| Item ID |
Short Description |
Product Type / Details |
#
|
Price |
Note |
Location |
| Make |
Model |
| |
|
$ |
|
 |
13097 |
AB-M Inc. |
IR Wafer Aligner |
in Lithography Equipment
|
1
|
|
14,950.00
|
F* |
Scotia, NY |
| |
AB-M INC. HYBRID TECHNOLOGY IR Wafer Aligner Station |
 |
89964 |
AIO Microservice |
8826 |
in Photoresist Coater Tracks
|
1
|
|
|
F* |
Scotia, NY |
| |
AIO MICROSERVICE 8826 Dual Track Coat System |
 |
99412 |
Axcelis Technologies |
M200PC |
in Photoresist Tools
|
1
|
|
|
F* |
Austin, TX |
| |
Axcelis/Fusion M200PC Up to 200mm Axcelis/Fusion M200PC UV Cure Photostabilizer |
 |
44184 |
Suss Microtec |
Respect 600 |
in Photoresist Developers
|
1
|
|
|
F* |
Scotia, NY |
| |
BLE RESPECT 600 System is designed exclusively to develop and bake substrates
using spinning and heating techniques
BLE was acquired by Suss Microtec |
 |
44185 |
Suss Microtec |
RESPECT 600 |
in Photoresist Coaters
|
1
|
|
|
F* |
Scotia, NY |
| |
BLE RESPECT 600 System is designed exclusively to coat and bake substrates using spinning and heating
techniques.
BLE was acquired by Suss Microtec |
 |
77000 |
Brewer Science |
CEE 4000 |
in Photoresist Coater Tracks
|
1
|
|
|
F* |
Scotia, NY |
| |
BREWER SCIENCE INC. CEE 4000 Programmable Automated Coat/Bake Track System |
 |
109013 |
C & D |
|
in Photoresist Coater Tracks
|
1
|
|
2,000.00
|
F* |
Dallas, TX |
| |
C & D |
 |
23625 |
C&D Semiconductor |
8126 |
in Photoresist Coater/Developers
|
2
|
|
24,500.00
|
F* |
Scotia, NY |
| |
C&D SEMICONDUCTOR 8126 Photoresist Coat/Developer Tracks |
 |
109910 |
Canon |
|
in Lithography Equipment
|
1
|
|
|
F* |
Austin, TX |
| |
Canon Stepper - Beam Delivery System Canon Stepper - Beam Delivery System for a Canon Stepper EX3 & EX4. |
 |
108673 |
Dainippon Screen |
DNS SC-W60A-AV |
in Photoresist Coater Tracks
|
1
|
|
|
  |
Austin, TX |
| |
DNS SC-W60A-AV 150mm DNS SC-W60A-AV Coater |
 |
91916 |
Dainippon Screen |
SC-W80A-AVFGLP |
in Photoresist Tools
|
1
|
|
|
  |
Austin, TX |
| |
DNS SC-W80A-AVFGLP DNS SC-W80A-AVFGLP SOF Furnace for 80A |
 |
72941 |
Dainippon Screen |
SCW80A-AVFG |
in Photoresist Tools
|
1
|
|
|
F* |
Plano, TX |
| |
DNS SCW80A-AVFG SOG Curing Furnace SOG Curing Furnace |
 |
108672 |
Dainippon Screen |
DNS SD-W60A-AVP |
in Photoresist Develop Track Systems
|
1
|
|
|
F* |
Austin, TX |
| |
DNS SD-W60A-AVP 150mm DNS SD-W60A-AVP Stand-Alone Developer |
 |
91891 |
Dainippon Screen |
SD-W60A-AVP |
in Photoresist Develop Track Systems
|
1
|
|
|
  |
Austin, TX |
| |
DNS SD-W60A-AVP 150mm DNS SD-W60A-AVP Stand-Alone Developer |
 |
104312 |
Dainippon Screen |
SK-W60A-BVP |
in Photoresist Tools
|
1
|
|
|
 |
Plano, TX |
| |
DNS SK-W60A-BVP Photoresist Coater and Developer |
 |
4880 |
DainipponScreen |
SK-W80A-BVP |
in Photoresist Coater/Developers
|
1
|
|
|
F* |
Plano, TX |
| |
DNS SK-W80A-BVP Dual Photoresist Coater/Developer |
 |
102349 |
DNS-80A Coater |
in Photoresist Coater Tracks
|
1
|
|
90,000.00
|
 |
Regensburg, BY |
| |
DNS-80A Coater Tool was originally SOG coater with inline furnace. Tool was modified to thick resist coater. Inline furnace is not included anymore.
