|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
|
224568
|
Mechatronic 300mm Sorter
|
Mechatronic 300mm Sorter |
in Wafer Fabrication Equipment
Mechatronic 300mm Sorter:Sort-05 Mechatronic Sorter for 200 and 300mm With bernoulli Aligner for 8 and 12 inch and IOSS Camera. And greenlight inspection. With 4 Synfoniy 300mm Loadports, 2 on the front side and 2 on the backside.
|
1
|
|
|
|
Villach, Carinthia |
|
|
81174
|
Melles Griot
|
Melles Griot |
06 DAL 203 |
in Lasers
MELLES GRIOT ALIGNMENT LASER DIODE:Alignment Laser Diode
|
1
|
|
198.05 |
F* |
Scotia, New York |
|
|
59142
|
Metroline
|
Metroline |
M4L |
in Plasma Resist Strippers
METROLINE BOX PLASMA ETCHER:Box Plasma Etcher
|
1
|
|
|
F* |
Scotia, New York |
|
|
248947
|
Microvision
|
Microvision |
7080 |
in Robotics
Microvision 7080 Wafer Sorter:Microvision 7080 Wafer Sorter - Four Cassette Platforms
- 3 Axis Wafer Handling Robot
- Wafer Prealigner Station
- OCR Reader
- PC Controlled
|
1
|
|
|
N* |
Plano, Texas |
|
|
214758
|
Applied Materials
|
Applied Materials |
FI20064 |
in Plasma Processing Equipment
Microwave Phase Mag Detector :- One unit in inventory.
- Please inquire for details, photos, etc.
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
151502
|
Mill Lane Eng
|
Mill Lane Eng |
Custom Research |
in Batch Sputtering Tools
MILL LANE DUAL CHAMBER RESEARCH SPUTTERING SYSTEM:Dual Chamber Research Sputtering System
|
1
|
|
|
F* |
Scotia, New York |
|
|
1973
|
Mill Lane Eng
|
Mill Lane Eng |
4123 |
in Single Wafer Sputtering Tools
MILL LANE ENGINEERING REEL COATER :Reel Coater for Ribbon or Wire
The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4" ID x 12" OD x 3" wide wire/ribbon spools. Wire diameter up to 0.035" (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating.
|
1
|
|
|
F* |
Scotia, New York |
|
|
220461
|
MKS Instruments, Inc
|
MKS Instruments, Inc |
FI20161-1 Fl20161-1 |
in PVD Power Supplies
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
220462
|
MKS Instruments, Inc
|
MKS Instruments, Inc |
FI20161 Fl20161 |
in PVD Power Supplies
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
213290
|
MKS Instruments, Inc
|
MKS Instruments, Inc |
SM445.0 SM-445 SM445 |
in PVD Power Supplies
MKS Alter SM 445 Switch Mode Microwave Power Supply:- Air-cooled microwave power supply for use with 1.25 kW, 2.45 GHz magnetrons.
- This specific power supply model is intended for Remote/PC control only. This unit does NOT have manual front panel controls.
- Power supply condition looks very good except for some cosmetic blemishes on metal lid and corners of chassis. Interior looks like new.
|
1
|
|
|
F* |
Leominster, Massachusetts |
|
|
184616
|
MKS Instruments
|
MKS Instruments |
AX2530PPD or equivalent |
in Plasma Processing Equipment
MKS Astex 3kW Precision Power Detector:- The MKS/Astex PPD waveguide section is used to simultaneously measure forward and reflected power measurements when used in conjunction with Astex SmartPower microwave generators.
- The PPD can also be used with AX3060 SmartMatch microwave auto tuning systems (automated 3-stub tuners).
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
237494
|
MKS Instruments, Inc
|
MKS Instruments, Inc |
AX2560PPD or equivalent |
in Plasma Processing Equipment
MKS Astex 6kW Precision Power Detector:- The MKS/Astex PPD waveguide section is used to simultaneously measure forward and reflected power measurements when used in conjunction with Astex SmartPower microwave generators.
