|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
|
6938
|
Akrion
|
Akrion |
UP-V2 HL.2000 |
in Wafer Cleaners
AKRION UP-V2 HL.2000:3 Tank Semiautomatic Chrome Etch Station w/Linear Robotic Transfer
|
1
|
|
|
F* |
Plano, TX |
|
|
24073
|
Akrion
|
Akrion |
UP-V2 SA.3200 |
in Wafer Cleaners
Akrion UP-V2 SA.3200 - PARTS TOOL ONLY:Semi-Automatic Wet Process Station Parts Including Process Tanks, Robots and More
|
1
|
|
|
F* |
Plano, TX |
|
|
245228
|
Tencor
|
Tencor |
KLA-Tencor |
in Production Equipment
Archer 5-3:CD Overlay Measurement system - Tool in production
|
1
|
|
|
|
Villach, Carinthia |
|
|
223524
|
ASM A412
|
ASM A412 |
in Production Equipment
ASM A412:We are looking for a used ASM A412. Please call +49 941 202 2755 if you want to offer one.
|
1
|
|
|
|
Regensburg, Bavaria |
|
|
184614
|
ATM GmbH
|
ATM GmbH |
Brillant BR250.2 |
in Slicing Saws
ATM GmbH CUT OFF SAW 12" :Cut-Off Saw
|
1
|
|
|
F* |
Scotia, New York |
|
|
242851
|
Kufner
|
Kufner |
Batch Etching Basin (KOH) |
in Wafer Cleaners
Batch Etching Basin (KOH):Complete dip acid etching unit manufactured by Kufner, Germany. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing si-wafers after grinding (KOH). Delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
3882
|
Bold Technologies
|
Bold Technologies |
N/A |
in Wafer Cleaners
BOLD TECHNOLOGIES SEMI-AUTOMATED ACID WET BENCH SYSTEM:Semi-Automated Acid Wet Bench System
|
1
|
|
|
F* |
Scotia, New York |
|
|
122523
|
Buehler
|
Buehler |
Dressing Chuck |
in Slicing Saws
BUEHLER ISOMET DRESSING CHUCK:Dressing Chuck
|
2
|
|
185.05 |
F* |
Scotia, New York |
|
|
142877
|
Buehler
|
Buehler |
ISOMET |
in Slicing Saws
BUEHLER LOW SPEED CUT-OFF SAW:Precision Sectioning Saw
Representative photo - color of saw may vary
Various ISOMET chucks available. See other information for more details.
|
2
|
|
3,325.89 |
F* |
Scotia, New York |
|
|
242618
|
CFM Technologies
|
CFM Technologies |
FullFlow 1/99 8100 |
in Wafer Cleaners
CFM, FullFlow 1/99 8100, s/n: Cont 1 1188, 200mm, Tool ID: 67R88V:CFM, FullFlow 1/99 8100, s/n: Cont 1 1188, 200mm, Tool ID: 67R88V
|
1
|
|
|
|
Burlington, Vermont |
|
|
242619
|
CFM Technologies
|
CFM Technologies |
FullFlow 1/99 8100 |
in Wafer Cleaners
CFM, FullFlow 1/99 8100, s/n: Cont 2 1188, 200mm, Tool ID: 67R89V:CFM, FullFlow 1/99 8100, s/n: Cont 2 1188, 200mm, Tool ID: 67R89V
|
1
|
|
|
|
Burlington, Vermont |
|
|
242203
|
CFM Technologies
|
CFM Technologies |
HP 8050 |
in Wafer Cleaners
CFM, HP 8050, s/n: 5046, 200mm, Tool ID: 93557X:CFM, CFM HP 8050, s/n: 5046, 200mm, Tool ID: 93557X
|
1
|
|
|
|
Burlington, Vermont |
|
|
242940
|
Kufner
|
Kufner |
Batch Etching Basins |
in Wafer Cleaners
Dip-etch wet benchs:4x Dip-etch wet bench (1998) Complete dip acid etching unit manufactured by Kufner, Germany. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing bonded si-wafers up to 80mm diameter. Delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