Actual tool configuration:
- 1x coater unit (no resist pumps)
- 2x hotplates
- 3x high hotplates
- 2x coolplates
- Tool size: 1.300mm x 1.625mm
- Cabinet size: 780mm x 750mm LOCATION: Regensburg SERIAL NUMBER(S): 59700-2509 |
 |
14016 |
EV Group |
EV620 |
in Mask Aligners
|
1
|
|
|
F* |
Scotia, NY |
| |
EV GROUP MASK ALIGNER 150 MM EV Group Model EV620 |
 |
85238 |
Fusion Systems Inc. |
M150PC |
in Photoresist Tools
|
1
|
|
|
F* |
Plano, TX |
| |
Fusion M150PC - PARTS TOOL ONLY UV Photoresist Stabilization Tool - Parts Tool Only |
 |
87090 |
Fusion Systems Inc. |
M150PC |
in Photoresist Tools
|
1
|
|
|
 |
Plano, TX |
| |
Fusion M150PC - PARTS TOOL ONLY UV Photoresist Stabilization Tool |
 |
99482 |
Fusion Systems Inc. |
M150PC |
in Photoresist Tools
|
1
|
|
|
  |
Plano, TX |
| |
Fusion M150PC Photostabilizer Axcelis Fusion M150PC |
 |
88230 |
Headway |
PWM-106-CB15 |
in Photoresist Coaters
|
1
|
|
|
F* |
Scotia, NY |
| |
HEADWAY PWM-106-CB15 Photoresist Coater |
 |
41529 |
Headway |
CB15 |
in Photoresist Coaters
|
1
|
|
7,750.00
|
F* |
Scotia, NY |
| |
HEADWAY RESEARCH CB15 Manual Photoresist Spin Coater |
 |
9971 |
Headway |
P8X20-30 |
in Photoresist Coaters
|
1
|
|
|
F* |
Plano, TX |
| |
Headway Research P8X20-30 AC Spindle Motor for AC-101 Photoresist Spinner, New |
 |
112607 |
Karl Suss |
MA 150M |
in Mask Aligners
|
1
|
|
|
F* |
Scotia, NY |
| |
KARL SUSS MANUAL MASK ALIGNER 150 MM Karl Suss Model MA 150M |
 |
124314 |
Karl Suss |
MJB 3 |
in Mask Aligners
|
1
|
|
|
F*N* |
Scotia, NY |
| |
KARL SUSS MASK ALIGNER MJB 3 Karl Suss MJB3
|
 |
42089 |
Suss Microtec |
RC8 MS3 |
in Photoresist Coaters
|
1
|
|
|
F* |
Scotia, NY |
| |
KARL SUSS RC8 MS3 Resist Coater with Gyrset Technology
Year 2001
|
 |
9637 |
Nikon |
NRS-S2O2A |
in Wafer Steppers
|
1
|
|
375,000.00
|
F* |
Dallas, TX |
| |
Nikon NRS- S2O2A Photolithography Exposure S/N 7472005 |
 |
81161 |
Nikon |
NSR S203B |
in Lithography Equipment
|
1
|
|
1,554,000.00
|
 |
Dallas, TX |
| |
Nikon NSR S203B Scanner Step S/N 7776059 |
 |
70486 |
Nikon |
NSR 2005i10C |
in Wafer Steppers
|
1
|
|
320,000.00
|
F* |
Dallas, TX |
| |
Nikon NSR2005i10C i-Line Stepper S/N 1004148 |
 |
120113 |
Nikon |
NSR2005i11C |
in Wafer Steppers
|
1
|
|
700,000.00
|
F* |
Dallas, TX |
| |
Nikon NSR2005i11C i-Line Stepper S/N 1106053 |
 |
120114 |
Nikon |
NSR2005i11C |
in Wafer Steppers
|
1
|
|
700,000.00
|
F* |
Dallas, TX |
| |
Nikon NSR2005i11C i-Line Stepper S/N 1106057 |
 |
96611 |
Optical Associates |
311-041 |
in Lithography Equipment
|
2
|
|
|
  |
Scotia, NY |
| |
OAI 311-041 Intensity Profiler Probe |
 |
49731 |
Oriel |
82540 |
in Lithography Equipment
|
1
|
|
14,950.00
|
F* |
Scotia, NY |
| |
ORIEL 82540 1000 Watt Arc Lamp |
 |
24564 |
Quintel |
UL 7000 IR |
in Mask Aligners
|
1
|
|
|
F* |
Scotia, NY |
| |
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM Neutronix-Quintel Model ULTRALINE 7000 IR
Quintel acquired by Neutronix |
 |
5026 |
Solitec |
5110SJC |
in Photoresist Developers
|
1
|
|
25,000.00
|
F* |
Scotia, NY |
| |
SOLITEC 5110 SJC Scrubber/Hi Pressure Spray |
 |
4005 |
Solitec |
820-CB |
in Photoresist Develop Track Systems
|
1
|
|
|
F* |
Scotia, NY |
| |
SOLITEC 820-CB Designed to coat and soft
bake semiconductor wafers. |
 |
4007 |
Solitec |
820-PTDB |
in Photoresist Develop Track Systems
|
1
|
|
|
F* |
Scotia, NY |
| |
SOLITEC 820-PTDB Designed to develop and hard
bake semiconductor wafers. |
 |
42108 |
Suss Microtec |
FALCON |
in Photoresist Coater/Developers
|
1
|
|
|
F* |
Scotia, NY |
| |
SUSS MICROTEC FALCON Fully Automated Coating, Developing Cluster System
Year 2001 |
 |
42129 |
Suss Microtec |
GAMMA 60 |
in Photoresist Coater/Developers
|
1
|
|
|
F* |
Scotia, NY |
| |
SUSS MICROTEC GAMMA 60 Formerly item no. 36688 |
 |
108892 |
Silicon Valley Group |
8100 |
in Photoresist Developers
|
1
|
|
4,800.00
|
F* |
Dallas, TX |
| |
SVG 8100 Develop Track |
 |
33247 |
Silicon Valley Group |
8800/8836/8832/8836 |
in Photoresist Develop Track Systems
|
1
|
|
42,500.00
|
F* |
Scotia, NY |
| |
SVG 8800/8836/8832/8836 Currently configured for 4" wafers |
 |
120116 |
Tel |
Mark 8 |
in Photoresist Coater/Developers
|
1
|
|
320,000.00
|
  |
Dallas, TX |
| |
TEL Mark 8 |
 |
120117 |
Tel |
Mark 8 |
in Photoresist Coater/Developers
|
1
|
|
320,000.00
|
  |
Dallas, TX |
| |
TEL Mark 8 |