- The PPD can also be used with AX3060 SmartMatch microwave auto tuning systems (automated 3-stub tuners).
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
223137
|
MKS Instruments, Inc
|
MKS Instruments, Inc |
FI20164 |
in Plasma Processing Equipment
MKS Astex FI20164 3kW Precision Power Detector:- The MKS/Astex PPD waveguide section is used to simultaneously measure forward and reflected power measurements when used in conjunction with Astex SmartPower microwave generators.
- The PPD can also be used with AX3060 SmartMatch microwave auto tuning systems (automated 3-stub tuners).
- Physical aesthetic condition is excellent.
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
172359
|
Modutek
|
Modutek |
QA14-DA1 |
in Wet Processing Equipment
MODUTEK MODUBATH CONSTANT TEMPERATURE QUARTZ BATH:Constant Temperature Bath with MicroTemp Series Process Controller
QA Series
|
1
|
|
1,575.42 |
|
Scotia, New York |
|
|
4071
|
MRC
|
MRC |
902 |
in Single Wafer Sputtering Tools
MRC IN-LINE SPUTTER ETCH SYSTEM:In-Line Sputter-Etch System
|
1
|
|
|
F* |
Scotia, New York |
|
|
236650
|
Muegge
|
Muegge |
MW1003A-210EC |
in Plasma Processing Equipment
Muegge 3kW Water-Cooled Microwave Isolator:- Used 3-way microwave circulator & dummy load combination intended for 2.45GHz use.
- WR340 rectangular waveguide connections.
- All necessary 6mm metric fasteners.
- Dummy load includes a microwave coupler with an N-type power measurement connection with a known power sensitivity (dB rating).
- Additional photos taken on 12/13/2022 are available upon request.
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
238644
|
Datacon
|
Datacon |
2200 apm |
in Wafer Fabrication Equipment
Multi-Chip Die Bonder:Operations and Maintenance Manuals available.
|
1
|
|
|
|
Villach, Carinthia |
|
|
203376
|
National Electronics
|
National Electronics |
WR340TUNERA |
in Plasma Processing Equipment
National Electronics WR340TunerA:- One used unit available in inventory. Unit is functional, but one or more precision dials need to be replaced before shipment.
- Actual unit may vary from one shown in photos. We had 2 of these unit in stock, but only one is left in inventory.
- From National Electronics documentation: "...can be used to develop an impedance in the waveguide that is the reciprocal of the impedance of the applicator. The sum of the two impedances is then seen by the power source as a matched load."
- At 2450MHz:
- VSWR: from 1 to 5
- Power: 3kW
- Waveguide type: WR340
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
196788
|
National Electronics
|
National Electronics |
YJ 1600, YJ-1600 |
in PVD Power Supplies
National Electronics YJ1600 6kW magnetron tube:- Cline Innovations has inventory of several YJ1600 magnetron tubes. Tube ages and conditions vary.
- Warranty can be considered depending on application/use details.
- In general, tubes will be tested at Cline Innovations prior to sale unless negotiated otherwise.
