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	View All Offers Under Parallel Plasma Tools » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Offers into sub-categories under Parallel Plasma Tools List all 12 product types under Parallel Plasma Tools

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   87948 Applied Materials   Applied Materials   8300  Oxide Etchers in Single Chamber Plasma Tools APPLIED MATERIALS CONTROLLER: Controller 1   Scotia, New York 87949 Applied Materials   Applied Materials   8300  Oxide Etchers in Single Chamber Plasma Tools APPLIED MATERIALS SYSTEM ELECTRONICS RACK: System Electronics Rack 1   Scotia, New York 34890 LAM Research Co   LAM Research Co   490 AUTO ETCH  Poly/Nitride Etchers in Single Chamber Plasma Tools LAM RESEARCH SIX INCH NITRIDE ETCHER: Six Inch Nitride Etcher Automated Cassette to Cassette single wafer etching. 1   F* Scotia, New York 225948 Plasma-Therm   Plasma-Therm   790  Etchers - Other in Single Chamber Plasma Tools Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade: PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F Manually Loaded Process Chamber with 8” (dia.) Cathode Gas Distribution Panel with 4ea Gas Channels MKS 1479 Metal Sealed Mass Flow Controllers 4ea Additional Gas Channels Available RFPP RF5S RF Generator: 500W @ 13.56MHz RFPP AMN-5 Auto Matching Network RFPP AMNPS-2A Auto Matching Network Controller Leybold TMP 361 Turbomolecular Pump Leybold NT 150/360 Turbomolecular Pump Controller EquipmentWorks 2.6 Application SW Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol. All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol All SMC Pneumatic Valves Available from SMC USA Standard 21” Flat Panel Monitor, Keyboard & Mouse Edwards QDP40 Dry Roughing Pump NESLAB HX-75 Chiller Electrical Disconnect Box - 208V, 60Hz, 3 Ph System Fully Refurbished & Ready for Demonstration Guaranteed to Meet or Exceed OEM Specifications Price……$ 80,000.00 USD 1 80,021.44 Plano, Texas 3011 Plasma-Therm   Plasma-Therm   Wafer Batch 740/740  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM: Dual Plasma Etch and Reactive Ion Etch Processing Systems System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.   1   Scotia, New York 4054 Plasma-Therm   Plasma-Therm   73/74  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM: Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems 1   Scotia, New York 50854 Plasma-Therm   Plasma-Therm   VII 734  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE: Combination Plasma Deposition System/RIE 1   F* Scotia, New York 11919 Plasma-Therm   Plasma-Therm   VII 734MF  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM: Plasmatherm RIE/Plasma Etch System 1   F* Scotia, New York 165893 PlasmaQuest   PlasmaQuest   6" Load-Lock  Silicon Etchers in Single Chamber Plasma Tools PlasmaQuest Microwave-ECR Plasma etch system: PlasmaQuest high density plasma etch tool equipped with 6-inch load lock. Unique combo of permanent magnet and electromagnets for ECR (Electron Cyclotron Resonance) ECR-enhancement of microwave plasma. ECR operation in mTorr pressure range yields large area plasma processing capability for planar and low profile parts. Stage height adjustment range relative to core plasma activation volume enables high levels of ECR process enhancement (species activation). Originally equipped with 1000W Astex microwave delivery system (AX2110 or equivalent), but higher input power may be viable. System can be offered "as is" to experienced buyers. Full refurbishment for etch and/or PECVD processing can be considered. Configured with 2 modules including power & controls rack and vacuum module. Computer controller may function, but upgrade is recommended and should be possible. 1   Leominster, Massachusetts 206582 Plasma-Therm   Plasma-Therm   BT 6" RIE MF  Metal Etchers in Single Chamber Plasma Tools PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6": Reactive Ion Etch System BatchTop VII 1   Scotia, New York 45428 Plasma-Therm   Plasma-Therm   790 ICP  Poly/Nitride Etchers in Single Chamber Plasma Tools PLASMATHERM ICP PLASMA ETCHER: Inductively Coupled Plasma Etcher with 9.5 Inch Electrode 1   F* Scotia, New York 124315 Plasma-Therm   Plasma-Therm   790 11" RIE  Metal Etchers in Single Chamber Plasma Tools PLASMATHERM REACTIVE ION ETCH SYSTEM 11": Reactive Ion Etch System - 11" Electrode 1   F* Scotia, New York 45430 Plasma-Therm   Plasma-Therm   790 11 RIE  Metal Etchers in Single Chamber Plasma Tools PLASMATHERM REACTIVE ION ETCH SYSTEM 200MM: Reactive Ion Etch System 11" Electrode 1   Scotia, New York 201152 Plasma-Therm   Plasma-Therm   790 RIE PECVD 11"  Etchers - Other in Single Chamber Plasma Tools PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX: Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board. Both top and bottom electrodes can be powered sequentially. 1   Scotia, New York 142821 Plasma-Therm   Plasma-Therm   Unaxis 790  Etchers - Other in Single Chamber Plasma Tools PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM: Shuttle Load Lock System 1   Scotia, New York 147500 Surface Tech Sys   Surface Tech Sys   MXP Multiplex ICP HR  Etchers - Other in Single Chamber Plasma Tools SURFACE TECHNOLOGY SYSTEMS MXP ICP HR: Chlorine Etcher - Year 2003 1   Scotia, New York 102178 Surface Tech Sys   Surface Tech Sys   MXP Multiplex ICP ASE HR  Silicon Etchers in Single Chamber Plasma Tools SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER: Silicon Etcher - Year 2003 1   Scotia, New York 184779 Technics   Technics   Micro Stripper -- Series 200  Metal Etchers in Single Chamber Plasma Tools TECHNICS PLASMA ETCHER 200 WATT 13.65 MHz: Technics Micro Stripper Series 200 Plasma System 1   F* Scotia, New York 119294 Trion Technology   Trion Technology   Oracle  Cluster Plasma Tools - Oxide in Cluster Plasma Tools TRION TECHNOLOGY DIELECTRIC CLUSTER TOOL: Dielectric Cluster Tool Trion Technology Oracle 1   F* Scotia, New York 126704 Ulvac   Ulvac   NE 7800 Ferroelectric Etcher  Cluster Plasma Tools - Metal in Cluster Plasma Tools ULVAC FERROELECTRIC ETCHER: Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.   1   F* Scotia, New York

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
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  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Parallel Plasma Tools: Applied Materials, Inc., LAM Research Corp., Plasma-Therm, PlasmaQuest, Surface Technology Systems, Technics, Trion Technology, Ulvac