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Chemical Vapor Deposition Equipment


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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
109694
12-inch (300mm) HFCVD System for CVD Diamond & Related Materials  
12-inch (300mm) HFCVD System for CVD Diamond & Related Materials  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Sterling, MA
12-inch (300mm) HFCVD System for CVD Diamond & Related Materials
  • Hot Filament CVD system engineered for diamond deposition on a 12 inch (~300mm) rotary platen.
  • Design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

    This equipment was engineered and used by an industrial entity for commercial CVD production using a hydrogen-based process. 2-chamber system design includes loading chamber and HFCVD hot zone separated by large gate valve. This design enables continuous operation of filaments for many days without shutdown. Equipment employs a 4-zone filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. Large HFCVD hot zone and push rod design enable substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species. Specialty, water-cooled MDC chambers maintain low temperature chamber wall while substrate is heated to elevated temperatures via atomic hydrogen recombination and radiational heating.

    Deposition over >12 inch diameter or coating on 3-D shapes should be viable with process and fixture development.

    Images of a typical HFCVD system installation are attached.
115857
4-inch HFCVD System for CVD Diamond and Related Materials 
4-inch HFCVD System for CVD Diamond and Related Materials 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Sterling, MA
4-inch HFCVD System for CVD Diamond and Related Materials
  • Hot Filament CVD system engineered for diamond deposition on a 4 inch (~100mm) rotary platen.
  • System design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

This equipment was previously used for commercial R&D of polycrystalline CVD Diamond materials.

Design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species.

Cline Innovations intends to refurbish and reintegrate this system with updated controls and interlocks, likely including PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible.  Run-off testing is possible prior to shipment.

177729
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Regensburg, BY
AMAT P5000 - PE Oxide Dep - 6"
AMAT P5000 - PE Oxide Dep Tool
2 DxZ Chamber - Both PE - Silane 6" Si
Currently Installed in Fab, Good Working Condition
190527
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
AMAT P5000-Mark II, 200mm, TEOS Dep

AMAT P5000-Mark II, 200mm, TEOS Dep, DCVD 

S/N: 5000-5104

189129
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
AMAT P5000-Mark II, 200mm, TEOS Dep- Etch Back
AMAT P5000-Mark II, 200mm, TEOS Dep- Etch Back

S/N: 5000-4326
189087
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
AMAT, P5000, PECVD, 200mm, Passivation Dep System
AMAT, P5000, PECVD, 200mm, Passivation Dep System

In the Fab
56326
Applied Materials  

Applied Materials  

P5000 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT P5000 MARK II SYSTEM
AMAT P5000 Mark II Hybrid System.
Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel.
Integrated endpoint system with 2 monochromators.
Currently configured for 100mm wafers.


System is fully configurable to your specifications..
23215
Applied Materials  

Applied Materials  

P5000 MARK II 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT TEOS DEPOSITION, OXID ETCH, P5000
Mark II System
TEOS Deposition, Oxide Etch
187764
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
Applied Materials P5000 Etch-Depostion, 200mm,
Applied Materials P5000 Etch-Depostion, 200mm
Still in the Fab.
178243
AMAT  

AMAT  

Producer SE 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Taichung, Taichung City
Applied Materials, Producer SE CVD, 300mm
Applied Materials,  Producer SE CVD,  300mm Manufactured in 2007; Status: Bagged and Skidded
191519
Applied Materials  

Applied Materials  

Producer III 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
Applied Materials, Producer, Standard, 200mm
Applied Materials, Producer, Standard, 200mm

S/N: 306105

FRAME ONLY 
192826
Applied Materials  

Applied Materials  

UltimaX 

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in Chemical Vapor Deposition Equipment

1   N* Taichung, Taichung City
Applied Materials, Ultima X CVD, 300mm
Applied Materials, Ultima X CVD, 300mm

Bagged & Skidded in Warehouse.

S/N : 408050

Parts Missing:
qty. 1 GENERATOR RF PLASMA, ENI 13.56 MHZ 10.5
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Water Manifold ASSEMBLY, 300MM (Ultima water flow meter)

192827
Applied Materials  

Applied Materials  

UltimaX 

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in Chemical Vapor Deposition Equipment

1   N* Taichung, Taichung City
Applied Materials, Ultima X CVD, 300mm
Applied Materials, Ultima X CVD, 300mm

Bagged & Skidded in Warehouse

414185


Parts Missing:
qty. 1 HEAT EXCHANGER, SINGLE LOOP, 208V, 50/60
qty. 1 HEAT EXCHANGER, SINGLE LOOP, 208V, 50/60
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 ASSY, GROUND SHIELD, 300MM ULTIMA X
qty. 1 Side coil assembly

