|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
|
245275
|
Applied Materials
|
Applied Materials |
EPI5 |
in Epitaxial Reactors
AMAT EPI CENTURA HTF (EPI5):Software Ver: B6.30 CB1 Amps: 300A SBC Type: V452 Flow Point Model: Nano Valve Gas Panel Type: Configurable Wafer Size: 200mm (with conversion kit 150mm is possible) M-Monitor: CRT 3 Chambers ATM EPI With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC) HDD was upgraded to RAID System Tool called "EPI5"
|
1
|
|
|
|
Villach, Carinthia |
|
|
218746
|
Applied Materials
|
Applied Materials |
P5000 |
in Chemical Vapor Deposition Equipment
Amat P5000 CVD Tool:P500048 8 inch tool with 4 CVD chambers. Tool still in Production until (Planned until 3.23)
|
1
|
|
|
|
Villach, Carinthia |
|
|
245288
|
AMAT
|
AMAT |
P5000 |
in Chemical Vapor Deposition Equipment
AMAT, P5000, 200mm, S/N 4862:AMAT, P5000, 200mm, S/N 4862
|
1
|
|
|
|
Singapore |
|
|
246605
|
Applied Materials
|
Applied Materials |
Ultima CENTURA DCVD |
in Chemical Vapor Deposition Equipment
AMAT, Ultima CENTURA DCVD, 200mm, S/N 302959:AMAT, Ultima CENTURA DCVD, 200mm, S/N 302959 2 chms.
|
1
|
|
|
|
Singapore |
|
|
228193
|
AMAT AKT
|
AMAT AKT |
AKT 15 K |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AKT GEN 5 PECVD CHAMBER:Chambers are unused and were never commissioned. Susceptor, gas shower and other chamber kitting not included.
|
5
|
|
|
F* |
Scotia, New York |
|
|
228194
|
AMAT AKT
|
AMAT AKT |
AKT 25 K |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AKT GEN 6 PECVD CHAMBER:Chambers are unused and were never commissioned. Susceptor, gas shower and other chamber kitting are not installed.
|
5
|
|
|
F* |
Scotia, New York |
|
|
229902
|
AMAT AKT
|
AMAT AKT |
0690-01681 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200:CLAMP FLG SGL-CLAW NW160,200 Item is in new condition sealed in its original packing. Browse our large inventory of Applied Materials AKT PECVD GEN 5 & GEN 6 Parts. Including 25K/15K Process Chambers, Susceptors, Chamber Liners, Kitting and much more. Check out our full list here: Applied Materials AKT PECVD New/Used Surplus Parts List
|
1
|
|
|
|
Scotia, New York |
|
|
229925
|
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200
|
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200:CLAMP FLG SGL-CLAW NW160,200 Item is in new condition sealed in its original packing. Browse our large inventory of Applied Materials AKT PECVD GEN 5 & GEN 6 Parts. Including 25K/15K Process Chambers, Susceptors, Chamber Liners, Kitting and much more. Check out our full list here: Applied Materials AKT PECVD New/Used Surplus Parts List
|
1
|
|
|
|
Scotia, New York |
|
|
228262
|
AMAT AKT
|
AMAT AKT |
N/A |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT FIXTURE DIFFUSER LIFTING 25KAXI:FIXTURE DIFFUSER LIFTING 25KAXI New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
F* |
Scotia, New York |
|
|
228247
|
AMAT AKT
|
AMAT AKT |
0244-74553 REV.2 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT GEN 5 15K SUSCEPTOR: KIT SUSC FSW 1/4 CEN GTP SS 1200X1600 15 New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
|
Scotia, New York |
|
|
228260
|
AMAT AKT
|
AMAT AKT |
0244-74553 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT GEN 5 15K SUSCEPTOR:KIT SUSC FSW 1/4 CEN GTP SS 1200X1600 15 New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
F* |
Scotia, New York |
|
|
228261
|
AMAT AKT
|
AMAT AKT |
0244-74554 REV.3 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT GEN 6 25K SUSCEPTOR:KIT SUSC FSW 1500X1850 W/O BSHING New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
|
Scotia, New York |
|
|
225959
|
Applied Materials
|
Applied Materials |
|
in Chemical Vapor Deposition Equipment
|
1
|
|
|
|
Scotia, New York |
|
|
184607
|
Astex
|
Astex |
AX5000, AX6000, AX6350 or similar |
in Production Tools
Astex AX5000 Microwave Plasma Diamond Growth System:- Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production.
- System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components.
- Alternatively, a kit of core components can be offered for skilled users interested in building their own system.