244704
|
Disco
|
Disco |
DISCO6 |
in Production Equipment
DISCO SCHLEIFMASCHINE DFG 850 / DISCO 6:Fully automatic grinder
|
1
|
|
|
|
Villach, Carinthia |
|
|
244703
|
Nitto Denko
|
Nitto Denko |
PFM5 |
in Production Equipment
FOLIERANLAGE NITTO DR - 8500 / PFM5:foiling system
|
1
|
|
|
|
Villach, Carinthia |
|
|
244705
|
Disco
|
Disco |
DISCO9 |
in Production Equipment
Grinder DFG850 Disco 9:Fully automatic grinder
|
1
|
|
|
|
Vienna, Vienna |
|
|
43636
|
Hamatech
|
Hamatech |
104180 |
in Spray/Brush Scrubbers
HAMATECH AUTOMATIC SUBSTRATE CLEANER:Automatic Substrate Cleaner
|
1
|
|
|
F* |
Scotia, New York |
|
|
244317
|
Innolas GmbH
|
Innolas GmbH |
C3000DPS |
in Production Equipment
Innolas Wafermarker:Wafermarker C3000DPS Marking for 300mm Wafers
|
1
|
|
32,145.66 |
|
Villach, Carinthia |
|
|
160726
|
Interlab
|
Interlab |
MRS1583 |
in Wafer Cleaners
INTERLAB MICRO RINSE SYSTEM:Micro Rinse System
|
1
|
|
|
|
Scotia, NY |
|
|
126788
|
KLA-Tencor
|
KLA-Tencor |
|
in Production Equipment
KLA-Tencor 3" Wafer Locator Rings for Flexus 2320:3" Wafer Locator Rings for Flexus 2320
|
2
|
|
|
|
Plano, TX |
|
|
247845
|
KLA-Tencor
|
KLA-Tencor |
Auto RS-55tc |
in Resistivity Testers
KLA-Tencor Auto RS-55tc Resistivity Test Tool:KLA-TENCOR Auto RS-55tc Resistivity Mapping System - Accommodates all Wafer Sizes from 50mm – 200mm
- 5 Megaohm/sq Measurement Range
- Typical Measurement Time: 5 – 4.5 Seconds per Test Site
- <0.2% (1 sigma) Measurement Repeatability
- Thermal Chuck Temperature Measurement Accuracy: ±0.5ºC
- PC Based System Controller
- 25 MHz 486 Based MPU
- 44 MB Removable Hard Disk
- 110 MB Fixed Hard Disk Drive
- 5” Floppy Disk Drive
- X-Y Map: Up to 1200 Sites Programmable
- Probe Qualification: 20 sites
- 1 - 30 Programmable Routine Test Sites (ASTM Standard Tests Included)
|
1
|
|
80,021.44 |
|
Austin, Texas |
|
|
247844
|
KLA-Tencor
|
KLA-Tencor |
RS-55tc |
in Resistivity Testers
KLA-Tencor RS-55tc Resistivity Test Tool:KLA-Tencor RS-55tc Resistivity Test Tool - Accommodates all Wafer Sizes from 50mm – 200mm
- Sheet Resistance Measurement of 5 mohm/sq to 5 Mohm/sq
- Typical Measurement Time: 5 – 4.5 Seconds per Test Site
- <0.2% (1 sigma) Measurement Repeatability
- X-Y Map: Programmable Up to 1200 Sites
- Probe Qualification: 20 sites
- 1 - 30 Programmable Routine Test Sites (ASTM Standard Tests Included)
- PC Based System Controller with Color Monitor
|
1
|
|
35,009.38 |
|
Austin, Texas |
|
|
126787
|
KLA-Tencor
|
KLA-Tencor |
|
in Production Equipment
KLA-Tencor SQ. 4" Wafer Locator Ring for Flexus 2320:SQ. 4" Wafer Locator Ring for Flexus 2320
|
1
|
|
|
|
Plano, TX |
|
|
61966
|
Kuroda Precisio
|
Kuroda Precisio |
SPG-30 |
in Lapping Machines
KURODA ASPHERICAL GRINDING SYSTEM:Aspherical Grinding System
Simultaneous Control of the X,Y and Z axis.