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
143041
|
National Electronic
|
National Electronic |
MH3.OW-SL |
in PVD Power Supplies
NATIONAL ELECTRONICS/RICHARDSON MICROWAVE MAGNETRON HEAD:Microwave Magnetron Head
|
2
|
|
|
|
Scotia, New York |
|
|
128696
|
NDE Mfr*
|
NDE Mfr* |
SSR-05-400-12W-40 |
in PVD Power Supplies
NDE D.C. Power Supply SSR-05-400-12W-40:NDE D.C. Power Supply SSR-05-400-12W-40
|
1
|
|
|
|
Plano, TX |
|
|
95892
|
Neat
|
Neat |
|
in PVD Power Supplies
|
1
|
|
|
|
Plano, TX |
|
|
249043
|
Nexx Systems
|
Nexx Systems |
STRATUS S300 |
in Plasma Processing Equipment
NEXX STRATUS S300, 300mm, s/n: S00000131:PLT03 NEXX STRATUS S300-FX ELECTROPLATING TOOL with ANCOSYS AUTOMATED ANALYSIS AND DOSING Unit
|
1
|
|
|
N* |
East Fishkill, New York |
|
|
249044
|
Nexx Systems
|
Nexx Systems |
APOLLO HP |
in Plasma Processing Equipment
NEXX APOLLO HP, 300mm, s/n: 379:TEL NEXX APOLLO HP PVD SYSTEM SPT03
|
1
|
|
|
N* |
East Fishkill, New York |
|
|
11074
|
Nexx Systems
|
Nexx Systems |
Cirrus 300 |
in Production Tools
NEXX SYSTEMS ECR PECVD RIE SYSTEM:Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex
This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. Nexx Systems Cirrus 300
|
1
|
|
|
F* |
Scotia, New York |
|
|
248320
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573120:Nikon, NSR-2205EX14C, 200mm, S/N 7573120
|
1
|
|
|
|
Singapore |
|
|
245214
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
Nikon, NSR-S208D, 300mm, S/N 8732041:Nikon, NSR-S208D, 300mm, S/N 8732041
|
1
|
|
|
|
Singapore |
|
|
247027
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732048:NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
247605
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: S62 0290202:Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
240450
|
NITTO Wafer Laminator 2018
|
NITTO Wafer Laminator 2018 |
in Wafer Fabrication Equipment
NITTO Wafer Laminator 2018:NITTO Wafer Laminator 2018 Nel System Type: DR8500iii
|
1
|
|
|
|
Regensburg, Bavaria |
|
|
223074
|
Novellus Systems
|
Novellus Systems |
Concept Two SPEED |
in Chemical Vapor Deposition Equipment
Novellus Concept Two SPEED (shrink):1 Mainframe w/ 3 Chambers Damages/Deficites: Chamber Turbo Pumps & HF/LF Generators EOL: Turbo Pumps no significant failures between last 3 years
|
1
|
|
|
|
Dresden, Saxony |
|
|
239647
|
Novellus Systems
|
Novellus Systems |
INOVA NEXT |
in Plasma Processing Equipment
NOVELLUS, INOVA NEXT, s/n M23321A, 300mm:NOVELLUS, INOVA NEXT, s/n M23321A, 300mm
|
1
|
|
|
|
Malta, New York |
|
|
203278
|
MKS Instruments, Inc
|
MKS Instruments, Inc |
3750-01145 |
in Plasma Processing Equipment
OEM Water-Cooled Dummy Load:- One used, microwave-tested unit in Cline Innovations' Massachusetts inventory as of 8/20/2021.
| |
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
85628
|
Olympus
|
Olympus |
AL100-L8 |
in Robotics
Olympus AL100-L8 :Wafer Loader for 200mm Wafers - PARTS TOOL ONLY
|
4
|
|
|
|
Plano, TX |
|
|
247842
|
OnTrak Systems
|
OnTrak Systems |
DSS-200 Series II |
in Track Systems
OnTrak DSS-200 Series II Double Sided Wafer Scrubber:OnTrak DSS-200 Series II Double Sided Wafer Scrubber - Cassette to Cassette Handling of up to 200mm Wafers
- Wet Send Elevator with Enclosure
- Double Sided Scrub Module
- Configured for PVA Brushes
- Single Spin Station – Edge Contact Only
- Megasonic Scrub Arm with Pre-Tech PT-005J Megasonic Generator
- IR Drying Lamp
- Wafer Output Module – Edge Contact Only
- GEM RS-232 Communication
- Touch Screen Color CRT Display
- SPECIAL NOTE: This tool has only been plumbed with DI water. No other liquids have been used.
