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	View All Offers Under Chemical Vapor Deposition Equipment » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Offers into sub-categories under Chemical Vapor Deposition Equipment List all 11 product types under Chemical Vapor Deposition Equipment

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   245275 Applied Materials   Applied Materials   EPI5  Epitaxial Cluster Tools in Epitaxial Reactors AMAT EPI CENTURA HTF (EPI5): Software Ver: B6.30 CB1 Amps: 300A SBC Type: V452 Flow Point Model: Nano Valve Gas Panel Type: Configurable Wafer Size: 200mm (with conversion kit 150mm is possible) M-Monitor: CRT 3 Chambers ATM EPI With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC) HDD was upgraded to RAID System Tool called "EPI5" 1   Villach, Carinthia 218746 Applied Materials   Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment Amat P5000 CVD Tool: P500048 8 inch tool with 4 CVD chambers. Tool still in Production until (Planned until 3.23)  1   Villach, Carinthia 245288 AMAT   AMAT   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment AMAT, P5000, 200mm, S/N 4862: AMAT, P5000, 200mm, S/N 4862 1   Singapore 246605 Applied Materials   Applied Materials   Ultima CENTURA DCVD  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment AMAT, Ultima CENTURA DCVD, 200mm, S/N 302959: AMAT, Ultima CENTURA DCVD, 200mm, S/N 302959 2 chms.    1   Singapore 228193 AMAT AKT   AMAT AKT   AKT 15 K  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AKT GEN 5 PECVD CHAMBER: Chambers are unused and were never commissioned. Susceptor, gas shower and other chamber kitting not included.     5   F* Scotia, New York 228194 AMAT AKT   AMAT AKT   AKT 25 K  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AKT GEN 6 PECVD CHAMBER: Chambers are unused and were never commissioned.   Susceptor, gas shower and other chamber kitting are not installed.     5   F* Scotia, New York 229902 AMAT AKT   AMAT AKT   0690-01681  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200: CLAMP FLG SGL-CLAW NW160,200 Item is in new condition sealed in its original packing. Browse our large inventory of Applied Materials AKT PECVD GEN 5 & GEN 6 Parts. Including 25K/15K Process Chambers, Susceptors, Chamber Liners, Kitting and much more. Check out our full list here: Applied Materials AKT PECVD New/Used Surplus Parts List 1   Scotia, New York 229925 APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200  APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200: CLAMP FLG SGL-CLAW NW160,200 Item is in new condition sealed in its original packing. Browse our large inventory of Applied Materials AKT PECVD GEN 5 & GEN 6 Parts. Including 25K/15K Process Chambers, Susceptors, Chamber Liners, Kitting and much more. Check out our full list here: Applied Materials AKT PECVD New/Used Surplus Parts List   1   Scotia, New York 228262 AMAT AKT   AMAT AKT   N/A  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AMAT AKT FIXTURE DIFFUSER LIFTING 25KAXI: FIXTURE DIFFUSER LIFTING 25KAXI New surplus - item is brand new, in OEM crate.  Photo of crates is a representative photo. 2   F* Scotia, New York 228247 AMAT AKT   AMAT AKT   0244-74553 REV.2  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AMAT AKT GEN 5 15K SUSCEPTOR:  KIT SUSC FSW 1/4 CEN GTP SS 1200X1600 15 New surplus - item is brand new, in OEM crate.  Photo of crates is a representative photo. 2   Scotia, New York 228260 AMAT AKT   AMAT AKT   0244-74553  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AMAT AKT GEN 5 15K SUSCEPTOR: KIT SUSC FSW 1/4 CEN GTP SS 1200X1600 15 New surplus - item is brand new, in OEM crate.  Photo of crates is a representative photo. 2   F* Scotia, New York 228261 AMAT AKT   AMAT AKT   0244-74554 REV.3  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment APPLIED MATERIALS AMAT AKT GEN 6 25K SUSCEPTOR: KIT SUSC FSW 1500X1850 W/O BSHING New surplus - item is brand new, in OEM crate.  Photo of crates is a representative photo. 2   Scotia, New York 225959 Applied Materials   Applied Materials     Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment 1   Scotia, New York 184607 Astex   Astex   AX5000, AX6000, AX6350 or similar  Single Chamber PECVD Tools in Production Tools Astex AX5000 Microwave Plasma Diamond Growth System: Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production. System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components. Alternatively, a kit of core components can be offered for skilled users interested in building their own system. This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions. 1.5kW to 5kW microwave power input. 3 stage options: Cooled, Heated, or Thermally Floating. Integration with computer controls is strongly recommended. Chamber designs vary by vintage, but can be confirmed at the time of quotation. Please note that the chamber shown in the attached image is a new chamber.  The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design. 1   F* Leominster, Massachusetts 189843 Astex   Astex   AX6500 "Clamshell" MPCVD  Single Chamber PECVD Tools in Production Tools Astex AX6500 Bottom-launch Diamond Growth System: This in-stock equipment is offered for domestic sale within the USA only.  Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex. Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD). System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety: Chamber cleaning, Computer control updates, Higher throughput water cooling subsystem, Replacement of selected o-ring components with metal seals, and Enhanced process control/monitoring devices. The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input. Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing. Photo Note: System photo shown include a similar quality, similar vintage system sold in the past.  