|
1
|
|
|
F* |
Scotia, New York |
|
|
78914
|
Kuroda Precision Ind
|
Kuroda Precision Ind |
KRP 2200F |
in Lapping Machines
KURODA PRECISION INDUSTRIES SUPER POLISHING MACHINE:Super Polishing Machine
|
1
|
|
|
F* |
Scotia, New York |
|
|
199388
|
Lapmaster
|
Lapmaster |
12C |
in Lapping Machines
LAPMASTER POLISHER LAPPER 12 INCH:Single Sided Lapper Polisher
|
4
|
|
|
F* |
Scotia, New York |
|
|
238364
|
Trumpf
|
Trumpf |
HL 101 P |
in Production Equipment
Laser-Silicon-Cutting System with CNC-cutting table and cabin:Complete Silicon cutting system with laser source, CNC-cutting-table and safety cabine. The system was in use until February 2023 and is currently placed into stock.
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
238310
|
Trumpf
|
Trumpf |
HL101P |
in Production Equipment
Laser-Silicon-Cutting System with CNC-Table and Cabin:Complete Silicon cutting system with Laser source, cutting table and safety cabine. The system is still in use until March 2023.
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
238362
|
Trumpf
|
Trumpf |
HL 101 P |
in Production Equipment
Laser-Silicon-Cutting System with cutting table and cabin:Complete Silicon cutting system with Laser source, cutting table and safety cabine. The system is still in use until March 2023. Therefore there is the possibility for a sale on inspection.
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
237802
|
Trumpf
|
Trumpf |
HL 101 P |
in Production Equipment
Laser-Silicon-Cutting System with Cuttingtable and Cabin:Complete Silicon cutting system with Laser source, cutting table and safety cabine. The system was in use until March 2023 and is currently placed into stock.
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
189871
|
Leatherwood Plastics
|
Leatherwood Plastics |
LPD333.FR4.FT |
in Wafer Cleaners
Leatherwood LPD333.FR4.FT Acid Wet Station:Leatherwood LPD333.FR4.FT Acid Wet Station - For up to 6" Wafers
- Automatic Tank Transfer
|
1
|
|
|
|
Plano, Texas |
|
|
189870
|
Leatherwood Plastics
|
Leatherwood Plastics |
LPJ333.SS.ADFTX |
in Wafer Cleaners
Leatherwood LPJ333.SS.ADFTX Solvent Wet Station:Leatherwood LPJ333.SS.ADFTX Solvent Wet Station - For 6" Wafers
- Automatic Tank Transfer
|
1
|
|
|
|
Plano, Texas |
|
|
245226
|
Leatherwood Plastics
|
Leatherwood Plastics |
LPAC100.SS.X |
in Wafer Cleaners
LEATHERWOOD PLASTICS 6' SOLVENT BENCH REAR EXHAUST: With Fire Suppression System by Mark Systems
|
1
|
|
|
|
Scotia, New York |
|
|
1127
|
Leco
|
Leco |
VC-50 |
in Slicing Saws
LECO PRECISION DIAMOND CUT OFF SAW 5" BLADE:Vari/Cut Off Saw
|
1
|
|
|
F* |
Scotia, New York |
|
|
32300
|
Logitech
|
Logitech |
1CYL1 |
in Lapping Machines
LOGITECH AUTOFEED SLURRY CYLINDER:PM5 Autofeed Cylinder
|
3
|
|
1,525.41 |
|
Scotia, New York |
|
|
188576
|
Logitech
|
Logitech |
ACCS-0200 |
in Lapping Machines