|
1
|
|
55,014.74 |
|
Austin, Texas |
|
|
242093
|
Osiris International
|
Osiris International |
DEFIXX 15m |
in Wafer Fabrication Equipment
OSIRIS INTERNATIONAL MANUAL WAFER DEBONDING TOOL:Manual Wafer Debonding Tool
|
1
|
|
|
F* |
Scotia, New York |
|
|
181540
|
Oxford Instruments
|
Oxford Instruments |
Plasmalab System 100 |
in Production Tools
OXFORD INSTRUMENTS PLASMALAB 100 PECVD:PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
|
1
|
|
|
F* |
Scotia, New York |
|
|
244285
|
Oxford Instruments
|
Oxford Instruments |
OPAL |
in Plasma Processing Equipment
OXFORD INSTRUMENTS, OPAL, sn: 94-220255, RF/Plasma oxide deposition tool:OXFORD INSTRUMENTS, OPAL, sn: 94-220255, RF/Plasma oxide deposition tool
|
1
|
|
|
|
Malta, New York |
|
|
238827
|
Applied Materials
|
Applied Materials |
P5000 |
in Chemical Vapor Deposition Equipment
P5000:From Chamber B following Parts are missing: - RF Generator
- RF Match
- Baratron
- Turbo/Controller
Chamber B,C,D are universal CVD etch chambers.
|
1
|
|
|
|
Villach, Carinthia |
|
|
240853
|
Applied Materials
|
Applied Materials |
P5000 |
in Chemical Vapor Deposition Equipment
P5000:4x Standard SNIT Chambers
|
1
|
|
|
|
Villach, Carinthia |
|
|
242656
|
Applied Materials
|
Applied Materials |
P5000 |
in Production Tools
P5000:CHAMBER A | Universal CVD | Teos | CHAMBER B | Universal CVD | Teos | CHAMBER C | Mark2 | Etch | CHAMBER D | Mark2 | Etch |
The Tool is sold with 4 chambers and was productiv until August 2023
|
1
|
|
|
|
Villach, Carinthia |
|
|
242682
|
Applied Materials
|
Applied Materials |
P5000 |
in Production Tools
P5000:CHAMBER A | x | | Universal CVD | Teos | CHAMBER B | x | | Universal CVD | Teos | CHAMBER D | x | | Universal CVD | Teos |
Tool is sold with three chambers and was used in cleanroom until August 2023
|
1
|
|
|
|
Villach, Carinthia |
|
|
242852
|
KVA GmbH
|
KVA GmbH |
automatisierte Si-Pellets Ätzbank |
in Wafer Cleaners
Pellet Edge Batch Etch Tool:Automtic dip-etch bench (2014) Complete dip acid etching unit manufactured by KVA, Austria. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing semiconductor devices (Diode, Thyristor) up to 58 mm, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
136930
|
Phasetronics OEM*
|
Phasetronics OEM* |
1P1-2075-NE |
in PVD Power Supplies
Phasetronics 1P1-2075-NE Power Supply:Phasetronics 1P1-2075-NE Power SupplyPower Supply
|
1
|
|
|
|
Plano, TX |
|
|
208462
|
Plasma-finish
|
Plasma-finish |
V15G |
in Plasma Etch Equipment
PLASMA-FINISH GMBH PLASMA ETCHER SYSTEM 300 WATT:Plasma Box Etcher System PINK GmbH acquired Plasma-Finish - now called PINK GmbH Plasma-Finish
|
1
|
|
|
|
Scotia, New York |
|
|
225948
|
Plasma-Therm
|
Plasma-Therm |
790 |
in Single Chamber Plasma Tools
Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade:PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F - Manually Loaded Process Chamber with 8” (dia.) Cathode
- Gas Distribution Panel with 4ea Gas Channels
- MKS 1479 Metal Sealed Mass Flow Controllers
- 4ea Additional Gas Channels Available
- RFPP RF5S RF Generator: 500W @ 13.56MHz
- RFPP AMN-5 Auto Matching Network
- RFPP AMNPS-2A Auto Matching Network Controller
- Leybold TMP 361 Turbomolecular Pump
- Leybold NT 150/360 Turbomolecular Pump Controller
- EquipmentWorks 2.6 Application SW
- Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD
- All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol.
