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	View All Offers Under Lithography Equipment » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Offers into sub-categories under Lithography Equipment List all 20 product types under Lithography Equipment

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   13097 AB-M Inc.   AB-M Inc.   IR Wafer Aligner  Lithography Equipment - Other in Lithography Equipment AB-M INC. IR WAFER ALIGNER STATION: IR Wafer Aligner Station 1   Scotia, New York 89964 AIO Microservice   AIO Microservice   8826  Robotic PR Coater Tracks in Photoresist Coater Tracks AIO MICROSERVICE DUAL TRACK COAT SYSTEM: Dual Track Coat System 1   F* Scotia, New York 247608 ASML   ASML   XT1900GI  Deep UV Wafer Stepper in Wafer Steppers ASML, XT1900GI, 300mm, S/N 4210: ASML, XT1900GI, 300mm, S/N 4210 The cymer laser is EOL.  1   Singapore 243575 Axcelis Technologies   Axcelis Technologies   Optima MD  Deep UV Wafer Stepper in Wafer Steppers Axcelis, Optima MD, 300mm, s/n: 083015, IMP205: Axcelis, Optima MD, 300mm, s/n: 083015 Medium Current Implant 1   Dresden, Saxony 44185 Suss MicroTec   Suss MicroTec   RESPECT 600  Manual Photoresist Coaters in Photoresist Coaters BLE RESPECT AUTOMATIC PHOTORESIST COATER: Automatic Photoresist Coater   System is designed exclusively to coat and bake substrates using spinning and heating techniques. BLE was acquired by Suss Microtec 1   F* Scotia, New York 44184 Suss MicroTec   Suss MicroTec   Respect 600  Manual Photoresist Developers in Photoresist Developers BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER: System is designed exclusively to develop and bake substrates using spinning and heating techniques BLE was acquired by Suss Microtec 1   F* Scotia, New York 77000 Brewer Science   Brewer Science   CEE 4000  Robotic PR Coater Tracks in Photoresist Coater Tracks BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM: Programmable Automated Coat/Bake Track System 2   F* Scotia, NY 210404 Suss MicroTec   Suss MicroTec   Falcon Polyimid Developer  Standard Photoresist DevTracks in Photoresist Develop Track Systems Fairchild Developer Ent3C: Developer with 2 chambers for spray developing.   1   Villach, Carinthia 41529 Headway   Headway   CB15  Manual Photoresist Coaters in Photoresist Coaters HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER: Manual Photoresist Spin Coater 1   F* Scotia, New York 9971 Headway   Headway   P8X20-30  Manual Photoresist Coaters in Photoresist Coaters Headway Research P8X20-30: AC Spindle Motor for AC-101 Photoresist Spinner, New 1   Plano, TX 112607 Karl Suss   Karl Suss   MA 150M  Contact/Proximity Mask Aligners in Mask Aligners KARL SUSS MANUAL MASK ALIGNER 150 MM: Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter. 1   F* Scotia, New York 248319 Nikon   Nikon   NSR-2205EX14C  Deep UV Wafer Stepper in Wafer Steppers Nikon, NSR-2205EX14C, 200mm, S/N 7573113: Nikon, NSR-2205EX14C, 200mm, S/N 7573113 1   Singapore 245214 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers Nikon, NSR-S208D, 300mm, S/N 8732041: Nikon, NSR-S208D, 300mm, S/N 8732041 1   Singapore 247027 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: 8732048: NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system 1   Dresden, Saxony 247605 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Steppers NIKON, NSR-S208D, 300mm, s/n: S62 0290202: Lithography Step and repeat scanning system 1   Dresden, Saxony 160264 Quintel   Quintel   Q-804  Contact/Proximity Mask Aligners in Mask Aligners QUINTEL MASK ALIGNER/EXPOSURE SYSTEM: Mask Aligner/Exposure System 1   F* Scotia, New York 24564 Quintel   Quintel   UL 7000 IR  Contact/Proximity Mask Aligners in Mask Aligners QUINTEL-NEUTRONIX MASK ALIGNER 200 MM: Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix 1   F* Scotia, New