LOGITECH CAST IRON 5 INCH TEST BLOCK GROOVED:Test Block -- Cast Iron 5" Grooved
|
4
|
|
700.19 |
|
Scotia, New York |
|
|
188575
|
Logitech
|
Logitech |
ACCS-0300 |
in Lapping Machines
LOGITECH CAST IRON 5 INCH TEST BLOCK PLAIN:Cast Iron Test Block
|
4
|
|
500.13 |
|
Scotia, New York |
|
|
206537
|
Logitech
|
Logitech |
1ACCS-2050 |
in Lapping Machines
LOGITECH CAST IRON 6 INCH TEST BLOCK GROOVED:Cast Iron Grooved Test Block -- New in Box
|
1
|
|
|
|
Scotia, New York |
|
|
188577
|
Logitech
|
Logitech |
ACCS-02000 |
in Lapping Machines
LOGITECH CAST IRON 6 INCH TEST BLOCK PLAIN:Test Block -- Cast Iron 6" PlainTest Block
|
3
|
|
550.15 |
|
Scotia, New York |
|
|
188686
|
Logitech
|
Logitech |
1ACCS-0001 |
in Lapping Machines
LOGITECH CONDITIONING RETAINING RING 127MM STEEL:Conditioning Retaining Ring 127mm Steel
|
6
|
|
295.08 |
F* |
Scotia, New York |
|
|
32262
|
Logitech
|
Logitech |
1ACCS-0725 |
in Lapping Machines
LOGITECH DIAMOND DRESSING TOOL:Diamond Dressing Tool
|
2
|
|
1,430.38 |
|
Scotia, New York |
|
|
188783
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH DIAMOND SMOOTHING BLOCK 200 MICRON 5":Diamond Smoothing Block Missing (3) diamond pellets
|
2
|
|
800.21 |
|
Scotia, New York |
|
|
188786
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH DIAMOND SMOOTHING BLOCK 200 MICRON 5":Diamond Smoothing Block
|
3
|
|
1,000.27 |
|
Scotia, New York |
|
|
188818
|
Logitech
|
Logitech |
1ACCS-0725 |
in Lapping Machines
LOGITECH DIAMOND SMOOTHING BLOCK 200 MICRON 5":Diamond Smoothing Block 200 Micron
|
2
|
|
1,430.38 |
|
Scotia, New York |
|
|
188785
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH DIAMOND SMOOTHING BLOCK 200 MICRON 6":Diamond Smoothing Block
|
1
|
|
800.21 |
|
Scotia, New York |
|
|
188784
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH DIAMOND SMOOTHING BLOCK 40 MICRON - 5":Diamond Smoothing Block Missing (2) diamond pellets.
|
1
|
|
800.21 |
|
Scotia, New York |
|
|
188782
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH DIAMOND SMOOTHING BLOCK 40 MICRON -- 5":Diamond Smoothing Block
|
2
|
|
1,200.32 |
|
Scotia, New York |
|
|
188681
|
Logitech
|
Logitech |
1TDG1 |
in Lapping Machines
LOGITECH FLAT LAPPING GAUGE -TWO DIAL:Flat Lapping Gauge - Two Dial
|
1
|
|
2,200.59 |
|
Scotia, New York |
|
|
188683
|
Logitech
|
Logitech |
1SDG1 |
in Lapping Machines
LOGITECH FLAT POLISHING GAUGE SINGLE DIAL:Flat Polishing Gauge
|
1
|
|
1,500.40 |
|
Scotia, New York |
|
|
188897
|
Logitech
|
Logitech |
PM2 |
in Lapping Machines
LOGITECH LAPPING AND POLISHING MACHINE:Lapping and Polishing Machine
|
1
|
|
|
F* |
Scotia, New York |
|
|
188691
|
Logitech
|
Logitech |
1ACCS-0005 |
in Lapping Machines
LOGITECH LOADING WEIGHT 3.5 KG:Loading Weight 3.5 kg -- 4"
|
4
|
|
300.08 |
|
Scotia, New York |
|
|
188781
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH LOADING WEIGHT 3.5 KG 5 INCH:Loading Weight 3.5 kg, 5"
|