- All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible
- All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol
- All SMC Pneumatic Valves Available from SMC USA
- Standard 21” Flat Panel Monitor, Keyboard & Mouse
- Edwards QDP40 Dry Roughing Pump
- NESLAB HX-75 Chiller
- Electrical Disconnect Box - 208V, 60Hz, 3 Ph
- System Fully Refurbished & Ready for Demonstration
- Guaranteed to Meet or Exceed OEM Specifications
- Price……$ 80,000.00 USD
|
1
|
|
80,021.44 |
|
Plano, Texas |
|
|
3011
|
Plasma-Therm
|
Plasma-Therm |
Wafer Batch 740/740 |
in Single Chamber Plasma Tools
PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM:Dual Plasma Etch and Reactive Ion Etch Processing Systems
System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.
|
1
|
|
|
|
Scotia, New York |
|
|
4054
|
Plasma-Therm
|
Plasma-Therm |
73/74 |
in Single Chamber Plasma Tools
PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM:Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems
|
1
|
|
|
|
Scotia, New York |
|
|
50854
|
Plasma-Therm
|
Plasma-Therm |
VII 734 |
in Single Chamber Plasma Tools
PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE:Combination Plasma Deposition System/RIE
|
1
|
|
|
F* |
Scotia, New York |
|
|
11919
|
Plasma-Therm
|
Plasma-Therm |
VII 734MF |
in Single Chamber Plasma Tools
PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM:Plasmatherm RIE/Plasma Etch System
|
1
|
|
|
F* |
Scotia, New York |
|
|
165893
|
PlasmaQuest
|
PlasmaQuest |
6" Load-Lock |
in Single Chamber Plasma Tools
PlasmaQuest Microwave-ECR Plasma etch system:- PlasmaQuest high density plasma etch tool equipped with 6-inch load lock.
- Unique combo of permanent magnet and electromagnets for ECR (Electron Cyclotron Resonance) ECR-enhancement of microwave plasma.
- ECR operation in mTorr pressure range yields large area plasma processing capability for planar and low profile parts.
- Stage height adjustment range relative to core plasma activation volume enables high levels of ECR process enhancement (species activation).
- Originally equipped with 1000W Astex microwave delivery system (AX2110 or equivalent), but higher input power may be viable.
- System can be offered "as is" to experienced buyers.
- Full refurbishment for etch and/or PECVD processing can be considered.
- Configured with 2 modules including power & controls rack and vacuum module.
- Computer controller may function, but upgrade is recommended and should be possible.
|
1
|
|
|
|
Leominster, Massachusetts |
|
|
206582
|
Plasma-Therm
|
Plasma-Therm |
BT 6" RIE MF |
in Single Chamber Plasma Tools
PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6":Reactive Ion Etch System BatchTop VII
|
1
|
|
|
|
Scotia, New York |
|
|
45428
|
Plasma-Therm
|
Plasma-Therm |
790 ICP |
in Single Chamber Plasma Tools
PLASMATHERM ICP PLASMA ETCHER:Inductively Coupled Plasma Etcher with 9.5 Inch Electrode
|
1
|
|
|
F* |
Scotia, New York |
|
|
147470
|
Plasma-Therm
|
Plasma-Therm |
790 PECVD 11" |
in Production Tools
PLASMATHERM PECVD 790:Refurbished PECVD System with 11" Electrode
|
1
|
|
|
F* |
Scotia, NY |
|
|
124315
|
Plasma-Therm
|
Plasma-Therm |
790 11" RIE |
in Single Chamber Plasma Tools
PLASMATHERM REACTIVE ION ETCH SYSTEM 11":Reactive Ion Etch System - 11" Electrode
|
1
|
|
|
F* |
Scotia, New York |
|
|
45430
|
Plasma-Therm
|
Plasma-Therm |
790 11 RIE |
in Single Chamber Plasma Tools
PLASMATHERM REACTIVE ION ETCH SYSTEM 200MM:Reactive Ion Etch System 11" Electrode
|
1
|
|
|
|
Scotia, New York |
|
|
201152
|
Plasma-Therm
|
Plasma-Therm |
790 RIE PECVD 11" |
in Single Chamber Plasma Tools
PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX:Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board.