183418
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2561

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2561

183417
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2560

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2560

183169
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, NY
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2541

2011 Vintage
183170
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2540

2011 Vintage

 

Tool ID: FVX2541

 
184607
Astex  

Astex  

AX5000, AX6000, AX6350 or similar 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Astex AX5000 Microwave Plasma Diamond Growth System
  • Multiple stainless steel, Astex microwave plasma CVD chambers and plasma couplers currently available as the basis for refurbishment and reintegration.
  • Systems can be reintegrated based on customer's application needs using a combination of reliable, new and used/refurbished components.
  • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
  • 1.5kW to 5kW microwave power input.
  • 3 stage options: Cooled, Heated, or Thermally Floating.
  • Computer controls.
189843
Astex  

Astex  

AX6500 "Clamshell" MPCVD 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F*N* Leominster, Massachusetts
Astex AX6500 Diamond Growth System
  • Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
  • Capable of high rate single-crystal (SCD) diamond homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD), ultrananocrystalline diamond (UNCD).
  • System to be refurbished & updated with modernized computer controls, higher throughput water cooling subsystem, and enhanced process control/monitoring devices.
  • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
  • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
  • This system can be customized to meet customer needs and preferences.  Please contact Cline Innovations for details.
137483
Astex  

Astex  

ECR-MOCVD-PECVD 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD)
High density plasma system activated by 2.45GHz ECR microwave offers low temperature plasma for PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, diamond & related carbon materials, and nanomaterials.

Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area/volume MOCVD/PECVD/deposition of ceramics/semiconductors/DLC/nanodiamond/nanomaterials, surface treatment & functionalization and/or dry etching.

This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.

137544
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Celsior mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Celsior mainframe
Aviza Celsior mainframe



Aviza Celsior mainframe
Equipment Code: CVD304-04

LOCATION: Dresden
137540
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Pantheon Mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Pantheon Mainframe
Aviza Pantheon Mainframe
Equipment Code: CVD304-03


Aviza Pantheon Mainframe with 3 chambers
Serial Number: OX0412-005
98056
Carbone  

Carbone  

G-III 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

5   F* Scotia, NY
CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR
Silicon Carbide 200 mm Disc Susceptor

Carbone of America Part number 017893-001
187926
Cline Innovations  

Cline Innovations  

Custom CVD Diamond System 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Custom CVD Diamond Systems

Cline Innovations is now designing and building custom microwave plasma CVD systems for technically discerning customers.  Please contact us to discuss your advanced CVD diamond process specifications.

137566
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (NITRID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Furnace TEL Minibatch (NITRID)
OfenTel Minibatch (NITRID)
Equipment Code: OFE361-01

TEL Formula Minibatch furnace for Nitride, 4


OfenTel Minibatch (NITRID)
Serial Number: P00000315001
137567
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (OXID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
FurnaceTel Minibatch (OXID)
OfenTel Minibatch (OXID)
Equipment Code: OFE361-02

TEL Formula Minibatch furnace for Oxide


OfenTel Minibatch (OXID)
Serial Number: P00000315002
190993
Kokusai  

Kokusai  

Quixace Ultimate 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F*N* Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Low Temp Steam Anneal - for SOD Cure

S/N: T2DD6-18711

190748
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

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1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N T2DC6-16590

ALD TiN

Tool is New In Box, with New Quartz.  Never installed.
190749
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N: T2DC6-16595

ALD TiN
180506
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Dresden, SN
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
TiCl4, NH3 - Process for TiN - Prior Use

Cartridge Heater - D4EX22250, RHC2 Heater
Number of control zone, 5 zones
Heater element material - KANTHAL APM
Maximum heating temperature range - 1050 degC (in Furnace)
Flat zone length - 800mm (±2.0 degC at 800 degC)
Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
Main Operation Unit - TM150-HKT05 
Sub Operation Unit - D4EX40577
Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
Bottle (For Ti Source) - BK1200URK, Made by Schumacher
N2 Purge Load Lock System
O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

S/N: T2DC6-15901
190750
Kokusai  

Kokusai  

DD-1223VN 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN
Kokusai Quixace, 300mm, DD-1223VN

ALD-TiN 

S/N T2DC6-16441
186717
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

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1   F* Singapore,
Kokusai, 200mm, DJ-853V, LPCVD SiN S
Kokusai, 200mm, DJ-853V, LPCVD SiN 

100429
Materials Technology  

Materials Technology  

02-01808 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

4   F* Scotia, NY
MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR
EPI 3 1/4" Barrel Susceptor

MTC EPI Reactor Parts
For 3 Inch Wafers
192253
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Stratus S200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Villach, Carinthia
NEXX Stratus 200

Stratus 200 is high volume manufacturing electroplating system for advanced wafer level packaging (WLP) applications

11074
Nexx Systems  

Nexx Systems  

Cirrus 300 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
NEXX SYSTEMS ECR PECVD RIE SYSTEM
Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex

This system is designed for the fluorination of DLC surfaces on various substrates.
The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy.
High magnetic field launch produces a highly stable and efficient ECR plasma.