5
|
|
300.08 |
|
Scotia, New York |
|
|
188789
|
Logitech
|
Logitech |
1ACCS-1100 |
in Lapping Machines
LOGITECH POLISHING JIG HOLDER:Logitech Polishing Jig Holder
|
11
|
|
100.03 |
|
Scotia, New York |
|
|
62895
|
Logitech
|
Logitech |
1PLE1-0750 |
in Lapping Machines
LOGITECH POLISHING PLATE EXPANDED POLY:Polishing Plate -- Expanded Poly
|
1
|
|
1,150.31 |
F* |
Scotia, New York |
|
|
188697
|
Logitech
|
Logitech |
1PLE1-0750 |
in Lapping Machines
LOGITECH POLISHING PLATE EXPANDED POLY 30CM:Expanded Poly Polishing Plate 30cm
|
1
|
|
1,500.40 |
|
Scotia, New York |
|
|
188698
|
Logitech
|
Logitech |
1PLE1-0750 |
in Lapping Machines
LOGITECH POLISHING PLATE EXPANDED POLY 30CM:Expanded Poly Polishing Plate 30cm
|
1
|
|
1,500.40 |
|
Scotia, New York |
|
|
188696
|
Logitech
|
Logitech |
1PLE1-0750 |
in Lapping Machines
LOGITECH POLISHING PLATE EXPANDED POLY 30CM:Expanded Poly Polishing Plate 30cm
|
2
|
|
1,875.50 |
|
Scotia, New York |
|
|
188900
|
Logitech
|
Logitech |
1PLY4-0150 |
in Lapping Machines
LOGITECH POLYTRON POLISHING PLATE:Polishing Plate--New Surplus
|
2
|
|
1,700.46 |
|
Scotia, New York |
|
|
226147
|
Logitech
|
Logitech |
PP5 |
in Lapping Machines
LOGITECH PP5:Polishing Jig
|
1
|
|
6,101.63 |
F* |
Scotia, New York |
|
|
188902
|
Logitech
|
Logitech |
PM5 |
in Lapping Machines
LOGITECH PRECISION LAPPING AND POLISHING MACHINE:Precision Lapping and Polishing Machine
|
1
|
|
|
|
Scotia, New York |
|
|
188506
|
Logitech
|
Logitech |
PP5GT |
in Lapping Machines
LOGITECH PRECISION POLISHING JIG 3 INCH:Precision Polishing Jig
|
2
|
|
|
F* |
Scotia, New York |
|
|
188553
|
Logitech
|
Logitech |
PP5GT/C |
in Lapping Machines
LOGITECH PRECISION POLISHING JIG 3 INCH CHEMLOX COMPATIBLE :Precision Polishing Jig Chemlox Compatible
|
3
|
|
|
|
Scotia, New York |
|
|
194961
|
Logitech
|
Logitech |
PP5GT PSM |
in Lapping Machines
LOGITECH PRECISION POLISHING JIG 3 INCH PSM:Precision Polishing Jig with Programmable Sample Monitor (PSM)
|
1
|
|
|
|
Scotia, New York |
|
|
188693
|
Logitech
|
Logitech |
1ACCS-0800 |
in Lapping Machines
LOGITECH PRESSURE BLOCK:Pressure Block
|
3
|
|
|
|
Scotia, New York |
|
|
188701
|
Logitech
|
Logitech |
PP5 PSM1 |
in Lapping Machines
LOGITECH PROGRAMMABLE SAMPLE MONITOR:Programmable Sample Monitor
|
1
|
|
|
F* |
Scotia, New York |
|
|
33048
|
Logitech
|
Logitech |
N/A |
in Lapping Machines
LOGITECH SEGMENTED LAPPING PLATE:Segmented Lapping Plate
|
1
|
|
1,275.34 |
|
Scotia, New York |
|
|
188787
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH SPINDLE WEIGHT 1.5 KG:Spindle Weight 1.5 Kg
|
1
|
|
|
|
Scotia, New York |
|
|
188788
|
Logitech
|
Logitech |
Unknown |
in Lapping Machines
LOGITECH SPINDLE WEIGHT 3.5 KG:Spindle Weight 3.5 Kg
|
1
|
|
|
|
Scotia, New York |
|
|
188694
|
Logitech
|
Logitech |
1ACCS-0800 |
in Lapping Machines
