|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
|
13097
|
AB-M Inc.
|
AB-M Inc. |
IR Wafer Aligner |
in Lithography Equipment
AB-M INC. IR WAFER ALIGNER STATION:IR Wafer Aligner Station
|
1
|
|
|
|
Scotia, New York |
|
|
89964
|
AIO Microservice
|
AIO Microservice |
8826 |
in Photoresist Coater Tracks
AIO MICROSERVICE DUAL TRACK COAT SYSTEM:Dual Track Coat System
|
1
|
|
|
F* |
Scotia, New York |
|
|
247608
|
ASML
|
ASML |
XT1900GI |
in Wafer Steppers
ASML, XT1900GI, 300mm, S/N 4210:ASML, XT1900GI, 300mm, S/N 4210 The cymer laser is EOL.
|
1
|
|
|
|
Singapore |
|
|
243575
|
Axcelis Technologies
|
Axcelis Technologies |
Optima MD |
in Wafer Steppers
Axcelis, Optima MD, 300mm, s/n: 083015, IMP205:Axcelis, Optima MD, 300mm, s/n: 083015 Medium Current Implant
|
1
|
|
|
|
Dresden, Saxony |
|
|
44185
|
Suss MicroTec
|
Suss MicroTec |
RESPECT 600 |
in Photoresist Coaters
BLE RESPECT AUTOMATIC PHOTORESIST COATER:Automatic Photoresist Coater
System is designed exclusively to coat and bake substrates using spinning and heating techniques. BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
|
44184
|
Suss MicroTec
|
Suss MicroTec |
Respect 600 |
in Photoresist Developers
BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER: System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
|
77000
|
Brewer Science
|
Brewer Science |
CEE 4000 |
in Photoresist Coater Tracks
BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM:Programmable Automated Coat/Bake Track System
|
2
|
|
|
F* |
Scotia, NY |
|
|
210404
|
Suss MicroTec
|
Suss MicroTec |
Falcon Polyimid Developer |
in Photoresist Develop Track Systems
Fairchild Developer Ent3C:Developer with 2 chambers for spray developing.
|
1
|
|
|
|
Villach, Carinthia |
|
|
41529
|
Headway
|
Headway |
CB15 |
in Photoresist Coaters
HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER:Manual Photoresist Spin Coater
|
1
|
|
|
F* |
Scotia, New York |
|
|
9971
|
Headway
|
Headway |
P8X20-30 |
in Photoresist Coaters
Headway Research P8X20-30:AC Spindle Motor for AC-101 Photoresist Spinner, New
|
1
|
|
|
|
Plano, TX |
|
|
112607
|
Karl Suss
|
Karl Suss |
MA 150M |
in Mask Aligners
KARL SUSS MANUAL MASK ALIGNER 150 MM:Manual Mask Aligner
The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
|
1
|
|
|
F* |
Scotia, New York |
|
|
248320
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573120:Nikon, NSR-2205EX14C, 200mm, S/N 7573120
|
1
|
|
|
|
Singapore |
|
|
245214
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
Nikon, NSR-S208D, 300mm, S/N 8732041:Nikon, NSR-S208D, 300mm, S/N 8732041
|
1
|
|
|
|
Singapore |
|
|
247027
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732048:NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
247605
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: S62 0290202:Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
160264
|
Quintel
|
Quintel |
Q-804 |
in Mask Aligners
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM:Mask Aligner/Exposure System
|
1
|
|
|
F* |
Scotia, New York |
|
|
24564
|
Quintel
|
Quintel |
UL 7000 IR |
in Mask Aligners
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM:Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
|
1
|
|
|
F* |