Actual photos or inspection available to qualified customers only. 1   Leominster, Massachusetts 137483 Astex   Astex   ECR-MOCVD-PECVD  Single Chamber PECVD Tools in Production Tools ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD): High density plasma system activated by ECR-enhanced, 2.45GHz microwave input offers PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures. Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating. Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching. This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets. 1   Leominster, Massachusetts 242019 ATV Technologie GmbH   ATV Technologie GmbH   PEO 602  Horizontal LPCVD Furnaces in LPCVD Furnaces ATV PEO 602 tube furnace: This furnace can handle wafers up to 150mm Configuration: N2 -  1500 l/min N2 -    660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg 1   Warstein, North Rhine-Westphalia 242018 ATV Technologie GmbH   ATV Technologie GmbH   PEO 603  Horizontal LPCVD Furnaces in LPCVD Furnaces ATV PEO 603 tube furnace : This furnace can handle wafers up to 150mm Configuration: N2 -  1500 l/min N2 -    660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg 1   Warstein, North Rhine-Westphalia 98056 Carbone   Carbone   G-III  Epitaxial Cluster Tools in Epitaxial Reactors CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR: Silicon Carbide 200 mm Disc Susceptor Carbone of America Part number 017893-001 5   F* Scotia, New York 207176 Dockweiler Chemicals   Dockweiler Chemicals   8000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS: Bubbler Heat Exchanger 1   Scotia, New York 207177 Dockweiler Chemicals   Dockweiler Chemicals   20000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS: Bubbler Heat Exchanger 1   Scotia, New York 115857 HFCVD System for CVD Diamond and Related Materials  HFCVD System for CVD Diamond and Related Materials  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment HFCVD System for CVD Diamond and Related Materials: Hot Filament CVD system engineered for CVD Diamond growth on a 4 inch (~100mm) rotary platen. Previously used for commercial R&D of polycrystalline CVD diamond materials. 4-inch system design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production. NOT intended or marketed for single-crystal diamond gemstone growth. Related 12-inch (~300mm) production-scale diamond HFCVD equipment is also available.  4-inch HFCVD system design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species. Cline Innovations intends to coordinate reintegration/refurbishment of this system with updated controls and interlocks.  Reintegration will likely include PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible.  1   F* Leominster, Massachusetts 202834 Kokusai   Kokusai   DJ-1236VN-DF  Vertical LPCVD Furnaces in LPCVD Furnaces HITACHI KOKUSAI, DJ-1236VN-DF, 300mm: HITACHI KOKUSAI, DJ-1236VN-DF, 300mm 1   Malta, New York 243313 Hitachi Kokusai Elec   Hitachi Kokusai Elec   DJ-1236VN-DF  Vertical LPCVD Furnaces in LPCVD Furnaces HITACHI KOKUSAI, DJ-1236VN-DF, 300mm, s/n: DN23300, FVX2488: HITACHI KOKUSAI, DJ-1236VN-DF, 300mm, FVX2488 Vertical LPCVD Furnace 1   Malta, New York 219675 LAM Research Corp.   LAM Research Corp.   Vector Express  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment LAM, Vector Express, 300mm, S/N D22437A, Ashable Hard Mask CVD: LAM, Vector Express, 300mm, S/N D22437A, Ashable Hard Mask CVD 1   Malta, New York 100429 Materials Technology   Materials Technology   02-01808  Epitaxial Cluster Tools in Epitaxial Reactors MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR: EPI 3 1/4" Barrel Susceptor MTC EPI Reactor Parts For 3 Inch Wafers 4   F* Scotia, New York 11074 Nexx Systems   Nexx Systems   Cirrus 300  Single Chamber PECVD Tools in Production Tools NEXX SYSTEMS ECR PECVD RIE SYSTEM: Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. Nexx Systems Cirrus 300 1   F* Scotia, New York 223074 Novellus Systems   Novellus Systems   Concept Two SPEED  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment Novellus Concept Two SPEED (shrink): 1 Mainframe w/ 3 Chambers  Damages/Deficites: Chamber Turbo Pumps & HF/LF Generators  EOL: Turbo Pumps   no significant failures between last 3 years 1   Dresden, Saxony 181540 Oxford Instruments   Oxford Instruments   Plasmalab System 100  Single Chamber PECVD Tools in Production Tools OXFORD INSTRUMENTS PLASMALAB 100 PECVD: PECVD TEOS Tool with Load Lock NB: System needs a computer-software upgrade.  Selling this system AS IS, WHERE IS. 1   F* Scotia, New York 242656 Applied Materials   Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  Universal CVD Teos CHAMBER B  Universal CVD Teos CHAMBER C Mark2 Etch CHAMBER D Mark2 Etch The Tool is sold with 4 chambers and was productiv until August 2023 1   Villach, Carinthia 242682 Applied Materials   Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  x   Universal CVD Teos CHAMBER B  x   Universal CVD Teos CHAMBER D x   Universal CVD Teos Tool is sold with three chambers and was used in cleanroom until August 2023 1   Villach, Carinthia 238827 Applied Materials   Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment P5000: From Chamber B following Parts are missing: RF Generator RF Match Baratron Turbo/Controller Chamber B,C,D are universal CVD etch chambers. 1   Villach, Carinthia 240853 Applied Materials   Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment P5000: 4x Standard SNIT Chambers 1   Villach, Carinthia 147470 Plasma-Therm   Plasma-Therm   790 PECVD 11"  Single Chamber PECVD Tools in Production Tools PLASMATHERM PECVD 790: Refurbished PECVD System with 11" Electrode 1   F* Scotia, NY 30246 Plasma-Therm   Plasma-Therm   VLR 700 VLR-PM1-ICRB-PM  Cluster PECVD Tools in Production Tools PLASMATHERM VLR 700: Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes. 1   F* Scotia, New York

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment: AG Associates, AMAT, Applied Materials AKT, Applied Materials, Inc., Astex, ATV Technologie GmbH, Carbone, Dockweiler Chemicals, Hitachi Kokusai Elec, Kokusai, LAM Research Corp., Materials Technology, Nexx Systems, Novellus Systems, Oxford Instruments, Plasma-Therm