LOGITECH STEEL CONDITIONING RETAINING RING 127MM GROOVED:Steel Conditioning/Retaining Ring -- Grooved -- 127mm
|
2
|
|
|
|
Scotia, New York |
|
|
188899
|
Logitech
|
Logitech |
1BJ2 |
in Lapping Machines
LOGITECH TWO POSITION BONDING JIG:Two Position Bonding Jig
|
1
|
|
1,800.48 |
F* |
Scotia, New York |
|
|
62891
|
Logitech
|
Logitech |
VS2 |
in Lapping Machines
LOGITECH VACUUM UNIT:Vacuum Unit
|
1
|
|
|
F* |
Scotia, New York |
|
|
245141
|
Hitachi
|
Hitachi |
REM-S 9380-2 |
in Wafer Manufacturing Metrology Equipment
METV34-01 (REM-S 9380-2):Microscope for Critical Dimension
|
1
|
|
|
|
Villach, Carinthia |
|
|
150536
|
Microautomation
|
Microautomation |
2066 |
in Wafer Cleaners
MICROAUTOMATION 2066 Mask/Substrate Cleaner - For Parts Only:Mask/Substrate Cleaner - For Parts Only
|
1
|
|
|
F* |
Plano, Texas |
|
|
212139
|
Minato
|
Minato |
MM-6600 |
in Wafer Testers
Minato MM-6600 Wafer Mobility Tester:Minato MM-6600 Wafer Mobility Tester - MECS UX-1000 Wafer Handling Robot
- PC Controlled
|
2
|
|
|
|
Plano, Texas |
|
|
212140
|
Minato MM-6600 Wafer Mobility Tester
|
Minato MM-6600 Wafer Mobility Tester |
in Wafer Testers
Minato MM-6600 Wafer Mobility Tester:Minato MM-6600 Wafer Mobility Tester - MECS UX-1000 Wafer Handling Robot
- PC Controlled
|
2
|
|
|
|
Plano, Texas |
|
|
244701
|
Nitto Denko
|
Nitto Denko |
PFP3 |
in Production Equipment
NITTO HR - 8500 / PFP3:Delaminator
|
1
|
|
|
|
Villach, Carinthia |
|
|
246546
|
Nitto Denko
|
Nitto Denko |
DR8500-II |
in Production Equipment
Nitto Taper DR8500-II:Nitto Taper DR8500-II
|
1
|
|
|
|
Regensburg, Bavaria |
|
|
247842
|
OnTrak Systems
|
OnTrak Systems |
DSS-200 Series II |
in Track Systems
OnTrak DSS-200 Series II Double Sided Wafer Scrubber:OnTrak DSS-200 Series II Double Sided Wafer Scrubber - Cassette to Cassette Handling of up to 200mm Wafers
- Wet Send Elevator with Enclosure
- Double Sided Scrub Module
- Configured for PVA Brushes
- Single Spin Station – Edge Contact Only
- Megasonic Scrub Arm with Pre-Tech PT-005J Megasonic Generator
- IR Drying Lamp
- Wafer Output Module – Edge Contact Only
- GEM RS-232 Communication
- Touch Screen Color CRT Display
- SPECIAL NOTE: This tool has only been plumbed with DI water. No other liquids have been used.
|
1
|
|
55,014.74 |
|
Austin, Texas |
|
|
242852
|
KVA GmbH
|
KVA GmbH |
automatisierte Si-Pellets Ätzbank |
in Wafer Cleaners
Pellet Edge Batch Etch Tool:Automtic dip-etch bench (2014) Complete dip acid etching unit manufactured by KVA, Austria. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing semiconductor devices (Diode, Thyristor) up to 58 mm, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
26911
|
Philips
|
Philips |
DCD 120 |
in Wafer Manufacturing Metrology Equipment
PHILIPS DOUBLE CRYSTAL DIFFRACTOMETER:Double Crystal Diffractometer
Double Crystal Diffractometer optimized for fast rocking curve analysis of pseudomorphic epitaxial layer structures.