Scotia, New York |
|
|
4005
|
Solitec
|
Solitec |
820-CB |
in Photoresist Develop Track Systems
SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE:Automatic Two-station Photoresist Coat & Bake
Designed to coat and soft bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
|
5026
|
Solitec
|
Solitec |
5110SJC |
in Photoresist Developers
SOLITEC SCRUBBER/HI PRESSURE SPRAY: Scrubber/Hi Pressure Spray
|
1
|
|
|
F* |
Scotia, New York |
|
|
4007
|
Solitec
|
Solitec |
820-PTDB |
in Photoresist Develop Track Systems
SOLITEC TEMPERATURE CONTROLLED POSITIVE DEVELOPER:Temperature Controlled Positive Developer with Hot Plate Bake
Designed to develop and hard bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
|
206300
|
Specialty Coating
|
Specialty Coating |
P3201 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS DIP COATER:Dip Coater
|
1
|
|
7,752.08 |
|
Scotia, New York |
|
|
206539
|
Specialty Coating
|
Specialty Coating |
G3-8 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS SPIN COATER 8":Spin Coater
|
1
|
|
4,501.21 |
|
Scotia, New York |
|
|
42108
|
Suss MicroTec
|
Suss MicroTec |
FALCON - ACS 200 |
in Photoresist Coater/Developers
SUSS MICROTEC FALCON ACS 200:Fully Automated High Throughput Coating, Developing Cluster System
System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
|
1
|
|
|
F* |
Scotia, New York |
|
|
248241
|
Suss Tamarack Scient
|
Suss Tamarack Scient |
TAMARACK M423 EXCIMER |
in Wafer Steppers
|
1
|
|
|
|
East Fishkill, New York |
|
|
154092
|
Silicon Valley Group
|
Silicon Valley Group |
8136 |
in Photoresist Tools
SVG SILICON VALLEY GROUP SINGLE TRACK HOT PLATE OVEN:Single Track Hot Plate Oven
Silicon Valley Group 8136
|
1
|
|
5,201.39 |
|
Scotia, New York |
|
|
131377
|
Tamarack Scientific
|
Tamarack Scientific |
Contact Mask Exposure |
in Mask Aligners
Tamarack Scientific Mask Aligner:Contact Mask Exposure System
|
1
|
|
|
F* |
Plano, TX |
|
|
245281
|
Tel
|
Tel |
Lithius Pro i |
in Photoresist Coaters
TEL Lithius Pro i, 300mm, s/n: N100463, TRK1372:TEL Lithius Pro i, 300mm, s/n: N100463, TRK1372 Coater/Developer Tool
|
1
|
|
|
|
Dresden, Saxony |
|
|
246930
|
Tel
|
Tel |
Lithius |
in Photoresist Coaters
TEL Lithius, sn: G391405 ,300 mm, TRK1420, KrF Litho:TEL Lithius, sn: G391405 ,300 mm, TRK1420 (ALC1420TRK)
|
1
|
|
|
|
Dresden, Saxony |
|
|
241022
|
Tel
|
Tel |
Lithius |
in Photoresist Coaters
TEL Lithius, sn: MDG160683, ,300 mm:Coat only Tool
|
1
|
|
|
|
Dresden, Saxony |
|
|
248322
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
ACT8 |
in Photoresist Coaters
TEL, ACT8, 200mm, S/N 9101291:TEL, ACT8, 200mm, S/N 9101291
|
1
|
|
|
|
Singapore |
|
|
247197
|
Tel
|
Tel |
LITHIUS PRO V |
in Photoresist Coaters
TEL, LITHIUS PRO V, 300mm, sn: V110263, HM05:TEL, LITHIUS PRO V, 300mm, sn: V110263, Immersion Coater/Dev
|
1
|
|
|
|
East Fishkill, New York |
|
|
247606
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL, LITHIUS, 300mm, sn: MDG350168:2-Block-Machine
|
1
|
|
|
|
Dresden, Saxony |
|
|
245289
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
8181523 |
in Photoresist Coaters
TEL, Mark 8, 200mm, S/N 8181523:TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only.
|
1
|
|
|
|
Singapore |
|
|
|