Both top and bottom electrodes can be powered sequentially.
|
1
|
|
|
|
Scotia, New York |
|
|
142821
|
Plasma-Therm
|
Plasma-Therm |
Unaxis 790 |
in Single Chamber Plasma Tools
PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM:Shuttle Load Lock System
|
1
|
|
|
|
Scotia, New York |
|
|
30246
|
Plasma-Therm
|
Plasma-Therm |
VLR 700 VLR-PM1-ICRB-PM |
in Production Tools
PLASMATHERM VLR 700:Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.
|
1
|
|
|
F* |
Scotia, New York |
|
|
212137
|
Plassys
|
Plassys |
MEB 450S |
in Evaporation Tools
PLASSYS MEB450S:PLASSYS MEB450S Resistance Evaporator - " X " X " X " Box Chamber with Full Opening Front Door
- 4X Resistance Source Assembly
- Turbo Pumped
- PC Controlled Operation
|
1
|
|
|
F* |
Plano, Texas |
|
|
223090
|
CBI
|
CBI |
2X2LOTO15 |
in Physical Vapor Deposition Equipment
Pneumatic Lockout Tagout Box - 15 Channel:Custom fabricated assembly designed to be installed into a raised floor system.
|
10
|
|
|
|
Scotia, New York |
|
|
140735
|
Power Ten Inc
|
Power Ten Inc |
P62B-8250 |
in PVD Power Supplies
POWER TEN DIRECT CURRENT POWER SUPPLY 8 V, 250 A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,730.46 |
|
Scotia, New York |
|
|
83028
|
Power Ten Inc
|
Power Ten Inc |
P63C-15220AB |
in PVD Power Supplies
POWER TEN INC. DC POWER SUPPLY 15V, 220A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,750.47 |
|
Scotia, New York |
|
|
39613
|
Power Ten Inc
|
Power Ten Inc |
P62B-20150 |
in PVD Power Supplies
POWER TEN INC. DC POWER SUPPLY 20V, 150A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,585.42 |
|
Scotia, New York |
|
|
83027
|
Power Ten Inc
|
Power Ten Inc |
P62B-5325AB |
in PVD Power Supplies
POWER TEN INC. DC POWER SUPPLY 5V, 325A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
2
|
|
1,450.39 |
|
Scotia, New York |
|
|
242605
|
Power Ten Inc
|
Power Ten Inc |
P66C-60330AB |
in PVD Power Supplies
POWER TEN INC. DC POWER SUPPLY 60V, 330A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
|
|
Scotia, New York |
|
|
102308
|
Power Ten Inc
|
Power Ten Inc |
4500C-6040 |
in PVD Power Supplies
POWER TEN INC. DC POWER SUPPLY 60V, 40A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
2
|
|
|
|
Scotia, New York |
|
|
128695
|
Power-One Inc Mfr*
|
Power-One Inc Mfr* |
HAA15-.8 |
in PVD Power Supplies
Power-One Inc D.C. Power Supply HAA15-.8 :Power-One Inc D.C. Power Supply HAA15-.8
|
1
|
|
|
|
Plano, TX |
|
|
150388
|
Power-One Inc OEM*
|
Power-One Inc OEM* |
SPM5A2KLB |
in PVD Power Supplies
Power-One SPM5A2KLB International Series Switching DC Power Supply:Output: 5VDC @ 150A, Unused Since RefurbishmentInternational Series Switching DC Power Supply
|
7
|
|
|
|
Plano, TX |
|
|
150387
|