Nexx Systems Cirrus 300

181540
Oxford Instruments  

Oxford Instruments  

Plasmalab System 100 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
OXFORD INSTRUMENTS PLASMALAB 100 PECVD
PECVD TEOS Tool with Load Lock
192487
Oxford Instruments  

Oxford Instruments  

Plasmalab 800 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Sunnyvale, California
OXFORD, PLASMALAB 800, PECVD, 300mm
OXFORD, PLASMALAB 800, PECVD, 300mm

Plasma Enhanced Chemical Vapor Deposition

  • 460-mm diameter platen


2004
192481
Picosun  

Picosun  

P-300B 

List all items of this typeChemical Vapor Deposition Equipment - Other

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1   F*N* Sunnyvale, California
PicoSun, P-300B, ALD, 300mm
PicoSun, P-300B, ALD, 300mm

3 precursor ampules installed with one additional ampule location available

DOM: 2015

S/N : 1523B84R05442
191492
Picosun  

Picosun  

Sunale R-200 

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1   N* East Fishkill, New York
Picosun, Sunale R-200, Advanced ALD Reactor, 300mm
Picosun, Sunale R-200, Advanced ALD Reactor, 300mm

Configured with three canisters and chemicals to deposit Ni, HfO, Ru and SiO, Al

SUNALETM R-200 Advanced ALD System
The ALD reactor has six separate inlets for precursor sources. It can accommodate up to twelve precursor sources. Maximum deposition temperature of the ALD reactor is 500 °C.

 Vacuum chamber (AISI304)

AISI 304 stainless steel vessel with KF/CF connection flanges for RC-200 reaction chamber.

Reaction Chamber (AISI316L)
RC-200 Chamber and lid with metal sealing surface. Customer specified chamber size up to 8”single Si wafer or smaller wafers (4”, 6”) and pieces

Sample holder SH-200
Substrate holder for one up to 8” wafer or smaller wafers (4”, 6”) and pieces compatible with reaction chamber

Advanced source control and electronics system
Touch panel PC and electronics cabinet used for operating the ALD reactor with Advanced 12-source ALD software and electronics

PicosolutionTM 600 source system

Cooled source systems for high vapor pressure liquid precursors (e.g. for TMA, TiCl4 and H2O). Maximum capacity 600mL. 3ea.

Boosted PicohotTM 200 source system

Heated source systems (up to 200 °C) for low vapor pressure metal precursors (e.g. for TEMAHf, TEMAZr). Suitable also for high vapor pressure chemicals.  2ea.

PicohotTM 300 source system

Heated source system (up to 300 °C) for low vapor pressure metal precursors (e.g. for HfCl4, ZrCl4).  1ea.

PicogasesTM Connection

Allows for the connection of an additional externally supplied compressed gas for use as an ALD precursor (e.g. NH3, O2). Includes plumbing, valves, and control of extra gas source.

DOM:6/18/2013

147470
Plasma-Therm  

Plasma-Therm  

790 PECVD 11" 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM PECVD 790
Refurbished PECVD System with 11" Electrode
30246
Plasma-Therm  

Plasma-Therm  

VLR 700 VLR-PM1-ICRB-PM 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM VLR 700
Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.
183107
Applied Materials  

Applied Materials  

Producer GT 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   East Fishkill, New York
Producer GT, AMAT, 300mm, CVD, 2 chambers CVD Co, Nblok
Producer GT, AMAT, 300mm, CVD
CHB - Nblok
CHC- CVD Co

Serial Number 426533

Tool ID : JN08

Current Status: Installed and Idle
189077
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace
SVG, AVP 8000 AP, 200mm Vertical Furnace

Padox/Sacri-Ox

Bagged & Skidded in Warehouse


188431
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace
SVG, AVP 8000 AP, 200mm Vertical Furnace
Cu Anneal




S/N 4250
188435
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

Padox/Sacri-Ox

S/N: 4318
191257
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, AP, Forming Gas Anneal 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace, Forming Gas Anneal
SVG, AVP 8000 AP, 200mm Vertical Furnace, Forming Gas Anneal