- This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
- 1.5kW to 5kW microwave power input.
- 3 stage options: Cooled, Heated, or Thermally Floating.
- Integration with computer controls is strongly recommended.
- Chamber designs vary by vintage, but can be confirmed at the time of quotation.
- Please note that the chamber shown in the attached image is a new chamber. The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design.
|
1
|
|
|
F* |
Leominster, Massachusetts |
|
|
189843
|
Astex
|
Astex |
AX6500 "Clamshell" MPCVD |
in Production Tools
Astex AX6500 Bottom-launch Diamond Growth System:- This in-stock equipment is offered for domestic sale within the USA only.
- Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
- Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD).
- System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety:
- Chamber cleaning,
- Computer control updates,
- Higher throughput water cooling subsystem,
- Replacement of selected o-ring components with metal seals, and
- Enhanced process control/monitoring devices.
- The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
- Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
- Photo Note: System photo shown include a similar quality, similar vintage system sold in the past. Actual photos or inspection available to qualified customers only.
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
137483
|
Astex
|
Astex |
ECR-MOCVD-PECVD |
in Production Tools
ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD):High density plasma system activated by ECR-enhanced, 2.45GHz microwave input offers PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures. Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.
Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching. This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
242019
|
ATV Technologie GmbH
|
ATV Technologie GmbH |
PEO 602 |
in LPCVD Furnaces
ATV PEO 602 tube furnace:This furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
242018
|
ATV Technologie GmbH
|
ATV Technologie GmbH |
PEO 603 |
in LPCVD Furnaces
ATV PEO 603 tube furnace :This furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
98056
|
Carbone
|
Carbone |
G-III |
in Epitaxial Reactors
CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR:Silicon Carbide 200 mm Disc Susceptor
Carbone of America Part number 017893-001
|
5
|
|
|
F* |
Scotia, New York |
|
|
207176
|
Dockweiler Chemicals
|
Dockweiler Chemicals |
8000 |
in Chemical Vapor Deposition Equipment
DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS:Bubbler Heat Exchanger
|
1
|
|
|
|
Scotia, New York |
|
|
207177
|
Dockweiler Chemicals
|
Dockweiler Chemicals |
20000 |
in Chemical Vapor Deposition Equipment
DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS:Bubbler Heat Exchanger
|
1
|
|
|
|
Scotia, New York |
|
|
115857
|
HFCVD System for CVD Diamond and Related Materials
|
HFCVD System for CVD Diamond and Related Materials |
in Chemical Vapor Deposition Equipment
HFCVD System for CVD Diamond and Related Materials:- Hot Filament CVD system engineered for CVD Diamond growth on a 4 inch (~100mm) rotary platen.
- Previously used for commercial R&D of polycrystalline CVD diamond materials.
- 4-inch system design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.
- NOT intended or marketed for single-crystal diamond gemstone growth.
- Related 12-inch (~300mm) production-scale diamond HFCVD equipment is also available.
4-inch HFCVD system design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species.
Cline Innovations intends to coordinate reintegration/refurbishment of this system with updated controls and interlocks. Reintegration will likely include PLC process monitoring, LCD display, pneumatic controls, and other features. Tailoring of design to meet customer needs may be possible.
|
1
|
|
|
F* |
Leominster, Massachusetts |
|
|
202834
|
Kokusai
|
Kokusai |
DJ-1236VN-DF |
in LPCVD Furnaces
HITACHI KOKUSAI, DJ-1236VN-DF, 300mm:HITACHI KOKUSAI, DJ-1236VN-DF, 300mm
|
1
|
|
|
|
Malta, New York |
|
|
243313
|
Hitachi Kokusai Elec
|
Hitachi Kokusai Elec |
DJ-1236VN-DF |
in LPCVD Furnaces
HITACHI KOKUSAI, DJ-1236VN-DF, 300mm, s/n: DN23300, FVX2488:HITACHI KOKUSAI, DJ-1236VN-DF, 300mm, FVX2488 Vertical LPCVD Furnace
|
1
|
|
|
|
Malta, New York |
|
|
219675
|
LAM Research Corp.