Power-One Inc OEM*
|
Power-One Inc OEM* |
SPM5F2F2KB |
in PVD Power Supplies
Power-One SPM5F2F2KB International Series Switching DC Power Supply:Dual Outputs: 2VDC @ 150AInternational Series Switching DC Power Supply
|
8
|
|
|
|
Plano, TX |
|
|
128692
|
Powertec Inc Mfr*
|
Powertec Inc Mfr* |
2K15D- 1.3B |
in PVD Power Supplies
Powertec OEM2 D.C. Power Supply 2K15D- 1.3B:Powertec OEM2 D.C. Power Supply
|
1
|
|
|
|
Plano, TX |
|
|
107355
|
PowerVolt Inc OEM*
|
PowerVolt Inc OEM* |
BVA-24AS1.2T |
in PVD Power Supplies
PowerVolt Inc Part Number BVA-24AS1.2T:DC Power Supplies in Power Supplies24V, 1.2A, Linear Regulated DC Power Supply
|
1
|
|
110.03 |
|
Hudson, NY |
|
|
230353
|
Advanced Energy
|
Advanced Energy |
B0111-DPXX-105-XX |
in PVD Power Supplies
Profibus communication board for Advanced Energy CESAR generators:Profibus communication board for Advanced Energy CESAR generators
|
5
|
|
|
|
Scotia, New York |
|
|
160264
|
Quintel
|
Quintel |
Q-804 |
in Mask Aligners
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM:Mask Aligner/Exposure System
|
1
|
|
|
F* |
Scotia, New York |
|
|
24564
|
Quintel
|
Quintel |
UL 7000 IR |
in Mask Aligners
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM:Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
|
1
|
|
|
F* |
Scotia, New York |
|
|
239644
|
Ramgraber
|
Ramgraber |
SST |
in Wafer Cleaners
Ramgraber SST:Used Configuration: Tank 1: EKC Tank 2: P1331 Tank 3 and 4: DMF Tank 5: IPA Known errors: Filter from tank 4 is leaking Heater 1 from tank 4 is broken Heater 3 from tank 4 is broken
|
1
|
|
|
F* |
Villach, Carinthia |
|
|
48496
|
RECIF
|
RECIF |
IDLW5 |
in Robotics
RECIF IDLW5:IDLW Lot & Wafer Identification Readers
|
1
|
|
|
|
Plano, TX |
|
|
120795
|
RECIF
|
RECIF |
IDLW8R |
in Robotics
RECIF IDLW8R:Wafer ID Reader - Tabletop
|
1
|
|
|
|
Plano, TX |
|
|
120796
|
RECIF
|
RECIF |
IDLW8R |
in Robotics
RECIF IDLW8R:Wafer ID Reader - Tabletop
|
1
|
|
|
|
Plano, TX |
|
|
120873
|
RECIF
|
RECIF |
SPP8 |
in Robotics
RECIF SPP8:Wafer Transfer for 200mm Wafers
|
1
|
|
|
|
Plano, TX |
|
|
187522
|
Reynoldstech
|
Reynoldstech |
Custom |
in Wafer Fabrication Equipment
REYNOLDSTECH 16 'X 16', HOT PLATE 200° C, :200° C 16 " x 16" Hot Plate with Vacuum Hold Down
|
1
|
|
5,751.54 |
|
Scotia, New York |
|
|
181396
|
Reynoldstech
|
Reynoldstech |
Resist Develop Station |
in Wafer Cleaners
REYNOLDSTECH PHOTORESIST DEVELOP HOOD:Photoresist Develop Station with Headway Wafer Spin Cleaner
|
1
|
|
|
F* |
Scotia, New York |
|
|
197844
|
Sairem
|
Sairem |
6kW |
in Plasma Processing Equipment
Sairem 6kW water-cooled isolator:- 3-way microwave circulator and dummy load combination intended for 2.45GHz use.
- WR340 rectangular waveguide connections.
