sizes up to 300 mm • High precision stage including contactless wedge error compensation • Self calibration via integrated sensors • Extensibility up to two (2) exposure heads in total for highest throughput • Separate control unit • EVG CIM Framework software • Self diagnostics during machine start up, automatic initialization of all motors, position end switches, sensors and pneumatic • Inspection available on request • PC controlled operating environment • Solid state drive and hard drive for high availability and reliability • Supported layout format: GDSII
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