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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   219773 Applied Materials   Applied Materials   AKT 1600  Cluster Sputtering Tools in Single Wafer Sputtering Tools AKT APPLIED MATERIALS SPUTTERING TOOL: Cluster Sputtering Tool 1   F* Scotia, New York 22276 CHA Industries   CHA Industries   SSC 1000  Horizontal Sputterers in Batch Sputtering Tools CHA INDUSTRIES SPUTTERING SYSTEM: Sputtering System   1   F* Scotia, New York 151502 Mill Lane Eng   Mill Lane Eng   Custom Research  Horizontal Sputterers in Batch Sputtering Tools MILL LANE DUAL CHAMBER RESEARCH SPUTTERING SYSTEM: Dual Chamber Research Sputtering System 1   F* Scotia, New York 1973 Mill Lane Eng   Mill Lane Eng   4123  Standalone Sputterers in Single Wafer Sputtering Tools MILL LANE ENGINEERING REEL COATER : Reel Coater for Ribbon or Wire The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4" ID x 12" OD x 3" wide wire/ribbon spools. Wire diameter up to 0.035" (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating. 1   F* Scotia, New York 4071 MRC   MRC   902  Standalone Sputterers in Single Wafer Sputtering Tools MRC IN-LINE SPUTTER ETCH SYSTEM: In-Line Sputter-Etch System 1   F* Scotia, New York 218898 Unaxis   Unaxis   CLC200  Cluster Sputtering Tools in Single Wafer Sputtering Tools Sputtertool Clusterline Unaxis: CL-MET-04 Sputtertool with 6 chambers 1   F* Villach, Carinthia 32264 Varian   Varian   3190  Standalone Sputterers in Single Wafer Sputtering Tools VARIAN 3190 SPUTTER SYSTEM: Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter Currently configured for 100mm wafers 3 Target mini-quantums RF Etch VIPS (Vacuum Isolated Processing Station) Residual Gas Analyzer 1   F* Scotia, New York

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
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  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Sputtering Tools: Applied Materials, Inc., CHA Industries, Materials Research Corp, Mill Lane Engineering, Unaxis, Varian