- Dummy load includes a microwave coupler with an N-type power measurement connection with known sensitivity (dB rating).
|
2
|
|
|
|
Leominster, Massachusetts |
|
|
191060
|
SemiSoft Inc.
|
SemiSoft Inc. |
MProbe VIS20 In-situ |
in Physical Vapor Deposition Equipment
SEMICONSOFT THIN FILM MEASUREMENT SYSTEM VIS:Thin Film Measurement System
The MProbe 20VIS is a desktop thin-film thickness measurement system. The measurement is based on spectroscopic reflectance and uses fiber optics retro-reflecting probe.
|
1
|
|
|
|
Scotia, New York |
|
|
249042
|
SEMIgear
|
SEMIgear |
Geneva |
in Plasma Processing Equipment
SEMIgear Geneva, 300mm, s/n: S16100101:RFL02 SemiGEAR Reflow Tool
|
1
|
|
|
N* |
East Fishkill, New York |
|
|
186319
|
Semitool
|
Semitool |
ST-260D |
in Wafer Cleaners
SEMITOOL RHETECH SPIN RINSE DRYER:Single Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
188065
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER :Dual Stack Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
135639
|
Semitool
|
Semitool |
4600L-5-2-E-VT |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 380 MM:Large Area Substrate Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
134446
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 75 MM:Dual Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
170192
|
Semitool
|
Semitool |
ST-840 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 100MM:Spin Rinse Dryer up to 100mm
|
3
|
|
|
F* |
Scotia, New York |
|
|
170195
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm Built in Resistivity Monitor
|
1
|
|
|
F* |
Scotia, New York |
|
|
170196
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm
|
1
|
|
|
|
Scotia, New York |
|
|
170197
|
Semitool
|
Semitool |
ST-460 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER UP TO 125MM:Spin Rinse Dryer up to 125mm
Built in Resistivity Monitor
|
1
|
|
|
F* |
Scotia, New York |
|
|
240589
|
Semitool
|
Semitool |
see attached type lable |
in Wafer Cleaners
Semitool Spin Rinser Dryer (2010):Single Spin Rinser Dryer as tabletop unit (s. attached picture). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories possible (p.e. wafercarriers and adapters)
|
1
|
|
|
|
Warstein, North Rhine-Westphalia |
|
|
135159
|
Semi-Tool
|
Semi-Tool |
WST 306 MG |
in Wet Processing Equipment
SEMITOOL SPRAY SOLVENT TOOL:Spray Solvent Tool
Rhetech Semitool WST 306 MG
|
1
|
|
|
|
Scotia, New York |
|
|
7358
|
Semi-Tool
|
Semi-Tool |
WST 406 MG |
in Wet Processing Equipment
SEMITOOL SPRAY SOLVENT TOOL:Spray Solvent Tool Refurbished by Rhetech in 2000
Photoresist develop/strip, polymer removal, pre-metal deposition cleaning. High speed rinse and dry of wafers, with low particle counts and reduced DI water consumption.
|
2
|
|
|
F* |
Scotia, New York |
|
|
223579
|
Semitool
|
Semitool |
SRD Rotors |
in Wafer Cleaners
SEMITOOL VERTEQ SRD ROTORS:Various Rotors from Semitool and Verteq. Part numbers and quantities are below.
|
1
|
|
|
|
Scotia, New York |
|
|
159909
|
Semitool
|
Semitool |
ST 440S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 100 MM:Spin Rinse Dryer up to 100mm
|
1
|
|
|
F* |
Scotia, New York |
|
|
8999
|
Semitool
|
Semitool |
ST 460S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 150 MM ST 460S:Spin Rinse Dryer
|
1
|
|
|
F* |
Scotia, New York |
|
|
179021
|
Seren
|
Seren |
CEX-6 |
in PVD Power Supplies
SEREN IPS COMMON EXCITER:Common Exciter - Part number 9500170000
|
2
|
|
|
|
Scotia, New York |
|
Displaying 301-400 of 524 Page 1 2 3 4 5 6 |