|
1
|
|
|
F* |
Scotia, New York |
|
|
239644
|
Ramgraber
|
Ramgraber |
SST |
in Wafer Cleaners
Ramgraber SST:Used Configuration: Tank 1: EKC Tank 2: P1331 Tank 3 and 4: DMF Tank 5: IPA Known errors: Filter from tank 4 is leaking Heater 1 from tank 4 is broken Heater 3 from tank 4 is broken
|
1
|
|
|
F* |
Villach, Carinthia |
|
|
181396
|
Reynoldstech
|
Reynoldstech |
Resist Develop Station |
in Wafer Cleaners
REYNOLDSTECH PHOTORESIST DEVELOP HOOD:Photoresist Develop Station with Headway Wafer Spin Cleaner
|
1
|
|
|
F* |
Scotia, New York |
|
|
204935
|
Rorze
|
Rorze |
RSR160 |
in Production Equipment
Rorze, RSR160, Reticle Handler:Rorze, RSR160, Reticle Handler
|
1
|
|
|
|
Malta, New York |
|
|
245221
|
Tencor
|
Tencor |
RS75-01 |
in Wafer Manufacturing Metrology Equipment
RS75-01:wafer sheet resistance measurement system, Tool in production
|
1
|
|
|
|
Villach, Carinthia |
|
|
248147
|
Semi-Tool
|
Semi-Tool |
|
in Production Equipment
Semitool Raider:- Tool is not fully functional and not in the original condition - Tool can be used as donor tool only - No pictures available but tool inspection is possible
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
|
186319
|
Semitool
|
Semitool |
ST-260D |
in Wafer Cleaners
SEMITOOL RHETECH SPIN RINSE DRYER:Single Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
188065
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER :Dual Stack Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
135639
|
Semitool
|
Semitool |
4600L-5-2-E-VT |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 380 MM:Large Area Substrate Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
134446
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 75 MM:Dual Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
170192
|
Semitool
|
Semitool |
ST-840 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 100MM:Spin Rinse Dryer up to 100mm
|
3
|
|
|
F* |
Scotia, New York |
|
|
170195
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm Built in Resistivity Monitor
|
1
|
|
|
F* |
Scotia, New York |
|
|
170196
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm
|
1
|
|
|
|
Scotia, New York |
|
|
170197
|
Semitool
|
Semitool |
ST-460 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER UP TO 125MM:Spin Rinse Dryer up to 125mm
Built in Resistivity Monitor
|
1
|
|
|
F* |
Scotia, New York |
|
|
240589
|
Semitool
|
Semitool |
see attached type lable |
in Wafer Cleaners
Semitool Spin Rinser Dryer (2010):Single Spin Rinser Dryer as tabletop unit (s. attached picture). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories possible (p.e. wafercarriers and adapters)
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
223579
|
Semitool
|
Semitool |
SRD Rotors |
in Wafer Cleaners
SEMITOOL VERTEQ SRD ROTORS:Various Rotors from Semitool and Verteq. Part numbers and quantities are below.
|
1
|
|
|
|
Scotia, New York |
|
|
159909
|
Semitool
|
Semitool |
ST 440S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 100 MM:Spin Rinse Dryer up to 100mm
|
1
|
|
|
F* |
Scotia, New York |
|
|
8999
|
Semitool
|
Semitool |
ST 460S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 150 MM ST 460S:Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
77205
|
Sidai
|
Sidai |
LSP-2 |
in Lapping Machines
SIDAI LENSE POLISHING MACHINE:Lense Polishing Machine
|
1
|
|
|
F* |
Scotia, New York |
|
|
241408
|
Ramgraber
|
Ramgraber |
Inline-Sprühätzanlage |
in Wafer Cleaners
Spray acid etching system (2008):Complete spray acid etching unit manufactured by Ramgraber Company (Germany). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
32,145.66 |
|
Warstein, North Rhine-Westphalia |
|
|
38830
|
SRD ROTORS
|
SRD ROTORS |
in Wafer Cleaners
|
19
|
|
|
|
Scotia, New York |
|
Displaying 1-100 of 108 Page 1 2 |