|
LAM Research Corp. |
Vector Express |
in Chemical Vapor Deposition Equipment
LAM, Vector Express, 300mm, S/N D22437A, Ashable Hard Mask CVD:LAM, Vector Express, 300mm, S/N D22437A, Ashable Hard Mask CVD
|
1
|
|
|
|
Malta, New York |
|
|
100429
|
Materials Technology
|
Materials Technology |
02-01808 |
in Epitaxial Reactors
MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR:EPI 3 1/4" Barrel Susceptor
MTC EPI Reactor Parts For 3 Inch Wafers
|
4
|
|
|
F* |
Scotia, New York |
|
|
11074
|
Nexx Systems
|
Nexx Systems |
Cirrus 300 |
in Production Tools
NEXX SYSTEMS ECR PECVD RIE SYSTEM:Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex
This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. Nexx Systems Cirrus 300
|
1
|
|
|
F* |
Scotia, New York |
|
|
223074
|
Novellus Systems
|
Novellus Systems |
Concept Two SPEED |
in Chemical Vapor Deposition Equipment
Novellus Concept Two SPEED (shrink):1 Mainframe w/ 3 Chambers Damages/Deficites: Chamber Turbo Pumps & HF/LF Generators EOL: Turbo Pumps no significant failures between last 3 years
|
1
|
|
|
|
Dresden, Saxony |
|
|
181540
|
Oxford Instruments
|
Oxford Instruments |
Plasmalab System 100 |
in Production Tools
OXFORD INSTRUMENTS PLASMALAB 100 PECVD:PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
|
1
|
|
|
F* |
Scotia, New York |
|
|
242656
|
Applied Materials
|
Applied Materials |
P5000 |
in Production Tools
P5000:CHAMBER A | Universal CVD | Teos | CHAMBER B | Universal CVD | Teos | CHAMBER C | Mark2 | Etch | CHAMBER D | Mark2 | Etch |
The Tool is sold with 4 chambers and was productiv until August 2023
|
1
|
|
|
|
Villach, Carinthia |
|
|
242682
|
Applied Materials
|
Applied Materials |
P5000 |
in Production Tools
P5000:CHAMBER A | x | | Universal CVD | Teos | CHAMBER B | x | | Universal CVD | Teos | CHAMBER D | x | | Universal CVD | Teos |
Tool is sold with three chambers and was used in cleanroom until August 2023
|
1
|
|
|
|
Villach, Carinthia |
|
|
238827
|
Applied Materials
|
Applied Materials |
P5000 |
in Chemical Vapor Deposition Equipment
P5000:From Chamber B following Parts are missing: - RF Generator
- RF Match
- Baratron
- Turbo/Controller
Chamber B,C,D are universal CVD etch chambers.
|
1
|
|
|
|
Villach, Carinthia |
|
|
240853
|
Applied Materials
|
Applied Materials |
P5000 |
in Chemical Vapor Deposition Equipment
P5000:4x Standard SNIT Chambers
|
1
|
|
|
|
Villach, Carinthia |
|
|
147470
|
Plasma-Therm
|
Plasma-Therm |
790 PECVD 11" |
in Production Tools
PLASMATHERM PECVD 790:Refurbished PECVD System with 11" Electrode
|
1
|
|
|
F* |
Scotia, NY |
|
|
30246
|
Plasma-Therm
|
Plasma-Therm |
VLR 700 VLR-PM1-ICRB-PM |
in Production Tools
PLASMATHERM VLR 700:Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.
|
1
|
|
|
F* |
Scotia, New York |
|
|
249038
|
Tel
|
Tel |
Indy IRAD |
in LPCVD Furnaces
TEL, Indy IRAD, 300mm, s/n: R00000895110, TEL Furnace:TEL, Indy IRAD, 300mm, s/n: R00000895110, TEL Furnace
|
1
|
|
|
N* |
East Fishkill, New York |
|
|
176520
|
Wavemat
|
Wavemat |
Diamond 915MHz MPCVD |
in Production Tools
Wavemat 915MHz MPCVD Diamond Growth System:Cline Innovations is offering a Wavemat 915MHz microwave CVD diamond growth system. This deposition system is recommended for CVD diamond and/or large area plasma equipment development purposes. This system is capable of operation over a broad parametric space including 1.) large volume/diameter, low plasma power densities using a thermally-floating stage design or 2.) confined volume/diameter higher plasma power densities using a water-cooled stage design. Major System Features: - Wavemat 915MHz internally-tunable microwave plasma apparatus.
- Nominally 10-inch diameter fused quartz bell jar enables handling of large area fixtures and substrates.
- Roughly 4.5" processing diameter with water-cooled stage.
- Roughly 6.0" processing diameter with thermally-floating stage.
- Larger area processing may certainly be possible with system modifications, enhanced cooling.
- Double-jacketed stainless steel loading chamber mounted to a sturdy welded steel frame with thick aluminum tabletop.
- Typically operated at power levels under 12kW.
- Modular design enables application-specific modifications, plasma source development, etc.
- PC-based LabView controls.
|
1
|
|
|
F* |
Leominster, Massachusetts |
|