York 4005 Solitec   Solitec   820-CB  Standard Photoresist DevTracks in Photoresist Develop Track Systems SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE: Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers. 1   F* Scotia, New York 5026 Solitec   Solitec   5110SJC  Manual Photoresist Developers in Photoresist Developers SOLITEC SCRUBBER/HI PRESSURE SPRAY: Scrubber/Hi Pressure Spray 1   F* Scotia, New York 4007 Solitec   Solitec   820-PTDB  Standard Photoresist DevTracks in Photoresist Develop Track Systems SOLITEC TEMPERATURE CONTROLLED POSITIVE DEVELOPER: Temperature Controlled Positive Developer with Hot Plate Bake Designed to develop and hard bake semiconductor wafers. 1   F* Scotia, New York 206300 Specialty Coating   Specialty Coating   P3201  Manual Photoresist Coaters in Photoresist Coaters SPECIALTY COATING SYSTEMS DIP COATER: Dip Coater 1 7,752.08 Scotia, New York 206539 Specialty Coating   Specialty Coating   G3-8  Manual Photoresist Coaters in Photoresist Coaters SPECIALTY COATING SYSTEMS SPIN COATER 8": Spin Coater 1 4,501.21 Scotia, New York 42108 Suss MicroTec   Suss MicroTec   FALCON - ACS 200  Automated Coating and Developing Cluster System in Photoresist Coater/Developers SUSS MICROTEC FALCON ACS 200: Fully Automated High Throughput Coating, Developing Cluster System   System configured for Anti-reflective coating (A.R.C) and Ebeam Resist. 1   F* Scotia, New York 248241 Suss Tamarack Scient   Suss Tamarack Scient   TAMARACK M423 EXCIMER  Deep UV Wafer Stepper in Wafer Steppers 1   East Fishkill, New York 154092 Silicon Valley Group   Silicon Valley Group   8136  Photoresist Curing Tools in Photoresist Tools SVG SILICON VALLEY GROUP SINGLE TRACK HOT PLATE OVEN: Single Track Hot Plate Oven Silicon Valley Group 8136 1 5,201.39 Scotia, New York 131377 Tamarack Scientific   Tamarack Scientific   Contact Mask Exposure  Contact/Proximity Mask Aligners in Mask Aligners Tamarack Scientific Mask Aligner: Contact Mask Exposure System 1   F* Plano, TX 245281 Tel   Tel   Lithius Pro i  Manual Photoresist Coaters in Photoresist Coaters TEL Lithius Pro i, 300mm, s/n: N100463, TRK1372: TEL Lithius Pro i, 300mm, s/n: N100463, TRK1372 Coater/Developer Tool 1   Dresden, Saxony 246930 Tel   Tel   Lithius  Manual Photoresist Coaters in Photoresist Coaters TEL Lithius, sn: G391405 ,300 mm, TRK1420, KrF Litho: TEL Lithius, sn: G391405 ,300 mm, TRK1420 (ALC1420TRK) 1   Dresden, Saxony 241022 Tel   Tel   Lithius  Manual Photoresist Coaters in Photoresist Coaters TEL Lithius, sn: MDG160683, ,300 mm: Coat only Tool 1   Dresden, Saxony 248321 Tokyo Electron Ltd   Tokyo Electron Ltd   ACT8  Manual Photoresist Coaters in Photoresist Coaters TEL, ACT8, 200mm, S/N 9101151: TEL, ACT8, 200mm, S/N 9101151 1   Singapore 247197 Tel   Tel   LITHIUS PRO V  Manual Photoresist Coaters in Photoresist Coaters TEL, LITHIUS PRO V, 300mm, sn: V110263, HM05: TEL, LITHIUS PRO V, 300mm, sn: V110263, Immersion Coater/Dev 1   East Fishkill, New York 247606 Tel   Tel   LITHIUS  Manual Photoresist Coaters in Photoresist Coaters TEL, LITHIUS, 300mm, sn: MDG350168: 2-Block-Machine 1   Dresden, Saxony 245289 Tokyo Electron Limit   Tokyo Electron Limit   8181523  Manual Photoresist Coaters in Photoresist Coaters TEL, Mark 8, 200mm, S/N 8181523: TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only. 1   Singapore

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
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  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Lithography Equipment: AB-M Inc., AIO Microservice, ASML, Axcelis Technologies GmbH, Brewer Science, Headway, Karl Suss, Nikon, Nikon, Quintel, Silicon Valley Group, Solitec, Specialty Coating Systems, Suss MicroTec, Suss Tamarack Scient, Tamarack Scientific, Tel, Tokyo Electron Limited, Tokyo Electronics Limited