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in Optical CD Measurement
Deal directly with Owner:  Catalyst Equipment Corporation of Plano, TX
Item ID: 5074

Offered1 Offered at Best Price

Nanometrics Nanoline CD-50

Critical Dimension Measurement Tool for up to 6" Wafers
Nanometrics Nanoline CD-50
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Location: Plano, TX
Unit Price Unstated
Number of Units 1
Manufacturer Nanometrics
Model CD-50
Wafer Size Range 
  Minimum 100 mm
  Maximum 150 mm
  Set Size 150 mm
Other Information 
  • Capable of Measuring 4” – 6” Wafers
  • 6” x 6” XY Travel Stage
  • Measurement Range of Line Widths
  • Olympus MSPlan 100X Objective – <0.3 to 12.5 Micrometers
  • Olympus ULWD MSPlan 50X Objective – <1.0 to 25.0 Micrometers
  • Olympus MSPlan 10X Objective – <5.0 to 125.0 Micrometers
  • Nominal Slit Height
  • Olympus MSPlan 100X Objective – 4.0 Micrometers WD=0.30mm
  • Olympus ULWD MSPlan 50X Objective – 8.0 Micrometers WD=8.0mm
  • Olympus MSPlan 10X Objective – 40.0 Micrometers WD=9.0mm
  • Olympus 0.65 Condenser Lens
  • Autofine Automatic Optical Focus
  • Less than 5 Seconds Scan Time
  • From 5 to 25 Seconds Focus Time
  • Precision: One Sigma Value Better than 0.005 Micrometers for Chrome Photomasks
Condition Very Good
Year of Manufacture 1987

OFFERED BY: (click name below to visit its website directly)

Catalyst Equipment Corporation
Plano , TX

Deal directly with Owner:  Catalyst Equipment Corporation of Plano, TX