S/N: 4437
191913
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation

SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation

Bagged & Skidded in Warehouse


188436
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

Padox/Sacri-Ox

S/N: 4404
188481
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 LP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Poly (Plain Poly)

S/N: 4302
188482
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 LP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Plain Poly

S/N: A10092
188483
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 LP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD TEOS

S/N: 4436
188432
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 LP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Nitride-Pad/SPCR (Gen Nit)


S/N: 4359

188433
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 LP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Nitride-Pad/SPCR (Gen Nit)


S/N: 4434

 

188434
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 LP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Nitride-ONO

S/N: A10078
189132
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 LP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Nitride-Pad/SPCR (Gen Nit)

Bagged & Skidded in warehouse
191270
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 LP, SiN 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace, LPCVD SiN
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Nitride-Pad/SPCR (Gen Nit)

S/N: 4321
178238
SVG  

SVG  

WJ TEOS 1500 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
SVG, CVD, WJ TEOS 1500 200mm
Manufactured in 2008; Status: Bagged and Skidded
187653
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

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in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009820055

Bagged & Skidded in Warehouse
187654
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009870082

Bagged & Skidded in Warehouse
187655
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009870082

Bagged & Skidded in Warehouse

 

 

187656
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeAtmospheric Pressure CVD Tools

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1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009870082

Bagged & Skidded in Warehouse
190268
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S 

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1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace, Doping
TEL Alpha 8 S, 200mm, Vertical Furnace, Doping

S/N: A00009755276
187658
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeVertical LPCVD Furnaces

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1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride
TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride

S/N: 300009675379

In the Fab in Singapore
189147
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S 

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in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace, SOG Cure
TEL Alpha 8 S, 200mm, Vertical Furnace, SOG Cure

In Warehouse, Bagged & Skidded

S/N: A00009795484
190746
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2
TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2
190747
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

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1   Malta, New York
TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2

TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2

178714
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy + 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
TEL Indy, Vertical Furnace, 300mm
PSZ (Poly-Silazane) Cure Furnace, 300mm
Heater: FTP VOS-56-101P 4zone / RT-1100 (C) / with RCU
Process Condition: AP+Sub-AP
MAX Operating Temp: 900degC

137546
Tokyo Electron Ltd  

Tokyo Electron Ltd  

TEL Trias TI/TiN-ALD for 12" / 300 mm 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Regensburg, BY
TEL Trias TI/TiN-ALD
TEL Trias TI/TiN-ALD
Equipment Code: CVD314-02


TEL Trias TI/TiN-ALD
Serial Number: C13503
137543
TEL Corp.  

TEL Corp.  

TEL Trias TI/TiN-ALD for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

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1   F* Regensburg, BY
TEL Trias TI/TiN-ALD
TEL Trias TI/TiN-ALD
Equipment Code: CVD314-01


TEL Trias TI/TiN-ALD
Serial Number: C10503
189682
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S 

List all items of this typeVertical LPCVD Furnaces

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1   Singapore,
TEL, Aplha 8 S, 200mm, Vertical Furnace, Doped Poly
TEL, Aplha 8 S, 200mm, Vertical Furnace,  Doped Poly

S/N: 300009645188
178252
Tel  

Tel  

Trias 

List all items of this typeChemical Vapor Deposition Equipment - Other

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1   Taichung, Taichung City
TEL, CVD, 300mm
Manufactured in 2010; Status: Crated
178249
Tel  

Tel  

Trias 

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1   Taichung, Taichung City
TEL, Trias CVD, 300mm
Manufactured in 2005; Status: Bagged and Skidded
187585
Tel  

Tel  

Trias 

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in Chemical Vapor Deposition Equipment

1   Fishkill, NY
TEL, Trias, UVRF / High-K CVD / SPA-N / LPA modules, 300mm
TEL, Trias, UVRF / High-K CVD / SPA-N / LPA modules

TEL Trias Platform
178241
Watkins-Johnson  

Watkins-Johnson  

TEOS 1500 

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in Chemical Vapor Deposition Equipment

1   Singapore,
WJ, CVD, TEOS 1500 200mm
TEOS 1500  Status: In Warehouse
178242
Watkins-Johnson  

Watkins-Johnson  

TEOS 1500 

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1   F* Singapore,
WJ, CVD, TEOS 1500 200mm
TEOS 1500  Status: Bagged & Skidded


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment:
AG Associates, Applied Materials, Inc., ASM, Astex, Aviza Technology Ltd., Carbone, Cline Innovations, Kokusai, Materials Technology, Nexx Systems, Oxford Instruments, Picosun, Plasma-Therm, Silicon Valley Group, Tel, TEL Corp., Tokyo Electronics Limited, Watkins-Johnson